JPS59224176A - 電界効果トランジスタの製造方法 - Google Patents
電界効果トランジスタの製造方法Info
- Publication number
- JPS59224176A JPS59224176A JP58098844A JP9884483A JPS59224176A JP S59224176 A JPS59224176 A JP S59224176A JP 58098844 A JP58098844 A JP 58098844A JP 9884483 A JP9884483 A JP 9884483A JP S59224176 A JPS59224176 A JP S59224176A
- Authority
- JP
- Japan
- Prior art keywords
- film
- gate electrode
- active layer
- photoresist
- field effect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
Landscapes
- Electrodes Of Semiconductors (AREA)
- Weting (AREA)
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58098844A JPS59224176A (ja) | 1983-06-03 | 1983-06-03 | 電界効果トランジスタの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58098844A JPS59224176A (ja) | 1983-06-03 | 1983-06-03 | 電界効果トランジスタの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59224176A true JPS59224176A (ja) | 1984-12-17 |
JPH047101B2 JPH047101B2 (enrdf_load_stackoverflow) | 1992-02-07 |
Family
ID=14230553
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58098844A Granted JPS59224176A (ja) | 1983-06-03 | 1983-06-03 | 電界効果トランジスタの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59224176A (enrdf_load_stackoverflow) |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5370770A (en) * | 1976-12-07 | 1978-06-23 | Nec Corp | Production of schottky barrier gate type field effect transistor |
JPS5382267A (en) * | 1976-12-28 | 1978-07-20 | Nec Corp | Anodizing method |
JPS54162461A (en) * | 1978-06-13 | 1979-12-24 | Matsushita Electric Ind Co Ltd | Manufacture for semiconductor device |
JPS5595371A (en) * | 1979-01-12 | 1980-07-19 | Matsushita Electric Ind Co Ltd | Manufacture of semiconductor device |
JPS5730376A (en) * | 1980-07-30 | 1982-02-18 | Fujitsu Ltd | Manufacture of schottky barrier fet |
JPS5789261A (en) * | 1980-11-25 | 1982-06-03 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS57141919A (en) * | 1981-02-26 | 1982-09-02 | Fujitsu Ltd | Manufacture of semiconductor device |
-
1983
- 1983-06-03 JP JP58098844A patent/JPS59224176A/ja active Granted
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5370770A (en) * | 1976-12-07 | 1978-06-23 | Nec Corp | Production of schottky barrier gate type field effect transistor |
JPS5382267A (en) * | 1976-12-28 | 1978-07-20 | Nec Corp | Anodizing method |
JPS54162461A (en) * | 1978-06-13 | 1979-12-24 | Matsushita Electric Ind Co Ltd | Manufacture for semiconductor device |
JPS5595371A (en) * | 1979-01-12 | 1980-07-19 | Matsushita Electric Ind Co Ltd | Manufacture of semiconductor device |
JPS5730376A (en) * | 1980-07-30 | 1982-02-18 | Fujitsu Ltd | Manufacture of schottky barrier fet |
JPS5789261A (en) * | 1980-11-25 | 1982-06-03 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS57141919A (en) * | 1981-02-26 | 1982-09-02 | Fujitsu Ltd | Manufacture of semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPH047101B2 (enrdf_load_stackoverflow) | 1992-02-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4377899A (en) | Method of manufacturing Schottky field-effect transistors utilizing shadow masking | |
KR970004846B1 (ko) | 반도체 장치 | |
JPH0472381B2 (enrdf_load_stackoverflow) | ||
JP2685026B2 (ja) | 電界効果トランジスタおよび製造方法 | |
JPS59224176A (ja) | 電界効果トランジスタの製造方法 | |
JPH0260222B2 (enrdf_load_stackoverflow) | ||
JPS62169483A (ja) | シヨツトキゲ−ト電界効果トランジスタの構造及び製造方法 | |
JPS59224178A (ja) | 電界効果トランジスタの製造方法 | |
JPS5838945B2 (ja) | シヨット障壁型電界効果トランジスタの製造方法 | |
JPS5833714B2 (ja) | 砒化ガリウムショットキ障壁ゲ−ト型電界効果トランジスタの製造方法 | |
JPS6252957B2 (enrdf_load_stackoverflow) | ||
JPS6057977A (ja) | シヨツトキゲ−ト型電界効果トランジスタの製造方法 | |
JP2003059949A (ja) | 電界効果トランジスタ及び電界効果トランジスタの製造方法 | |
JP2557432B2 (ja) | 電界効果トランジスタ | |
JP2658884B2 (ja) | 半導体装置の製造方法 | |
JPS59224177A (ja) | 電界効果トランジスタの製造方法 | |
JPS62156877A (ja) | シヨツトキ−ゲ−ト電界効果トランジスタおよびその製造方法 | |
KR100225899B1 (ko) | 화합물 반도체 장치 및 그 제조 방법 | |
KR950008264B1 (ko) | 갈륨비소 전계효과 트랜지스터의 제조방법 | |
JPH0713977B2 (ja) | シヨツトキ−障壁ゲ−ト型電界効果トランジスタの製造方法 | |
JPH04274332A (ja) | 半導体装置の製造方法 | |
JPH05175243A (ja) | 半導体装置の製造方法 | |
JPS5850434B2 (ja) | 電界効果トランジスタの製造方法 | |
JPH0574814A (ja) | シヨツトキ・ゲート形電界効果トランジスタの製造方法 | |
JPH04212428A (ja) | 半導体装置の製造方法 |