JPS6145868B2 - - Google Patents

Info

Publication number
JPS6145868B2
JPS6145868B2 JP13227478A JP13227478A JPS6145868B2 JP S6145868 B2 JPS6145868 B2 JP S6145868B2 JP 13227478 A JP13227478 A JP 13227478A JP 13227478 A JP13227478 A JP 13227478A JP S6145868 B2 JPS6145868 B2 JP S6145868B2
Authority
JP
Japan
Prior art keywords
metal layer
gate electrode
electrode portion
source
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13227478A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5559775A (en
Inventor
Hiroshi Tokunaga
Koichi Nishiuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13227478A priority Critical patent/JPS5559775A/ja
Publication of JPS5559775A publication Critical patent/JPS5559775A/ja
Publication of JPS6145868B2 publication Critical patent/JPS6145868B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
JP13227478A 1978-10-27 1978-10-27 Method of fabricating semiconductor device Granted JPS5559775A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13227478A JPS5559775A (en) 1978-10-27 1978-10-27 Method of fabricating semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13227478A JPS5559775A (en) 1978-10-27 1978-10-27 Method of fabricating semiconductor device

Publications (2)

Publication Number Publication Date
JPS5559775A JPS5559775A (en) 1980-05-06
JPS6145868B2 true JPS6145868B2 (enrdf_load_stackoverflow) 1986-10-09

Family

ID=15077440

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13227478A Granted JPS5559775A (en) 1978-10-27 1978-10-27 Method of fabricating semiconductor device

Country Status (1)

Country Link
JP (1) JPS5559775A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10366988B2 (en) 2015-08-14 2019-07-30 International Business Machines Corporation Selective contact etch for unmerged epitaxial source/drain regions

Also Published As

Publication number Publication date
JPS5559775A (en) 1980-05-06

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