JPS6212608A - 高純度シリカ及びその製造方法 - Google Patents
高純度シリカ及びその製造方法Info
- Publication number
- JPS6212608A JPS6212608A JP15137285A JP15137285A JPS6212608A JP S6212608 A JPS6212608 A JP S6212608A JP 15137285 A JP15137285 A JP 15137285A JP 15137285 A JP15137285 A JP 15137285A JP S6212608 A JPS6212608 A JP S6212608A
- Authority
- JP
- Japan
- Prior art keywords
- silica
- acid
- purity
- purity silica
- chelating agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 186
- 239000000377 silicon dioxide Substances 0.000 title claims description 80
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 239000002253 acid Substances 0.000 claims description 42
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 26
- 239000012535 impurity Substances 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 24
- 238000006243 chemical reaction Methods 0.000 claims description 23
- 239000002738 chelating agent Substances 0.000 claims description 17
- 239000011707 mineral Substances 0.000 claims description 16
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 15
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims description 11
- 239000004115 Sodium Silicate Substances 0.000 claims description 10
- 239000002244 precipitate Substances 0.000 claims description 10
- 229910052911 sodium silicate Inorganic materials 0.000 claims description 10
- 229910052910 alkali metal silicate Inorganic materials 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 229910052770 Uranium Inorganic materials 0.000 claims description 7
- 238000005406 washing Methods 0.000 claims description 7
- 229910052776 Thorium Inorganic materials 0.000 claims description 6
- 150000003839 salts Chemical class 0.000 claims description 5
- 230000002378 acidificating effect Effects 0.000 claims description 4
- 125000001142 dicarboxylic acid group Chemical group 0.000 claims 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 12
- 239000000243 solution Substances 0.000 description 11
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 10
- 229910017604 nitric acid Inorganic materials 0.000 description 10
- 239000002994 raw material Substances 0.000 description 10
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 9
- 150000007513 acids Chemical class 0.000 description 7
- 239000000945 filler Substances 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 238000010306 acid treatment Methods 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- 239000013078 crystal Substances 0.000 description 6
- 229910002027 silica gel Inorganic materials 0.000 description 6
- 239000000741 silica gel Substances 0.000 description 6
- 239000012776 electronic material Substances 0.000 description 5
- 239000008393 encapsulating agent Substances 0.000 description 5
- 230000002285 radioactive effect Effects 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 235000012239 silicon dioxide Nutrition 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 235000006408 oxalic acid Nutrition 0.000 description 4
- 239000004576 sand Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000005304 optical glass Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- ALRHLSYJTWAHJZ-UHFFFAOYSA-N 3-hydroxypropionic acid Chemical compound OCCC(O)=O ALRHLSYJTWAHJZ-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- LCTONWCANYUPML-UHFFFAOYSA-N Pyruvic acid Chemical compound CC(=O)C(O)=O LCTONWCANYUPML-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 2
- 235000015165 citric acid Nutrition 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 239000013065 commercial product Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000012452 mother liquor Substances 0.000 description 2
