JPS58219023A - 樹脂薄膜の製造方法 - Google Patents
樹脂薄膜の製造方法Info
- Publication number
- JPS58219023A JPS58219023A JP57103488A JP10348882A JPS58219023A JP S58219023 A JPS58219023 A JP S58219023A JP 57103488 A JP57103488 A JP 57103488A JP 10348882 A JP10348882 A JP 10348882A JP S58219023 A JPS58219023 A JP S58219023A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film
- glass plate
- thickness
- support frame
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 239000011347 resin Substances 0.000 title claims description 14
- 229920005989 resin Polymers 0.000 title claims description 14
- 239000012528 membrane Substances 0.000 title description 5
- 239000010409 thin film Substances 0.000 claims description 38
- 239000010408 film Substances 0.000 claims description 22
- 239000011521 glass Substances 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 16
- 229920002678 cellulose Polymers 0.000 claims description 12
- 238000005266 casting Methods 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- 239000000020 Nitrocellulose Substances 0.000 claims description 8
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 claims description 8
- 229920001220 nitrocellulos Polymers 0.000 claims description 8
- 239000002904 solvent Substances 0.000 claims description 8
- 238000001035 drying Methods 0.000 claims description 4
- 229920000875 Dissolving pulp Polymers 0.000 claims description 3
- 150000002148 esters Chemical class 0.000 claims description 3
- 239000003960 organic solvent Substances 0.000 claims description 3
- 229920000742 Cotton Polymers 0.000 description 15
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000000428 dust Substances 0.000 description 5
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 4
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 238000009750 centrifugal casting Methods 0.000 description 3
- 239000004014 plasticizer Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000001913 cellulose Substances 0.000 description 2
- 229920002301 cellulose acetate Polymers 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- -1 fatty acid esters Chemical class 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 2
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 2
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical group [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D7/00—Producing flat articles, e.g. films or sheets
- B29D7/01—Films or sheets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C41/00—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor
- B29C41/02—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor for making articles of definite length, i.e. discrete articles
- B29C41/12—Spreading-out the material on a substrate, e.g. on the surface of a liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2031/00—Other particular articles
- B29L2031/755—Membranes, diaphragms
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Moulding By Coating Moulds (AREA)
- Casting Or Compression Moulding Of Plastics Or The Like (AREA)
- Extrusion Moulding Of Plastics Or The Like (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57103488A JPS58219023A (ja) | 1982-06-15 | 1982-06-15 | 樹脂薄膜の製造方法 |
| US06/767,239 US4878973A (en) | 1982-06-15 | 1985-08-19 | Process for producing a thin resin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57103488A JPS58219023A (ja) | 1982-06-15 | 1982-06-15 | 樹脂薄膜の製造方法 |
Related Child Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1089135A Division JPH0262A (ja) | 1989-04-07 | 1989-04-07 | フォトマスクカバー |
| JP1089136A Division JPH0263A (ja) | 1989-04-07 | 1989-04-07 | フォトマスクカバー |
| JP1089137A Division JPH0264A (ja) | 1989-04-07 | 1989-04-07 | フォトマスクカバーの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58219023A true JPS58219023A (ja) | 1983-12-20 |
| JPS6325932B2 JPS6325932B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-05-27 |
Family
ID=14355385
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57103488A Granted JPS58219023A (ja) | 1982-06-15 | 1982-06-15 | 樹脂薄膜の製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US4878973A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
| JP (1) | JPS58219023A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (50)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61106243A (ja) * | 1984-10-16 | 1986-05-24 | デュ・ポン・タウ・ラボラトリーズ・インコーポレーテッド | 紫外線を透過するペリクルとその製法 |
| US5055568A (en) * | 1986-06-12 | 1991-10-08 | Mitsui Petrochemical Industries, Ltd. | Process for preparation of cellulose nitrate films |
| US5061024A (en) * | 1989-09-06 | 1991-10-29 | E. I. Du Pont De Nemours And Company | Amorphous fluoropolymer pellicle films |
| EP0779551A2 (en) | 1995-12-15 | 1997-06-18 | Shin-Etsu Chemical Co., Ltd. | Frame-supported dustproof pellicle for photolithographic photomask |
| JPH09218501A (ja) * | 1996-10-03 | 1997-08-19 | Mitsui Petrochem Ind Ltd | フォトマスク保護用防塵膜 |
| US6342292B1 (en) | 1997-12-16 | 2002-01-29 | Asahi Kasei Kabushiki Kaisha | Organic thin film and process for producing the same |
| JP2002182373A (ja) * | 2000-12-18 | 2002-06-26 | Shin Etsu Chem Co Ltd | ペリクル及びその製造方法及びフォトマスク |
| US6639650B2 (en) | 1999-12-21 | 2003-10-28 | Shin-Etsu Chemical Co., Ltd. | Light exposure method, light exposure apparatus, pellicle and method for relieving warpage of pellicle membrane |
| US7067222B2 (en) | 2002-11-05 | 2006-06-27 | Shin-Etsu Chemical Co., Ltd. | Pellicle for lithography |
| JP2006184822A (ja) * | 2004-12-28 | 2006-07-13 | Shin Etsu Chem Co Ltd | フォトリソグラフィ用ペリクル及びペリクルフレーム |
| EP1978404A1 (en) | 2007-04-04 | 2008-10-08 | Shin-Etsu Chemical Co., Ltd. | Pellicle |
| EP2017673A1 (en) | 2007-07-19 | 2009-01-21 | Shin-Etsu Chemical Co., Ltd. | Pellicle frame |
| EP2017672A2 (en) | 2007-07-19 | 2009-01-21 | Shin-Etsu Chemical Co., Ltd. | Pellicle frame |
| EP2017671A1 (en) | 2007-07-19 | 2009-01-21 | Shin-Etsu Chemical Co., Ltd. | Lithographic pellicle |
| EP2034360A1 (en) | 2007-09-05 | 2009-03-11 | Shin-Etsu Chemical Co., Ltd. | Pellicle frame |
| EP2107421A2 (en) | 2008-04-01 | 2009-10-07 | Shinetsu Chemical Co., Ltd. | Lithographic pellicle |
| US7604904B2 (en) | 2003-08-27 | 2009-10-20 | Shin-Etsu Chemical Co., Ltd. | Pellicle for lithography |
| EP2120092A1 (en) | 2008-05-14 | 2009-11-18 | Shin-Etsu Chemical Co., Ltd. | Pellicle |
| EP2120093A1 (en) | 2008-05-14 | 2009-11-18 | Shin-Etsu Chemical Co., Ltd. | Pellicle for use in semiconductor lithography |
| EP2211231A2 (en) | 2009-01-27 | 2010-07-28 | Shin-Etsu Chemical Co., Ltd. | Pellicle for photolithography |
| EP2228683A1 (en) | 2009-03-11 | 2010-09-15 | Shin-Etsu Chemical Co., Ltd. | Process for Producing Pellicle |
| CN102053483A (zh) * | 2009-10-30 | 2011-05-11 | 信越化学工业株式会社 | 防尘薄膜组件框架及防尘薄膜组件 |
| EP2333607A2 (en) | 2009-11-30 | 2011-06-15 | Shin-Etsu Chemical Co., Ltd. | A pellicle for lithography |
| JP2011124230A (ja) * | 2009-12-09 | 2011-06-23 | Korea Inst Of Ceramic Engineering & Technology | 転写方法を用いた固体酸化物燃料電池用単位セルの製造方法 |
| WO2011125407A1 (ja) | 2010-04-02 | 2011-10-13 | 信越化学工業株式会社 | フォトマスクユニット及びその製造方法 |
| US8173330B2 (en) | 2009-04-24 | 2012-05-08 | Shin-Etsu Chemical Co., Ltd. | Pellicle |
| EP2455810A2 (en) | 2010-11-19 | 2012-05-23 | Shin-Etsu Chemical Co., Ltd. | Method of adhering a lithographic pellicle and adhering apparatus therefor |
| EP2455809A2 (en) | 2010-11-17 | 2012-05-23 | Shin-Etsu Chemical Co., Ltd. | A pellicle for lithography |
| US8338060B2 (en) | 2010-01-29 | 2012-12-25 | Shin-Etsu Chemical Co., Ltd. | Pellicle for lithography and method for manufacturing the same |
| EP2568336A2 (en) | 2011-09-09 | 2013-03-13 | Shin-Etsu Chemical Co., Ltd. | A pellicle for lithography and a method of making thereof |
| US8445165B2 (en) | 2009-11-19 | 2013-05-21 | Shin-Etsu Chemical Co., Ltd. | Pellicle for lithography |
| JPWO2011129378A1 (ja) * | 2010-04-13 | 2013-07-18 | 旭化成イーマテリアルズ株式会社 | 自立膜、自立構造体、自立膜の製造方法及びペリクル |
| KR20130121005A (ko) | 2012-04-26 | 2013-11-05 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 펠리클 |
| US8663756B2 (en) | 2011-02-08 | 2014-03-04 | Shin-Etsu Chemical Co., Ltd. | Pellicle kit for manufacturing a pellicle |
| KR20140130010A (ko) | 2013-04-30 | 2014-11-07 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 펠리클 |
| US8960928B2 (en) | 2011-02-08 | 2015-02-24 | Shin-Etsu Chemical Co., Ltd. | Pellicle frame |
| JP2015064416A (ja) * | 2013-09-24 | 2015-04-09 | 信越化学工業株式会社 | ペリクル |
| EP2927745A2 (en) | 2014-04-04 | 2015-10-07 | Shin-Etsu Chemical Co., Ltd. | An agglutinant for pellicle and a pellicle including the same |
| EP2927746A2 (en) | 2014-04-02 | 2015-10-07 | Shin-Etsu Chemical Co., Ltd. | A pellicle for lithography |
| EP2990870A1 (en) | 2014-08-27 | 2016-03-02 | Shin-Etsu Chemical Co., Ltd. | Pellicle frame and pellicle |
| EP3037879A1 (en) | 2014-12-25 | 2016-06-29 | Shin-Etsu Chemical Co., Ltd. | An agglutinant for pellicle, a pellicle using it and a method for evaluating pellicle |
| EP3056943A1 (en) | 2015-02-10 | 2016-08-17 | Shin-Etsu Chemical Co., Ltd. | An agglutinant for pellicle and a pellicle using it |
| EP3079014A2 (en) | 2015-04-07 | 2016-10-12 | Shin-Etsu Chemical Co., Ltd. | An euv pellicle frame and an euv pellicle using it |
| EP3159739A2 (en) | 2015-10-19 | 2017-04-26 | Shin-Etsu Chemical Co., Ltd. | A pellicle for euv |
| EP3165964A1 (en) | 2015-10-29 | 2017-05-10 | Shin-Etsu Chemical Co., Ltd. | An adhesive suitable for a pellicle for euv lithography and a pellicle using the same adhesive |
| KR20170051226A (ko) | 2015-10-29 | 2017-05-11 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Euv 리소그래피용 펠리클에 적합한 접착제와 이것을 사용한 펠리클 |
| EP3190462A1 (en) | 2016-01-07 | 2017-07-12 | Shin-Etsu Chemical Co., Ltd. | A pellicle |
| EP3249467A1 (en) | 2016-05-26 | 2017-11-29 | Shin-Etsu Chemical Co., Ltd. | A pellicle |
| EP3270224A1 (en) | 2016-07-11 | 2018-01-17 | Shin-Etsu Chemical Co., Ltd. | Adhesive for pellicle, pellicle, and method of selecting adhesive for pellicle |
| EP3470921A1 (en) | 2017-10-10 | 2019-04-17 | Shin-Etsu Chemical Co., Ltd. | Pellicle frame and pellicle |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3037745B2 (ja) * | 1990-11-29 | 2000-05-08 | 三井化学株式会社 | ペリクル構造体 |
| JP2790946B2 (ja) * | 1992-08-21 | 1998-08-27 | 信越化学工業株式会社 | ペリクル膜の製造方法 |
| US5391329A (en) * | 1993-08-23 | 1995-02-21 | Hughes Aircraft Company | Process for making a solid optical limiter containing a graded distribution of reverse saturable material |
| US6715316B2 (en) * | 2001-05-08 | 2004-04-06 | Corning Incorporated | Water-removable coatings for LCD glass |
| EP1909753A2 (en) * | 2005-07-22 | 2008-04-16 | Koninklijke Philips Electronics N.V. | Method and system for in vivo drug delivery |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4246054A (en) * | 1979-11-13 | 1981-01-20 | The Perkin-Elmer Corporation | Polymer membranes for X-ray masks |
| US4536240A (en) * | 1981-12-02 | 1985-08-20 | Advanced Semiconductor Products, Inc. | Method of forming thin optical membranes |
-
1982
- 1982-06-15 JP JP57103488A patent/JPS58219023A/ja active Granted
-
1985
- 1985-08-19 US US06/767,239 patent/US4878973A/en not_active Expired - Fee Related
Cited By (93)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61106243A (ja) * | 1984-10-16 | 1986-05-24 | デュ・ポン・タウ・ラボラトリーズ・インコーポレーテッド | 紫外線を透過するペリクルとその製法 |
| US5055568A (en) * | 1986-06-12 | 1991-10-08 | Mitsui Petrochemical Industries, Ltd. | Process for preparation of cellulose nitrate films |
| US5061024A (en) * | 1989-09-06 | 1991-10-29 | E. I. Du Pont De Nemours And Company | Amorphous fluoropolymer pellicle films |
| EP0779551A2 (en) | 1995-12-15 | 1997-06-18 | Shin-Etsu Chemical Co., Ltd. | Frame-supported dustproof pellicle for photolithographic photomask |
| US5834143A (en) * | 1995-12-15 | 1998-11-10 | Shin-Etsu Chemical Co., Ltd. | Frame-supported dustproof pellicle for photolithographic photomask |
| JPH09218501A (ja) * | 1996-10-03 | 1997-08-19 | Mitsui Petrochem Ind Ltd | フォトマスク保護用防塵膜 |
| US6797207B2 (en) | 1997-12-16 | 2004-09-28 | Asahi Kasei Emd Corporation | Process for producing organic thin film |
| US6342292B1 (en) | 1997-12-16 | 2002-01-29 | Asahi Kasei Kabushiki Kaisha | Organic thin film and process for producing the same |
| US6639650B2 (en) | 1999-12-21 | 2003-10-28 | Shin-Etsu Chemical Co., Ltd. | Light exposure method, light exposure apparatus, pellicle and method for relieving warpage of pellicle membrane |
| US6977126B2 (en) | 2000-12-18 | 2005-12-20 | Shin-Etsu Chemical Co., Ltd. | Pellicle, photomask, pellicle frame, and method for manufacturing pellicle |
| JP2002182373A (ja) * | 2000-12-18 | 2002-06-26 | Shin Etsu Chem Co Ltd | ペリクル及びその製造方法及びフォトマスク |
| US7067222B2 (en) | 2002-11-05 | 2006-06-27 | Shin-Etsu Chemical Co., Ltd. | Pellicle for lithography |
| US7432023B2 (en) | 2002-11-05 | 2008-10-07 | Shin-Etsu Chemical Co., Ltd. | Method for producing a pellicle for lithography |
| US7604904B2 (en) | 2003-08-27 | 2009-10-20 | Shin-Etsu Chemical Co., Ltd. | Pellicle for lithography |
| JP2006184822A (ja) * | 2004-12-28 | 2006-07-13 | Shin Etsu Chem Co Ltd | フォトリソグラフィ用ペリクル及びペリクルフレーム |
| US7927763B2 (en) | 2004-12-28 | 2011-04-19 | Shin-Etsu Chemical Co., Ltd. | Pellicle for photolithography and pellicle frame |
| EP1978404A1 (en) | 2007-04-04 | 2008-10-08 | Shin-Etsu Chemical Co., Ltd. | Pellicle |
| EP2017672A2 (en) | 2007-07-19 | 2009-01-21 | Shin-Etsu Chemical Co., Ltd. | Pellicle frame |
| EP2017671A1 (en) | 2007-07-19 | 2009-01-21 | Shin-Etsu Chemical Co., Ltd. | Lithographic pellicle |
| EP2017673A1 (en) | 2007-07-19 | 2009-01-21 | Shin-Etsu Chemical Co., Ltd. | Pellicle frame |
| EP2034360A1 (en) | 2007-09-05 | 2009-03-11 | Shin-Etsu Chemical Co., Ltd. | Pellicle frame |
| EP2107421A2 (en) | 2008-04-01 | 2009-10-07 | Shinetsu Chemical Co., Ltd. | Lithographic pellicle |
| US8026023B2 (en) | 2008-04-01 | 2011-09-27 | Shin-Etsu Chemical Co., Ltd. | Lithographic pellicle |
| EP2120093A1 (en) | 2008-05-14 | 2009-11-18 | Shin-Etsu Chemical Co., Ltd. | Pellicle for use in semiconductor lithography |
| EP2120092A1 (en) | 2008-05-14 | 2009-11-18 | Shin-Etsu Chemical Co., Ltd. | Pellicle |
| EP2211231A2 (en) | 2009-01-27 | 2010-07-28 | Shin-Etsu Chemical Co., Ltd. | Pellicle for photolithography |
| JP2010210974A (ja) * | 2009-03-11 | 2010-09-24 | Shin-Etsu Chemical Co Ltd | ペリクルの製造方法及びペリクル |
| EP2228683A1 (en) | 2009-03-11 | 2010-09-15 | Shin-Etsu Chemical Co., Ltd. | Process for Producing Pellicle |
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Also Published As
| Publication number | Publication date |
|---|---|
| US4878973A (en) | 1989-11-07 |
| JPS6325932B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-05-27 |
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