JPS61170588A - 水酸化第四アンモニウム水溶液の製造方法 - Google Patents

水酸化第四アンモニウム水溶液の製造方法

Info

Publication number
JPS61170588A
JPS61170588A JP60012109A JP1210985A JPS61170588A JP S61170588 A JPS61170588 A JP S61170588A JP 60012109 A JP60012109 A JP 60012109A JP 1210985 A JP1210985 A JP 1210985A JP S61170588 A JPS61170588 A JP S61170588A
Authority
JP
Japan
Prior art keywords
quaternary ammonium
ammonium hydroxide
quat
tetramethylammonium
carbonate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60012109A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6315355B2 (OSRAM
Inventor
Shunpei Shimizu
駿平 清水
Toshitsura Chiyou
俊連 長
Osamu Yagi
修 八木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tama Kagaku Kogyo Co Ltd
Original Assignee
Tama Kagaku Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tama Kagaku Kogyo Co Ltd filed Critical Tama Kagaku Kogyo Co Ltd
Priority to JP60012109A priority Critical patent/JPS61170588A/ja
Priority to US06/822,073 priority patent/US4634509A/en
Publication of JPS61170588A publication Critical patent/JPS61170588A/ja
Publication of JPS6315355B2 publication Critical patent/JPS6315355B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B3/00—Electrolytic production of organic compounds
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B3/00—Electrolytic production of organic compounds
    • C25B3/01—Products
    • C25B3/07—Oxygen containing compounds
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B3/00—Electrolytic production of organic compounds
    • C25B3/01—Products
    • C25B3/09—Nitrogen containing compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP60012109A 1985-01-25 1985-01-25 水酸化第四アンモニウム水溶液の製造方法 Granted JPS61170588A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60012109A JPS61170588A (ja) 1985-01-25 1985-01-25 水酸化第四アンモニウム水溶液の製造方法
US06/822,073 US4634509A (en) 1985-01-25 1986-01-24 Method for production of aqueous quaternary ammonium hydroxide solution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60012109A JPS61170588A (ja) 1985-01-25 1985-01-25 水酸化第四アンモニウム水溶液の製造方法

Publications (2)

Publication Number Publication Date
JPS61170588A true JPS61170588A (ja) 1986-08-01
JPS6315355B2 JPS6315355B2 (OSRAM) 1988-04-04

Family

ID=11796394

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60012109A Granted JPS61170588A (ja) 1985-01-25 1985-01-25 水酸化第四アンモニウム水溶液の製造方法

Country Status (2)

Country Link
US (1) US4634509A (OSRAM)
JP (1) JPS61170588A (OSRAM)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63280045A (ja) * 1987-05-13 1988-11-17 Mitsubishi Petrochem Co Ltd 非環状脂肪族四級アンモニウム有機酸塩の製造方法
JPS63284148A (ja) * 1987-05-14 1988-11-21 Mitsubishi Petrochem Co Ltd 四級アンモニウム無機酸塩の製造方法
JP2013010988A (ja) * 2011-06-29 2013-01-17 Tama Kagaku Kogyo Kk 水酸化テトラアルキルアンモニウム含有廃液の再生処理方法
US11693321B2 (en) 2016-03-31 2023-07-04 Fujifilm Corporation Treatment liquid for manufacturing semiconductor, storage container storing treatment liquid for manufacturing semiconductor, pattern forming method, and method of manufacturing electronic device

