JPS6220843Y2 - - Google Patents
Info
- Publication number
- JPS6220843Y2 JPS6220843Y2 JP1982014869U JP1486982U JPS6220843Y2 JP S6220843 Y2 JPS6220843 Y2 JP S6220843Y2 JP 1982014869 U JP1982014869 U JP 1982014869U JP 1486982 U JP1486982 U JP 1486982U JP S6220843 Y2 JPS6220843 Y2 JP S6220843Y2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- mask
- patterns
- chromium
- main
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 18
- 229910052804 chromium Inorganic materials 0.000 claims description 15
- 239000011651 chromium Substances 0.000 claims description 15
- 239000011521 glass Substances 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 229920002120 photoresistant polymer Polymers 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- XMPZTFVPEKAKFH-UHFFFAOYSA-P ceric ammonium nitrate Chemical compound [NH4+].[NH4+].[Ce+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O XMPZTFVPEKAKFH-UHFFFAOYSA-P 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1982014869U JPS58118439U (ja) | 1982-02-04 | 1982-02-04 | フオトマスク |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1982014869U JPS58118439U (ja) | 1982-02-04 | 1982-02-04 | フオトマスク |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58118439U JPS58118439U (ja) | 1983-08-12 |
| JPS6220843Y2 true JPS6220843Y2 (enExample) | 1987-05-27 |
Family
ID=30027322
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1982014869U Granted JPS58118439U (ja) | 1982-02-04 | 1982-02-04 | フオトマスク |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58118439U (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009086385A (ja) * | 2007-09-29 | 2009-04-23 | Hoya Corp | フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法 |
| JP5736113B2 (ja) * | 2010-02-18 | 2015-06-17 | 株式会社ニューフレアテクノロジー | 露光用マスクの製造方法 |
-
1982
- 1982-02-04 JP JP1982014869U patent/JPS58118439U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58118439U (ja) | 1983-08-12 |
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