DE69129732T2 - Verfahren zur Positionsdetektion - Google Patents

Verfahren zur Positionsdetektion

Info

Publication number
DE69129732T2
DE69129732T2 DE69129732T DE69129732T DE69129732T2 DE 69129732 T2 DE69129732 T2 DE 69129732T2 DE 69129732 T DE69129732 T DE 69129732T DE 69129732 T DE69129732 T DE 69129732T DE 69129732 T2 DE69129732 T2 DE 69129732T2
Authority
DE
Germany
Prior art keywords
detection method
position detection
detection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69129732T
Other languages
English (en)
Other versions
DE69129732D1 (de
Inventor
Masanobu Hasegawa
Kenji Saitoh
Shigeyuki Suda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE69129732D1 publication Critical patent/DE69129732D1/de
Application granted granted Critical
Publication of DE69129732T2 publication Critical patent/DE69129732T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69129732T 1990-11-30 1991-11-29 Verfahren zur Positionsdetektion Expired - Fee Related DE69129732T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33990590 1990-11-30

Publications (2)

Publication Number Publication Date
DE69129732D1 DE69129732D1 (de) 1998-08-13
DE69129732T2 true DE69129732T2 (de) 1998-12-17

Family

ID=18331897

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69129732T Expired - Fee Related DE69129732T2 (de) 1990-11-30 1991-11-29 Verfahren zur Positionsdetektion

Country Status (4)

Country Link
US (1) US5396335A (de)
EP (1) EP0488798B1 (de)
JP (1) JP2890943B2 (de)
DE (1) DE69129732T2 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3428705B2 (ja) * 1993-10-20 2003-07-22 キヤノン株式会社 位置検出装置及びそれを用いた半導体素子の製造方法
JP3368017B2 (ja) * 1993-10-29 2003-01-20 キヤノン株式会社 位置検出装置及びそれを用いた半導体素子の製造方法
JPH0886612A (ja) * 1994-09-19 1996-04-02 Canon Inc 光ヘテロダイン干渉を利用した位置ずれ検出装置
US5777744A (en) * 1995-05-16 1998-07-07 Canon Kabushiki Kaisha Exposure state detecting system and exposure apparatus using the same
JP3517504B2 (ja) * 1995-12-15 2004-04-12 キヤノン株式会社 位置検出装置及びそれを用いたデバイスの製造方法
US5969820A (en) * 1996-06-13 1999-10-19 Canon Kabushiki Kaisha Surface position detecting system and exposure apparatus using the same
TW380288B (en) * 1996-06-25 2000-01-21 Seiko Epson Corp Conductive pattern transfer printing method on film carrier and the mask and film carrier using the same
JPH1022213A (ja) * 1996-06-28 1998-01-23 Canon Inc 位置検出装置及びそれを用いたデバイスの製造方法
US6013355A (en) * 1996-12-30 2000-01-11 International Business Machines Corp. Testing laminates with x-ray moire interferometry
JP4136067B2 (ja) * 1997-05-02 2008-08-20 キヤノン株式会社 検出装置及びそれを用いた露光装置
US6180289B1 (en) 1997-07-23 2001-01-30 Nikon Corporation Projection-microlithography mask with separate mask substrates
JPH11142121A (ja) 1997-11-11 1999-05-28 Nikon Corp レチクルの歪み計測方法および歪み計測装置
JPH11241908A (ja) 1997-12-03 1999-09-07 Canon Inc 位置検出装置及びそれを用いたデバイスの製造方法
US6240158B1 (en) * 1998-02-17 2001-05-29 Nikon Corporation X-ray projection exposure apparatus with a position detection optical system
JP3863339B2 (ja) * 2000-03-28 2006-12-27 株式会社東芝 光軸ずれ測定方法
JP2005159213A (ja) * 2003-11-28 2005-06-16 Canon Inc シアリング干渉を利用した測定方法及び装置、それを利用した露光方法及び装置、並びに、デバイス製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4037969A (en) * 1976-04-02 1977-07-26 Bell Telephone Laboratories, Incorporated Zone plate alignment marks
FR2436967A1 (fr) * 1978-09-19 1980-04-18 Thomson Csf Procede d'alignement optique de motifs dans deux plans rapproches et dispositif d'alignement mettant en oeuvre un tel procede
US4326805A (en) * 1980-04-11 1982-04-27 Bell Telephone Laboratories, Incorporated Method and apparatus for aligning mask and wafer members
US4801808A (en) * 1984-07-27 1989-01-31 Canon Kabushiki Kaisha Alignment and exposure apparatus having an objective lens system capable of observing a mark on an exposure optical holding member to permit alignment of a mask relative to the exposure optical system
JPH0749926B2 (ja) * 1986-05-07 1995-05-31 日本電信電話株式会社 位置合わせ方法および位置合わせ装置
EP0336537B1 (de) * 1988-02-16 1995-12-20 Canon Kabushiki Kaisha Vorrichtung zum Nachweis der örtlichen Beziehung zwischen zwei Objekten
JP2676933B2 (ja) * 1988-09-05 1997-11-17 キヤノン株式会社 位置検出装置
DE68928460T2 (de) * 1988-09-06 1998-04-02 Canon K.K., Tokio/Tokyo Maskenkassetten-Ladevorrichtung
DE69013790T2 (de) * 1989-08-04 1995-05-04 Canon K.K., Tokio/Tokyo Verfahren und Vorrichtung zur Positionsbestimmung.
US5200800A (en) * 1990-05-01 1993-04-06 Canon Kabushiki Kaisha Position detecting method and apparatus

Also Published As

Publication number Publication date
JPH05243118A (ja) 1993-09-21
DE69129732D1 (de) 1998-08-13
EP0488798A2 (de) 1992-06-03
EP0488798B1 (de) 1998-07-08
JP2890943B2 (ja) 1999-05-17
US5396335A (en) 1995-03-07
EP0488798A3 (en) 1992-12-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee