JPS6022353Y2 - ホトマスク - Google Patents

ホトマスク

Info

Publication number
JPS6022353Y2
JPS6022353Y2 JP1979105506U JP10550679U JPS6022353Y2 JP S6022353 Y2 JPS6022353 Y2 JP S6022353Y2 JP 1979105506 U JP1979105506 U JP 1979105506U JP 10550679 U JP10550679 U JP 10550679U JP S6022353 Y2 JPS6022353 Y2 JP S6022353Y2
Authority
JP
Japan
Prior art keywords
pattern
metal
photomask
patterns
island
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1979105506U
Other languages
English (en)
Japanese (ja)
Other versions
JPS5623936U (enExample
Inventor
伸樹 河村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP1979105506U priority Critical patent/JPS6022353Y2/ja
Publication of JPS5623936U publication Critical patent/JPS5623936U/ja
Application granted granted Critical
Publication of JPS6022353Y2 publication Critical patent/JPS6022353Y2/ja
Expired legal-status Critical Current

Links

JP1979105506U 1979-07-31 1979-07-31 ホトマスク Expired JPS6022353Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1979105506U JPS6022353Y2 (ja) 1979-07-31 1979-07-31 ホトマスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1979105506U JPS6022353Y2 (ja) 1979-07-31 1979-07-31 ホトマスク

Publications (2)

Publication Number Publication Date
JPS5623936U JPS5623936U (enExample) 1981-03-04
JPS6022353Y2 true JPS6022353Y2 (ja) 1985-07-03

Family

ID=29338164

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1979105506U Expired JPS6022353Y2 (ja) 1979-07-31 1979-07-31 ホトマスク

Country Status (1)

Country Link
JP (1) JPS6022353Y2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008111198A1 (ja) * 2007-03-14 2008-09-18 Fujitsu Microelectronics Limited フォトマスク
JP4993113B2 (ja) * 2007-11-14 2012-08-08 大日本印刷株式会社 フォトマスク
JP2009128558A (ja) * 2007-11-22 2009-06-11 Hoya Corp フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法

Also Published As

Publication number Publication date
JPS5623936U (enExample) 1981-03-04

Similar Documents

Publication Publication Date Title
JP2701765B2 (ja) 半導体装置の製造方法
JPS6022353Y2 (ja) ホトマスク
US4347264A (en) Method of applying contacts to a silicon wafer and product formed thereby
US5792374A (en) Method of fabricating a color image sensor from a gray scale image sensor
JPH10308397A (ja) 電極端子及びその製造方法
JP2580681B2 (ja) 半導体装置の製造方法
JPS604943A (ja) フオトマスク
JPS6220843Y2 (enExample)
KR100218362B1 (ko) 정전기 방지용 마스크
JP2588545B2 (ja) 配線の形成方法
JPS60207336A (ja) ホトエツチング用露光方法
JPS63288020A (ja) 電極作成方法
JPS5916332A (ja) 半導体装置の製造方法
JPS6148706B2 (enExample)
JPH01173717A (ja) ブランク板
JPH0216360Y2 (enExample)
JPS6212913B2 (enExample)
JPS58197750A (ja) 半導体装置及びその製造方法
KR960007805B1 (ko) 반도체 집적회로의 패턴 형성방법
JPS5713740A (en) Forming method for conductor pattern
JPS63182654A (ja) ホトマスク製造方法
JPS6151968A (ja) 半導体装置の製造方法
JPS6074629A (ja) 薄膜のパタ−ン形成方法
JPS5833253A (ja) 露光用マスク
JPH02248950A (ja) フォトマスク