- 238000011017 operating method Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000011975 tartaric acid Substances 0.000 description 2
- 235000002906 tartaric acid Nutrition 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- QEVGZEDELICMKH-UHFFFAOYSA-N Diglycolic acid Chemical compound OC(=O)COCC(O)=O QEVGZEDELICMKH-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- ATRMIFNAYHCLJR-UHFFFAOYSA-N [O].CCC Chemical compound [O].CCC ATRMIFNAYHCLJR-UHFFFAOYSA-N 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Chemical class 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 125000002648 azanetriyl group Chemical group *N(*)* 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000000779 depleting effect Effects 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 230000002431 foraging effect Effects 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 229940107700 pyruvic acid Drugs 0.000 description 1
- 239000012066 reaction slurry Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 229910001575 sodium mineral Inorganic materials 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 1
- 150000004684 trihydrates Chemical class 0.000 description 1
- DNYWZCXLKNTFFI-UHFFFAOYSA-N uranium Chemical compound [U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U] DNYWZCXLKNTFFI-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15137285A JPS6212608A (ja) | 1985-07-11 | 1985-07-11 | 高純度シリカ及びその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15137285A JPS6212608A (ja) | 1985-07-11 | 1985-07-11 | 高純度シリカ及びその製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6235374A Division JP2542797B2 (ja) | 1994-09-29 | 1994-09-29 | 高純度シリカの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6212608A true JPS6212608A (ja) | 1987-01-21 |
| JPH0481526B2 JPH0481526B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-12-24 |
Family
ID=15517116
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15137285A Granted JPS6212608A (ja) | 1985-07-11 | 1985-07-11 | 高純度シリカ及びその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6212608A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01230422A (ja) * | 1988-03-10 | 1989-09-13 | Nippon Chem Ind Co Ltd | 高純度シリカ及びその製造方法 |
| JPH01242412A (ja) * | 1988-03-24 | 1989-09-27 | Nippon Chem Ind Co Ltd | 低トリウム高純度シリカの製造方法 |
| FR2636938A1 (fr) * | 1987-05-25 | 1990-03-30 | Kawatetsu Mining Cy Ltd | Procede de production de silice tres pure |
| JPH0725640A (ja) * | 1993-07-09 | 1995-01-27 | Asahi Glass Co Ltd | カバーガラス |
| JP2000247625A (ja) * | 1999-03-04 | 2000-09-12 | Nippon Chem Ind Co Ltd | 高純度シリカゾル及びその製造方法 |
| JP2006256913A (ja) * | 2005-03-17 | 2006-09-28 | Admatechs Co Ltd | 球状シリカ粒子、樹脂組成物及び半導体液状封止材 |
| JP2007308371A (ja) * | 2007-09-03 | 2007-11-29 | Mitsubishi Chemicals Corp | シリカゲルの製造方法 |
| WO2010037705A1 (de) * | 2008-09-30 | 2010-04-08 | Evonik Degussa Gmbh | Verfahren zur herstellung von hochreinem sio2 aus silikatlösungen |
| WO2012113655A1 (de) * | 2011-02-22 | 2012-08-30 | Evonik Degussa Gmbh | Hochreines siliciumdioxidgranulat für quarzglasanwendungen sowie dessen herstellungsverfahren |
| WO2013005741A1 (ja) * | 2011-07-04 | 2013-01-10 | 太平洋セメント株式会社 | シリカとカーボンからなる粒子、及び、シリカとカーボンの混合物の製造方法 |
| JP2013095635A (ja) * | 2011-11-01 | 2013-05-20 | Taiheiyo Cement Corp | 高純度炭化珪素粉末の製造方法 |
| JP2014210678A (ja) * | 2013-04-18 | 2014-11-13 | 富士化学株式会社 | シリカの製造方法 |
| KR20160122167A (ko) * | 2014-02-14 | 2016-10-21 | 로디아 오퍼레이션스 | 침강 실리카의 제조 방법, 침강 실리카, 및 특히 중합체 보강을 위한 이의 용도 |
| JP2019127494A (ja) * | 2018-01-19 | 2019-08-01 | 信越化学工業株式会社 | 石英ガラス繊維含有プリプレグ、石英ガラス繊維含有フィルム及び石英ガラス繊維含有基板 |
| CN113372630A (zh) * | 2020-03-10 | 2021-09-10 | 旭化成株式会社 | 共轭二烯系聚合物组合物以及轮胎 |
