JPS5919320A - 検出光学系 - Google Patents
検出光学系Info
- Publication number
- JPS5919320A JPS5919320A JP57128560A JP12856082A JPS5919320A JP S5919320 A JPS5919320 A JP S5919320A JP 57128560 A JP57128560 A JP 57128560A JP 12856082 A JP12856082 A JP 12856082A JP S5919320 A JPS5919320 A JP S5919320A
- Authority
- JP
- Japan
- Prior art keywords
- optical system
- lens
- imaging
- optical
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Projection-Type Copiers In General (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57128560A JPS5919320A (ja) | 1982-07-23 | 1982-07-23 | 検出光学系 |
| GB08319312A GB2126746B (en) | 1982-07-23 | 1983-07-18 | Compensating for optical path length changes |
| DE19833326346 DE3326346A1 (de) | 1982-07-23 | 1983-07-21 | Optische vorrichtung zur aufrechterhaltung der pupillenabbildung |
| US07/094,086 US4830499A (en) | 1982-07-23 | 1987-09-04 | Optical device capable of maintaining pupil imaging |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57128560A JPS5919320A (ja) | 1982-07-23 | 1982-07-23 | 検出光学系 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5919320A true JPS5919320A (ja) | 1984-01-31 |
| JPH0359568B2 JPH0359568B2 (enExample) | 1991-09-11 |
Family
ID=14987777
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57128560A Granted JPS5919320A (ja) | 1982-07-23 | 1982-07-23 | 検出光学系 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4830499A (enExample) |
| JP (1) | JPS5919320A (enExample) |
| DE (1) | DE3326346A1 (enExample) |
| GB (1) | GB2126746B (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6159829A (ja) * | 1984-08-31 | 1986-03-27 | Hitachi Ltd | 縮小投影式アライメント装置 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0795144B2 (ja) * | 1988-10-05 | 1995-10-11 | 日商精密光学株式会社 | 顕微鏡用光学系アタッチメント |
| US6166866A (en) | 1995-02-28 | 2000-12-26 | Canon Kabushiki Kaisha | Reflecting type optical system |
| EP0730180B1 (en) | 1995-02-28 | 2002-09-04 | Canon Kabushiki Kaisha | Reflecting type of zoom lens |
| JP3292051B2 (ja) * | 1996-07-19 | 2002-06-17 | キヤノン株式会社 | 変倍光学系及びそれを用いた撮像装置 |
| DE102004021600A1 (de) * | 2004-05-03 | 2005-12-08 | Gretag-Macbeth Ag | Vorrichtung zur Inline-Überwachung der Druckqualität bei Bogenoffsetdruckmaschinen |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB699331A (en) * | 1952-01-02 | 1953-11-04 | Monotype Corp Ltd | Optical system for photo-composing machines |
| GB751149A (en) * | 1953-04-25 | 1956-06-27 | Zeiss Stiftung | Optical imaging system especially for a measuring microscope |
| US3346739A (en) * | 1964-05-18 | 1967-10-10 | Gen Precision Systems Inc | Photosensitive character reading apparatus |
| GB1210055A (en) * | 1968-03-19 | 1970-10-28 | Ricoh Kk | Improvements in and relating to photographic exposure arrangements |
| GB1260920A (en) * | 1968-03-19 | 1972-01-19 | Ricoh Kk | Improvements in and relating to photographic exposure arrangements |
| GB1203016A (en) * | 1968-03-19 | 1970-08-26 | Ricoh Kk | Improvements in and relating to photographic exposure arrangements |
| US3709602A (en) * | 1971-11-05 | 1973-01-09 | Ricoh Kk | Optical path length compensation in a copier |
| US3790256A (en) * | 1971-12-13 | 1974-02-05 | Singer Co | Roll and focus apparatus |
| US3947188A (en) * | 1974-11-11 | 1976-03-30 | Xerox Corporation | Variable conjugate optical system |
| JPS593791B2 (ja) * | 1975-04-07 | 1984-01-26 | キヤノン株式会社 | 物体の像認識方法 |
| US4029396A (en) * | 1976-08-06 | 1977-06-14 | Farrand Optical Co., Inc. | Lens system for modifying spherical aberration |
| GB1516799A (en) * | 1976-12-17 | 1978-07-05 | Essilor Int | Levels |
| JPS53111697A (en) * | 1977-03-11 | 1978-09-29 | Asahi Optical Co Ltd | Optical system of objective automatic ophthalmoscope |
| DE2843282A1 (de) * | 1977-10-05 | 1979-04-12 | Canon Kk | Fotoelektrische erfassungsvorrichtung |
| DE2910280C2 (de) * | 1978-03-18 | 1993-10-28 | Canon Kk | Optische Abbildungssysteme |
| JPS57142612A (en) * | 1981-02-27 | 1982-09-03 | Nippon Kogaku Kk <Nikon> | Alignment optical system of projection type exposure device |
-
1982
- 1982-07-23 JP JP57128560A patent/JPS5919320A/ja active Granted
-
1983
- 1983-07-18 GB GB08319312A patent/GB2126746B/en not_active Expired
- 1983-07-21 DE DE19833326346 patent/DE3326346A1/de not_active Ceased
-
1987
- 1987-09-04 US US07/094,086 patent/US4830499A/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6159829A (ja) * | 1984-08-31 | 1986-03-27 | Hitachi Ltd | 縮小投影式アライメント装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| GB2126746A (en) | 1984-03-28 |
| GB2126746B (en) | 1986-10-08 |
| JPH0359568B2 (enExample) | 1991-09-11 |
| US4830499A (en) | 1989-05-16 |
| DE3326346A1 (de) | 1984-01-26 |
| GB8319312D0 (en) | 1983-08-17 |
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