JPS59224176A - 電界効果トランジスタの製造方法 - Google Patents
電界効果トランジスタの製造方法Info
- Publication number
- JPS59224176A JPS59224176A JP58098844A JP9884483A JPS59224176A JP S59224176 A JPS59224176 A JP S59224176A JP 58098844 A JP58098844 A JP 58098844A JP 9884483 A JP9884483 A JP 9884483A JP S59224176 A JPS59224176 A JP S59224176A
- Authority
- JP
- Japan
- Prior art keywords
- film
- gate electrode
- active layer
- photoresist
- field effect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
Landscapes
- Junction Field-Effect Transistors (AREA)
- Electrodes Of Semiconductors (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58098844A JPS59224176A (ja) | 1983-06-03 | 1983-06-03 | 電界効果トランジスタの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58098844A JPS59224176A (ja) | 1983-06-03 | 1983-06-03 | 電界効果トランジスタの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59224176A true JPS59224176A (ja) | 1984-12-17 |
| JPH047101B2 JPH047101B2 (enExample) | 1992-02-07 |
Family
ID=14230553
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58098844A Granted JPS59224176A (ja) | 1983-06-03 | 1983-06-03 | 電界効果トランジスタの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59224176A (enExample) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5370770A (en) * | 1976-12-07 | 1978-06-23 | Nec Corp | Production of schottky barrier gate type field effect transistor |
| JPS5382267A (en) * | 1976-12-28 | 1978-07-20 | Nec Corp | Anodizing method |
| JPS54162461A (en) * | 1978-06-13 | 1979-12-24 | Matsushita Electric Ind Co Ltd | Manufacture for semiconductor device |
| JPS5595371A (en) * | 1979-01-12 | 1980-07-19 | Matsushita Electric Ind Co Ltd | Manufacture of semiconductor device |
| JPS5730376A (en) * | 1980-07-30 | 1982-02-18 | Fujitsu Ltd | Manufacture of schottky barrier fet |
| JPS5789261A (en) * | 1980-11-25 | 1982-06-03 | Fujitsu Ltd | Manufacture of semiconductor device |
| JPS57141919A (en) * | 1981-02-26 | 1982-09-02 | Fujitsu Ltd | Manufacture of semiconductor device |
-
1983
- 1983-06-03 JP JP58098844A patent/JPS59224176A/ja active Granted
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5370770A (en) * | 1976-12-07 | 1978-06-23 | Nec Corp | Production of schottky barrier gate type field effect transistor |
| JPS5382267A (en) * | 1976-12-28 | 1978-07-20 | Nec Corp | Anodizing method |
| JPS54162461A (en) * | 1978-06-13 | 1979-12-24 | Matsushita Electric Ind Co Ltd | Manufacture for semiconductor device |
| JPS5595371A (en) * | 1979-01-12 | 1980-07-19 | Matsushita Electric Ind Co Ltd | Manufacture of semiconductor device |
| JPS5730376A (en) * | 1980-07-30 | 1982-02-18 | Fujitsu Ltd | Manufacture of schottky barrier fet |
| JPS5789261A (en) * | 1980-11-25 | 1982-06-03 | Fujitsu Ltd | Manufacture of semiconductor device |
| JPS57141919A (en) * | 1981-02-26 | 1982-09-02 | Fujitsu Ltd | Manufacture of semiconductor device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH047101B2 (enExample) | 1992-02-07 |
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