DE69708208T2 - Abtastbelichtungsapparat mit System zur Detektion einer Oberflächenlage - Google Patents

Abtastbelichtungsapparat mit System zur Detektion einer Oberflächenlage

Info

Publication number
DE69708208T2
DE69708208T2 DE69708208T DE69708208T DE69708208T2 DE 69708208 T2 DE69708208 T2 DE 69708208T2 DE 69708208 T DE69708208 T DE 69708208T DE 69708208 T DE69708208 T DE 69708208T DE 69708208 T2 DE69708208 T2 DE 69708208T2
Authority
DE
Germany
Prior art keywords
detecting
exposure apparatus
surface position
scanning exposure
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69708208T
Other languages
English (en)
Other versions
DE69708208D1 (de
Inventor
Haruna Kawashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69708208D1 publication Critical patent/DE69708208D1/de
Publication of DE69708208T2 publication Critical patent/DE69708208T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69708208T 1996-06-13 1997-06-12 Abtastbelichtungsapparat mit System zur Detektion einer Oberflächenlage Expired - Lifetime DE69708208T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP17433996 1996-06-13
JP12633897A JP3634558B2 (ja) 1996-06-13 1997-04-30 露光装置及びそれを用いたデバイスの製造方法

Publications (2)

Publication Number Publication Date
DE69708208D1 DE69708208D1 (de) 2001-12-20
DE69708208T2 true DE69708208T2 (de) 2002-06-06

Family

ID=26462551

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69708208T Expired - Lifetime DE69708208T2 (de) 1996-06-13 1997-06-12 Abtastbelichtungsapparat mit System zur Detektion einer Oberflächenlage

Country Status (6)

Country Link
US (1) US6023320A (de)
EP (1) EP0813115B1 (de)
JP (1) JP3634558B2 (de)
KR (1) KR100287504B1 (de)
DE (1) DE69708208T2 (de)
TW (1) TW374940B (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3441930B2 (ja) * 1997-07-22 2003-09-02 キヤノン株式会社 走査型露光装置およびデバイス製造方法
JP3466893B2 (ja) * 1997-11-10 2003-11-17 キヤノン株式会社 位置合わせ装置及びそれを用いた投影露光装置
JP3335126B2 (ja) * 1998-07-06 2002-10-15 キヤノン株式会社 面位置検出装置及びそれを用いた走査型投影露光装置
US6545971B1 (en) * 1999-01-27 2003-04-08 Kabushiki Kaisha Toshiba Information recording/reproducing system for recording/reproducing information in three-dimensional recording medium of a light passing-through type
JP2001160530A (ja) * 1999-12-01 2001-06-12 Nikon Corp ステージ装置及び露光装置
JP4666747B2 (ja) * 2000-11-06 2011-04-06 キヤノン株式会社 露光装置およびデバイス製造方法
JP4227402B2 (ja) * 2002-12-06 2009-02-18 キヤノン株式会社 走査型露光装置
JP4652667B2 (ja) * 2003-02-13 2011-03-16 キヤノン株式会社 面位置計測方法及び走査型露光装置
JP4235468B2 (ja) * 2003-02-28 2009-03-11 キヤノン株式会社 半導体製造装置
JP4125177B2 (ja) * 2003-05-16 2008-07-30 キヤノン株式会社 露光装置
JP2005175400A (ja) * 2003-12-15 2005-06-30 Canon Inc 露光装置
JP2008053618A (ja) * 2006-08-28 2008-03-06 Canon Inc 露光装置及び方法並びに該露光装置を用いたデバイス製造方法
JP5351409B2 (ja) * 2007-10-31 2013-11-27 キヤノン株式会社 位置検出器、テンプレートを得る方法、露光装置及びデバイス製造方法
JP2023043534A (ja) * 2021-09-16 2023-03-29 キオクシア株式会社 測定方法、測定装置、及びマーク

