JPH0465764B2 - - Google Patents

Info

Publication number
JPH0465764B2
JPH0465764B2 JP17912885A JP17912885A JPH0465764B2 JP H0465764 B2 JPH0465764 B2 JP H0465764B2 JP 17912885 A JP17912885 A JP 17912885A JP 17912885 A JP17912885 A JP 17912885A JP H0465764 B2 JPH0465764 B2 JP H0465764B2
Authority
JP
Japan
Prior art keywords
thin film
support frame
substrate
cellulose
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP17912885A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6239859A (ja
Inventor
Masaru Higuchi
Shigeyuki Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daicel Corp
Original Assignee
Daicel Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Chemical Industries Ltd filed Critical Daicel Chemical Industries Ltd
Priority to JP60179128A priority Critical patent/JPS6239859A/ja
Publication of JPS6239859A publication Critical patent/JPS6239859A/ja
Publication of JPH0465764B2 publication Critical patent/JPH0465764B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Moulding By Coating Moulds (AREA)
JP60179128A 1985-08-14 1985-08-14 フオトマスク保護用樹脂薄膜の製法 Granted JPS6239859A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60179128A JPS6239859A (ja) 1985-08-14 1985-08-14 フオトマスク保護用樹脂薄膜の製法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60179128A JPS6239859A (ja) 1985-08-14 1985-08-14 フオトマスク保護用樹脂薄膜の製法

Publications (2)

Publication Number Publication Date
JPS6239859A JPS6239859A (ja) 1987-02-20
JPH0465764B2 true JPH0465764B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-10-21

Family

ID=16060477

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60179128A Granted JPS6239859A (ja) 1985-08-14 1985-08-14 フオトマスク保護用樹脂薄膜の製法

Country Status (1)

Country Link
JP (1) JPS6239859A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0798869B2 (ja) * 1987-10-26 1995-10-25 三井石油化学工業株式会社 フォトマスク保護用防塵膜
JPH01133052A (ja) * 1987-11-18 1989-05-25 Mitsui Petrochem Ind Ltd 防塵膜
US6342292B1 (en) 1997-12-16 2002-01-29 Asahi Kasei Kabushiki Kaisha Organic thin film and process for producing the same

Also Published As

Publication number Publication date
JPS6239859A (ja) 1987-02-20

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