DE3326346A1 - Optische vorrichtung zur aufrechterhaltung der pupillenabbildung - Google Patents

Optische vorrichtung zur aufrechterhaltung der pupillenabbildung

Info

Publication number
DE3326346A1
DE3326346A1 DE19833326346 DE3326346A DE3326346A1 DE 3326346 A1 DE3326346 A1 DE 3326346A1 DE 19833326346 DE19833326346 DE 19833326346 DE 3326346 A DE3326346 A DE 3326346A DE 3326346 A1 DE3326346 A1 DE 3326346A1
Authority
DE
Germany
Prior art keywords
objective lens
optical
reflective surfaces
optical path
llo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE19833326346
Other languages
German (de)
English (en)
Inventor
Hideki Yokohama Kanagawa Ina
Michio Tokyo Kohno
Akiyoshi Tokyo Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE3326346A1 publication Critical patent/DE3326346A1/de
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Projection-Type Copiers In General (AREA)
DE19833326346 1982-07-23 1983-07-21 Optische vorrichtung zur aufrechterhaltung der pupillenabbildung Ceased DE3326346A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57128560A JPS5919320A (ja) 1982-07-23 1982-07-23 検出光学系

Publications (1)

Publication Number Publication Date
DE3326346A1 true DE3326346A1 (de) 1984-01-26

Family

ID=14987777

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19833326346 Ceased DE3326346A1 (de) 1982-07-23 1983-07-21 Optische vorrichtung zur aufrechterhaltung der pupillenabbildung

Country Status (4)

Country Link
US (1) US4830499A (enExample)
JP (1) JPS5919320A (enExample)
DE (1) DE3326346A1 (enExample)
GB (1) GB2126746B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004021600A1 (de) * 2004-05-03 2005-12-08 Gretag-Macbeth Ag Vorrichtung zur Inline-Überwachung der Druckqualität bei Bogenoffsetdruckmaschinen

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6159829A (ja) * 1984-08-31 1986-03-27 Hitachi Ltd 縮小投影式アライメント装置
JPH0795144B2 (ja) * 1988-10-05 1995-10-11 日商精密光学株式会社 顕微鏡用光学系アタッチメント
US6166866A (en) 1995-02-28 2000-12-26 Canon Kabushiki Kaisha Reflecting type optical system
EP0730180B1 (en) 1995-02-28 2002-09-04 Canon Kabushiki Kaisha Reflecting type of zoom lens
JP3292051B2 (ja) * 1996-07-19 2002-06-17 キヤノン株式会社 変倍光学系及びそれを用いた撮像装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB751149A (en) * 1953-04-25 1956-06-27 Zeiss Stiftung Optical imaging system especially for a measuring microscope
GB1404025A (en) * 1971-12-13 1975-08-28 Singer Co Roll and focus apparatus
GB1579579A (en) * 1976-08-06 1980-11-19 Farrand Optical Co Inc Lens system for spherical aberration
DE2615084C2 (de) * 1975-04-07 1985-01-31 Canon K.K., Tokio/Tokyo Vorrichtung zur Beobachtung der Position der Markierung eines Objekts

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB699331A (en) * 1952-01-02 1953-11-04 Monotype Corp Ltd Optical system for photo-composing machines
US3346739A (en) * 1964-05-18 1967-10-10 Gen Precision Systems Inc Photosensitive character reading apparatus
GB1210055A (en) * 1968-03-19 1970-10-28 Ricoh Kk Improvements in and relating to photographic exposure arrangements
GB1260920A (en) * 1968-03-19 1972-01-19 Ricoh Kk Improvements in and relating to photographic exposure arrangements
GB1203016A (en) * 1968-03-19 1970-08-26 Ricoh Kk Improvements in and relating to photographic exposure arrangements
US3709602A (en) * 1971-11-05 1973-01-09 Ricoh Kk Optical path length compensation in a copier
US3947188A (en) * 1974-11-11 1976-03-30 Xerox Corporation Variable conjugate optical system
GB1516799A (en) * 1976-12-17 1978-07-05 Essilor Int Levels
JPS53111697A (en) * 1977-03-11 1978-09-29 Asahi Optical Co Ltd Optical system of objective automatic ophthalmoscope
DE2843282A1 (de) * 1977-10-05 1979-04-12 Canon Kk Fotoelektrische erfassungsvorrichtung
DE2910280C2 (de) * 1978-03-18 1993-10-28 Canon Kk Optische Abbildungssysteme
JPS57142612A (en) * 1981-02-27 1982-09-03 Nippon Kogaku Kk <Nikon> Alignment optical system of projection type exposure device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB751149A (en) * 1953-04-25 1956-06-27 Zeiss Stiftung Optical imaging system especially for a measuring microscope
GB1404025A (en) * 1971-12-13 1975-08-28 Singer Co Roll and focus apparatus
DE2615084C2 (de) * 1975-04-07 1985-01-31 Canon K.K., Tokio/Tokyo Vorrichtung zur Beobachtung der Position der Markierung eines Objekts
GB1579579A (en) * 1976-08-06 1980-11-19 Farrand Optical Co Inc Lens system for spherical aberration

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004021600A1 (de) * 2004-05-03 2005-12-08 Gretag-Macbeth Ag Vorrichtung zur Inline-Überwachung der Druckqualität bei Bogenoffsetdruckmaschinen
US7334520B2 (en) 2004-05-03 2008-02-26 Heidelberger Druckmaschinen Ag Printing press and device for the inline monitoring of printing quality in sheet-fed offset printing presses

Also Published As

Publication number Publication date
JPS5919320A (ja) 1984-01-31
GB2126746A (en) 1984-03-28
GB2126746B (en) 1986-10-08
JPH0359568B2 (enExample) 1991-09-11
US4830499A (en) 1989-05-16
GB8319312D0 (en) 1983-08-17

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
8131 Rejection