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4776929A (en) * 1986-11-25 1988-10-11 Mitsubishi Gas Chemical Company, Inc. Process for production of quaternary ammonium hydroxides
US4892944A (en) * 1987-05-13 1990-01-09 Mitsubishi Petrochemical Co., Ltd. Process for producing quaternary salts
US5439564A (en) * 1992-11-10 1995-08-08 Tama Chemicals Co. Ltd. Method of processing organic quaternary ammonium hydroxide-containing waste liquid
US5393386A (en) * 1992-12-28 1995-02-28 Mitsubishi Gas Chemical Company, Inc. Method for preparing aqueous quaternary ammonium hydroxide solution
US5783495A (en) * 1995-11-13 1998-07-21 Micron Technology, Inc. Method of wafer cleaning, and system and cleaning solution regarding same
US5746993A (en) * 1996-10-17 1998-05-05 Advanced Micro Devices, Inc. Process for manufacture of ultra-high purity ammonium hydroxide
US5968338A (en) * 1998-01-20 1999-10-19 Sachem, Inc. Process for recovering onium hydroxides from solutions containing onium compounds
US6288009B1 (en) * 1998-04-10 2001-09-11 Basf Corporation Plant growth regulator compositions
US6290863B1 (en) 1999-07-31 2001-09-18 Micron Technology, Inc. Method and apparatus for etch of a specific subarea of a semiconductor work object
FR2803856B1 (fr) * 2000-01-13 2002-07-05 Atofina Synthese de l'hydroxyde de tetramethylammonium
US6508940B1 (en) 2000-10-20 2003-01-21 Sachem, Inc. Process for recovering onium hydroxides from solutions containing onium compounds
UA76478C2 (uk) * 2001-07-09 2006-08-15 Лонза Інк. Способи одержання алкілкарбонатів четвертинного амонію in situ
JP2004161875A (ja) * 2002-11-13 2004-06-10 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜とその製造方法、層間絶縁間膜及び半導体装置
JP3884699B2 (ja) * 2002-11-13 2007-02-21 信越化学工業株式会社 多孔質膜形成用組成物、多孔質膜とその製造方法、層間絶縁膜及び半導体装置
JP2004161876A (ja) * 2002-11-13 2004-06-10 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜とその製造方法、層間絶縁膜及び半導体装置
JP2004161877A (ja) * 2002-11-13 2004-06-10 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜とその製造方法、層間絶縁膜及び半導体装置
JP2004269693A (ja) * 2003-03-10 2004-09-30 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物及びその製造方法、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置
JP4139710B2 (ja) * 2003-03-10 2008-08-27 信越化学工業株式会社 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置
JP2004292641A (ja) * 2003-03-27 2004-10-21 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置
JP2004307692A (ja) * 2003-04-09 2004-11-04 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜及び半導体装置
JP2004307693A (ja) * 2003-04-09 2004-11-04 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置
JP2004307694A (ja) * 2003-04-09 2004-11-04 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜及び半導体装置。
JP2007530593A (ja) 2004-03-26 2007-11-01 アルベマール・コーポレーシヨン テトラアルキルアンモニウム塩のアニオンを交換する方法
US20070255074A1 (en) * 2004-03-26 2007-11-01 Sauer Joe D Method for Exchanging Anions of Tetraalkylammonium Salts
US20070260089A1 (en) * 2004-03-26 2007-11-08 Albemarle Corporation Method for the Synthesis of Quaternary Ammonium Compounds and Compositions Thereof
JP4476759B2 (ja) * 2004-09-17 2010-06-09 多摩化学工業株式会社 電解用電極の製造方法、及びこの電解用電極を用いた水酸化第四アンモニウム水溶液の製造方法
US20070167407A1 (en) * 2005-12-20 2007-07-19 Albemarle Corporation Quaternary ammonium borate compositions and substrate preservative solutions containing them
CN106350831A (zh) * 2016-08-26 2017-01-25 肯特催化材料股份有限公司 分子筛模板剂高纯度金刚烷基三甲基氢氧化铵水溶液的制备方法
CN114570307A (zh) * 2022-03-18 2022-06-03 西安吉利电子新材料股份有限公司 一种从碳酸二甲酯直接生产电子级四甲基氢氧化铵制备系统及方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60131986A (ja) * 1983-12-19 1985-07-13 Showa Denko Kk 高純度第４級アンモニウム水酸化物の製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3402115A (en) * 1965-03-12 1968-09-17 Monsanto Co Preparation of quaternary ammonium hydroxides by electrodialysis
US3523068A (en) * 1966-12-19 1970-08-04 Monsanto Co Process for electrolytic preparation of quaternary ammonium compounds
US4394226A (en) * 1981-07-28 1983-07-19 Thiokol Corporation Electrolytic method for producing quaternary ammonium hydroxides
JPS60100690A (ja) * 1983-11-02 1985-06-04 Tama Kagaku Kogyo Kk 水酸化第四アンモニウムの製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60131986A (ja) * 1983-12-19 1985-07-13 Showa Denko Kk 高純度第４級アンモニウム水酸化物の製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63280045A (ja) * 1987-05-13 1988-11-17 Mitsubishi Petrochem Co Ltd 非環状脂肪族四級アンモニウム有機酸塩の製造方法
JPS63284148A (ja) * 1987-05-14 1988-11-21 Mitsubishi Petrochem Co Ltd 四級アンモニウム無機酸塩の製造方法
JP2013010988A (ja) * 2011-06-29 2013-01-17 Tama Kagaku Kogyo Kk 水酸化テトラアルキルアンモニウム含有廃液の再生処理方法
US11693321B2 (en) 2016-03-31 2023-07-04 Fujifilm Corporation Treatment liquid for manufacturing semiconductor, storage container storing treatment liquid for manufacturing semiconductor, pattern forming method, and method of manufacturing electronic device
US11892775B2 (en) 2016-03-31 2024-02-06 Fujifilm Corporation Storage container storing treatment liquid for manufacturing semiconductor

Also Published As

Publication number Publication date
US4634509A (en) 1987-01-06
JPS6315355B2 (OSRAM) 1988-04-04

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