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4650983A (en) * 1983-11-07 1987-03-17 Nippon Kogaku K. K. Focusing apparatus for projection optical system
JPH0652707B2 (ja) * 1988-10-11 1994-07-06 キヤノン株式会社 面位置検出方法
US5124562A (en) * 1989-01-27 1992-06-23 Canon Kabushiki Kaisha Surface position detecting method at a predetermined and plurality of adjacent points
US5168306A (en) * 1989-04-04 1992-12-01 Asahi Kogaku Kogyo Kabushiki Kaisha Exposure apparatus
JP2785146B2 (ja) * 1990-02-09 1998-08-13 キヤノン株式会社 自動焦点調整制御装置
JP2862311B2 (ja) * 1990-02-23 1999-03-03 キヤノン株式会社 面位置検出装置
JP2830492B2 (ja) * 1991-03-06 1998-12-02 株式会社ニコン 投影露光装置及び投影露光方法
JP3277944B2 (ja) * 1992-07-28 2002-04-22 東芝ライテック株式会社 照明器具
US5306902A (en) * 1992-09-01 1994-04-26 International Business Machines Corporation Confocal method and apparatus for focusing in projection lithography
JP3412704B2 (ja) * 1993-02-26 2003-06-03 株式会社ニコン 投影露光方法及び装置、並びに露光装置
KR100363922B1 (ko) * 1993-12-06 2003-08-21 가부시키가이샤 니콘 노광장치및노광방법

Also Published As

Publication number Publication date
US6023320A (en) 2000-02-08
KR980005985A (ko) 1998-03-30
JP3634558B2 (ja) 2005-03-30
JPH1064814A (ja) 1998-03-06
EP0813115A2 (de) 1997-12-17
KR100287504B1 (ko) 2001-04-16
EP0813115A3 (de) 1999-02-10
TW374940B (en) 1999-11-21
EP0813115B1 (de) 2001-11-14
DE69708208D1 (de) 2001-12-20

Similar Documents

Publication Publication Date Title
DE69717516T2 (de) Verfahren zur Detektion einer Oberflächenlage und Abtastbelichtungsverfahren unter Verwendung desselben
DE69734614D1 (de) System und Verfahren zur Positionsbestimmung auf einer Oberfläche
DE69514580D1 (de) Vorrichtung zur Erkennung der Umgebung mit einer Vorrichtung zur Bildaufnahme
DE60033775D1 (de) Lithographischer Apparat mit einem System zur Positionsdetektion
DE69622353T2 (de) Vorrichtung zur Überführung eines hauptsächlich runden Gegenstandes
EP0979398A4 (de) Optische rastervorrichtung fur oberflaechenpruefung
ATE219438T1 (de) Vorrichtung zum umhüllen eines gegenstandes mit einer folie
DE59709349D1 (de) Vorrichtung zur Führung einer Materialbahn
DE69723380D1 (de) Vorrichtung zur beobachtung einer wandoberfläche
DE69734638D1 (de) Optisches System mit einer rotationsasymmetrischengewölbten Fläche
DE69731887D1 (de) Vorrichtung zur positionierung einer buchse
DE69708208T2 (de) Abtastbelichtungsapparat mit System zur Detektion einer Oberflächenlage
DE69713469D1 (de) Gerät zur Berechnung einer Geschwindigkeit
DE59708592D1 (de) Verfahren zur Übertragung von Informationen in einer Positionsmesseinrichtung
DE69520818T2 (de) Vorrichtung und Verfahren zur Bildabtastung mit einer Sensoranordnung
DE59709102D1 (de) Vorrichtung zur ermittlung einer drehrate
DE69732865D1 (de) Kodierer mit Mitteln zur Ergänzung eines digitalen Bildes mit Bildelementen
DE69937933D1 (de) System zur Positionsdetektion und Belichtungsapparat unter Verwendung desselben
DE69818736D1 (de) Vorrichtung zur Positionierung einer Linse
DE69835677D1 (de) Einrichtung zur Bewegung einer Abtastvorrichtung
DE69714105T2 (de) Vorrichtung zur Transversabschichtbildern
DE59709917D1 (de) Vorrichtung zur ermittlung einer drehrate
DE59706968D1 (de) Einrichtung zur positionierung einer messsonde
DE69430769T2 (de) Gerät zur Erzielung von Rippenlinenmusterbildern auf einer gekrümmten Oberfläche
DE69022227D1 (de) Vorrichtung zur nivellierung einer betonoberfläche.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition