JPH0359568B2 - - Google Patents

Info

Publication number
JPH0359568B2
JPH0359568B2 JP57128560A JP12856082A JPH0359568B2 JP H0359568 B2 JPH0359568 B2 JP H0359568B2 JP 57128560 A JP57128560 A JP 57128560A JP 12856082 A JP12856082 A JP 12856082A JP H0359568 B2 JPH0359568 B2 JP H0359568B2
Authority
JP
Japan
Prior art keywords
optical system
imaging
optical
lens
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57128560A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5919320A (ja
Inventor
Michio Kono
Hideki Ine
Akyoshi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP57128560A priority Critical patent/JPS5919320A/ja
Priority to GB08319312A priority patent/GB2126746B/en
Priority to DE19833326346 priority patent/DE3326346A1/de
Publication of JPS5919320A publication Critical patent/JPS5919320A/ja
Priority to US07/094,086 priority patent/US4830499A/en
Publication of JPH0359568B2 publication Critical patent/JPH0359568B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Projection-Type Copiers In General (AREA)
JP57128560A 1982-07-23 1982-07-23 検出光学系 Granted JPS5919320A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP57128560A JPS5919320A (ja) 1982-07-23 1982-07-23 検出光学系
GB08319312A GB2126746B (en) 1982-07-23 1983-07-18 Compensating for optical path length changes
DE19833326346 DE3326346A1 (de) 1982-07-23 1983-07-21 Optische vorrichtung zur aufrechterhaltung der pupillenabbildung
US07/094,086 US4830499A (en) 1982-07-23 1987-09-04 Optical device capable of maintaining pupil imaging

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57128560A JPS5919320A (ja) 1982-07-23 1982-07-23 検出光学系

Publications (2)

Publication Number Publication Date
JPS5919320A JPS5919320A (ja) 1984-01-31
JPH0359568B2 true JPH0359568B2 (enExample) 1991-09-11

Family

ID=14987777

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57128560A Granted JPS5919320A (ja) 1982-07-23 1982-07-23 検出光学系

Country Status (4)

Country Link
US (1) US4830499A (enExample)
JP (1) JPS5919320A (enExample)
DE (1) DE3326346A1 (enExample)
GB (1) GB2126746B (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6159829A (ja) * 1984-08-31 1986-03-27 Hitachi Ltd 縮小投影式アライメント装置
JPH0795144B2 (ja) * 1988-10-05 1995-10-11 日商精密光学株式会社 顕微鏡用光学系アタッチメント
US6166866A (en) 1995-02-28 2000-12-26 Canon Kabushiki Kaisha Reflecting type optical system
EP0730180B1 (en) 1995-02-28 2002-09-04 Canon Kabushiki Kaisha Reflecting type of zoom lens
JP3292051B2 (ja) * 1996-07-19 2002-06-17 キヤノン株式会社 変倍光学系及びそれを用いた撮像装置
DE102004021600A1 (de) * 2004-05-03 2005-12-08 Gretag-Macbeth Ag Vorrichtung zur Inline-Überwachung der Druckqualität bei Bogenoffsetdruckmaschinen

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB699331A (en) * 1952-01-02 1953-11-04 Monotype Corp Ltd Optical system for photo-composing machines
GB751149A (en) * 1953-04-25 1956-06-27 Zeiss Stiftung Optical imaging system especially for a measuring microscope
US3346739A (en) * 1964-05-18 1967-10-10 Gen Precision Systems Inc Photosensitive character reading apparatus
GB1210055A (en) * 1968-03-19 1970-10-28 Ricoh Kk Improvements in and relating to photographic exposure arrangements
GB1260920A (en) * 1968-03-19 1972-01-19 Ricoh Kk Improvements in and relating to photographic exposure arrangements
GB1203016A (en) * 1968-03-19 1970-08-26 Ricoh Kk Improvements in and relating to photographic exposure arrangements
US3709602A (en) * 1971-11-05 1973-01-09 Ricoh Kk Optical path length compensation in a copier
US3790256A (en) * 1971-12-13 1974-02-05 Singer Co Roll and focus apparatus
US3947188A (en) * 1974-11-11 1976-03-30 Xerox Corporation Variable conjugate optical system
JPS593791B2 (ja) * 1975-04-07 1984-01-26 キヤノン株式会社 物体の像認識方法
US4029396A (en) * 1976-08-06 1977-06-14 Farrand Optical Co., Inc. Lens system for modifying spherical aberration
GB1516799A (en) * 1976-12-17 1978-07-05 Essilor Int Levels
JPS53111697A (en) * 1977-03-11 1978-09-29 Asahi Optical Co Ltd Optical system of objective automatic ophthalmoscope
DE2843282A1 (de) * 1977-10-05 1979-04-12 Canon Kk Fotoelektrische erfassungsvorrichtung
DE2910280C2 (de) * 1978-03-18 1993-10-28 Canon Kk Optische Abbildungssysteme
JPS57142612A (en) * 1981-02-27 1982-09-03 Nippon Kogaku Kk <Nikon> Alignment optical system of projection type exposure device

Also Published As

Publication number Publication date
JPS5919320A (ja) 1984-01-31
GB2126746A (en) 1984-03-28
GB2126746B (en) 1986-10-08
US4830499A (en) 1989-05-16
DE3326346A1 (de) 1984-01-26
GB8319312D0 (en) 1983-08-17

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