| US12043741B2 (en) | 2020-03-10 | 2024-07-23 | Asahi Kasei Kabushiki Kaisha | Conjugated diene-based polymer composition and tire |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114007981A (zh) * | 2019-06-24 | 2022-02-01 | 日产化学株式会社 | 含有螯合剂的水玻璃及硅溶胶的制造方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53144819A (en) * | 1977-05-20 | 1978-12-16 | Wacker Chemitronic | Method of purifying silicon |
| JPS5542294A (en) * | 1978-09-16 | 1980-03-25 | Henkel Kgaa | Method of producing high purity granular silicic acid |
| JPS5841713A (ja) * | 1981-08-26 | 1983-03-11 | ヘキスト・アクチエンゲゼルシヤフト | 遷移元素の含量の少ないアルミノシリケ−トおよびシリカゲル、それらの製造方法およびそれらの用途 |
| JPS5954632A (ja) * | 1982-09-21 | 1984-03-29 | Mitsubishi Metal Corp | 石英ガラス粉末の製造法 |
| JPH055766A (ja) * | 1991-06-28 | 1993-01-14 | Toshiba Corp | ガス絶縁機器の異常検出装置 |
-
1985
- 1985-07-11 JP JP15137285A patent/JPS6212608A/ja active Granted
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53144819A (en) * | 1977-05-20 | 1978-12-16 | Wacker Chemitronic | Method of purifying silicon |
| JPS5542294A (en) * | 1978-09-16 | 1980-03-25 | Henkel Kgaa | Method of producing high purity granular silicic acid |
| JPS5841713A (ja) * | 1981-08-26 | 1983-03-11 | ヘキスト・アクチエンゲゼルシヤフト | 遷移元素の含量の少ないアルミノシリケ−トおよびシリカゲル、それらの製造方法およびそれらの用途 |
| JPS5954632A (ja) * | 1982-09-21 | 1984-03-29 | Mitsubishi Metal Corp | 石英ガラス粉末の製造法 |
| JPH055766A (ja) * | 1991-06-28 | 1993-01-14 | Toshiba Corp | ガス絶縁機器の異常検出装置 |
Cited By (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2636938A1 (fr) * | 1987-05-25 | 1990-03-30 | Kawatetsu Mining Cy Ltd | Procede de production de silice tres pure |
| JPH01230422A (ja) * | 1988-03-10 | 1989-09-13 | Nippon Chem Ind Co Ltd | 高純度シリカ及びその製造方法 |
| JPH01242412A (ja) * | 1988-03-24 | 1989-09-27 | Nippon Chem Ind Co Ltd | 低トリウム高純度シリカの製造方法 |
| JPH0725640A (ja) * | 1993-07-09 | 1995-01-27 | Asahi Glass Co Ltd | カバーガラス |
| JP2000247625A (ja) * | 1999-03-04 | 2000-09-12 | Nippon Chem Ind Co Ltd | 高純度シリカゾル及びその製造方法 |
| JP2006256913A (ja) * | 2005-03-17 | 2006-09-28 | Admatechs Co Ltd | 球状シリカ粒子、樹脂組成物及び半導体液状封止材 |
| JP2007308371A (ja) * | 2007-09-03 | 2007-11-29 | Mitsubishi Chemicals Corp | シリカゲルの製造方法 |
| WO2010037705A1 (de) * | 2008-09-30 | 2010-04-08 | Evonik Degussa Gmbh | Verfahren zur herstellung von hochreinem sio2 aus silikatlösungen |
| WO2012113655A1 (de) * | 2011-02-22 | 2012-08-30 | Evonik Degussa Gmbh | Hochreines siliciumdioxidgranulat für quarzglasanwendungen sowie dessen herstellungsverfahren |
| WO2013005741A1 (ja) * | 2011-07-04 | 2013-01-10 | 太平洋セメント株式会社 | シリカとカーボンからなる粒子、及び、シリカとカーボンの混合物の製造方法 |
| JPWO2013005741A1 (ja) * | 2011-07-04 | 2015-02-23 | 太平洋セメント株式会社 | シリカとカーボンからなる粒子、及び、シリカとカーボンの混合物の製造方法 |
| US9556035B2 (en) | 2011-07-04 | 2017-01-31 | Taiheiyo Cement Corporation | Particles formed of silica and carbon, and method for producing mixture of silica and carbon |
| JP2013095635A (ja) * | 2011-11-01 | 2013-05-20 | Taiheiyo Cement Corp | 高純度炭化珪素粉末の製造方法 |
| JP2014210678A (ja) * | 2013-04-18 | 2014-11-13 | 富士化学株式会社 | シリカの製造方法 |
| KR20160122167A (ko) * | 2014-02-14 | 2016-10-21 | 로디아 오퍼레이션스 | 침강 실리카의 제조 방법, 침강 실리카, 및 특히 중합체 보강을 위한 이의 용도 |
| JP2017507888A (ja) * | 2014-02-14 | 2017-03-23 | ローディア オペレーションズ | 沈降シリカの調製方法、沈降シリカおよび、特にポリマーの強化のための、それらの使用 |
| JP2019127494A (ja) * | 2018-01-19 | 2019-08-01 | 信越化学工業株式会社 | 石英ガラス繊維含有プリプレグ、石英ガラス繊維含有フィルム及び石英ガラス繊維含有基板 |
| CN113372630A (zh) * | 2020-03-10 | 2021-09-10 | 旭化成株式会社 | 共轭二烯系聚合物组合物以及轮胎 |
| US12043741B2 (en) | 2020-03-10 | 2024-07-23 | Asahi Kasei Kabushiki Kaisha | Conjugated diene-based polymer composition and tire |
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| JPH0481526B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-12-24 |
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