JPS59172646A - フオト・マスク及びその製造方法 - Google Patents

フオト・マスク及びその製造方法

Info

Publication number
JPS59172646A
JPS59172646A JP58047364A JP4736483A JPS59172646A JP S59172646 A JPS59172646 A JP S59172646A JP 58047364 A JP58047364 A JP 58047364A JP 4736483 A JP4736483 A JP 4736483A JP S59172646 A JPS59172646 A JP S59172646A
Authority
JP
Japan
Prior art keywords
opaque
transparent substrate
pattern
photomask
pinhole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58047364A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0325768B2 (enExample
Inventor
Shogo Matsui
正五 松井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP58047364A priority Critical patent/JPS59172646A/ja
Publication of JPS59172646A publication Critical patent/JPS59172646A/ja
Publication of JPH0325768B2 publication Critical patent/JPH0325768B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP58047364A 1983-03-22 1983-03-22 フオト・マスク及びその製造方法 Granted JPS59172646A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58047364A JPS59172646A (ja) 1983-03-22 1983-03-22 フオト・マスク及びその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58047364A JPS59172646A (ja) 1983-03-22 1983-03-22 フオト・マスク及びその製造方法

Publications (2)

Publication Number Publication Date
JPS59172646A true JPS59172646A (ja) 1984-09-29
JPH0325768B2 JPH0325768B2 (enExample) 1991-04-08

Family

ID=12773051

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58047364A Granted JPS59172646A (ja) 1983-03-22 1983-03-22 フオト・マスク及びその製造方法

Country Status (1)

Country Link
JP (1) JPS59172646A (enExample)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55163541A (en) * 1979-06-07 1980-12-19 Mitsubishi Electric Corp Photo mask and its defect correcting method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55163541A (en) * 1979-06-07 1980-12-19 Mitsubishi Electric Corp Photo mask and its defect correcting method

Also Published As

Publication number Publication date
JPH0325768B2 (enExample) 1991-04-08

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