JPS6211781B2 - - Google Patents

Info

Publication number
JPS6211781B2
JPS6211781B2 JP54153419A JP15341979A JPS6211781B2 JP S6211781 B2 JPS6211781 B2 JP S6211781B2 JP 54153419 A JP54153419 A JP 54153419A JP 15341979 A JP15341979 A JP 15341979A JP S6211781 B2 JPS6211781 B2 JP S6211781B2
Authority
JP
Japan
Prior art keywords
layer
amorphous silicon
sio
semiconductor
oxidizing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54153419A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5676537A (en
Inventor
Yoshiiku Togei
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15341979A priority Critical patent/JPS5676537A/ja
Publication of JPS5676537A publication Critical patent/JPS5676537A/ja
Publication of JPS6211781B2 publication Critical patent/JPS6211781B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P14/6308—

Landscapes

  • Formation Of Insulating Films (AREA)
JP15341979A 1979-11-27 1979-11-27 Manufacture of semiconductor device Granted JPS5676537A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15341979A JPS5676537A (en) 1979-11-27 1979-11-27 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15341979A JPS5676537A (en) 1979-11-27 1979-11-27 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5676537A JPS5676537A (en) 1981-06-24
JPS6211781B2 true JPS6211781B2 (en:Method) 1987-03-14

Family

ID=15562082

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15341979A Granted JPS5676537A (en) 1979-11-27 1979-11-27 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5676537A (en:Method)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5878465A (ja) * 1981-11-04 1983-05-12 Toshiba Corp 半導体装置の製造方法
GB2131407B (en) * 1982-11-12 1987-02-04 Rca Corp Method of formation of silicon dioxide layer
JPS59127841A (ja) * 1983-01-12 1984-07-23 Nippon Telegr & Teleph Corp <Ntt> 半導体装置の製造方法
JPS59184547A (ja) * 1983-04-04 1984-10-19 Agency Of Ind Science & Technol 半導体装置及びその製造方法
US4814291A (en) * 1986-02-25 1989-03-21 American Telephone And Telegraph Company, At&T Bell Laboratories Method of making devices having thin dielectric layers

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5523922B2 (en:Method) * 1973-05-17 1980-06-26
JPS5436181A (en) * 1977-08-26 1979-03-16 Fujitsu Ltd Manufacture for semiconductor device
JPS54128678A (en) * 1978-03-30 1979-10-05 Toshiba Corp Forming method of insulation film

Also Published As

Publication number Publication date
JPS5676537A (en) 1981-06-24

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