JP4330525B2 - 大型ペリクルの成膜方法 - Google Patents
大型ペリクルの成膜方法 Download PDFInfo
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- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 claims description 18
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- KXJGSNRAQWDDJT-UHFFFAOYSA-N 1-acetyl-5-bromo-2h-indol-3-one Chemical compound BrC1=CC=C2N(C(=O)C)CC(=O)C2=C1 KXJGSNRAQWDDJT-UHFFFAOYSA-N 0.000 description 1
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- DQEFEBPAPFSJLV-UHFFFAOYSA-N Cellulose propionate Chemical compound CCC(=O)OCC1OC(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C1OC1C(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C(COC(=O)CC)O1 DQEFEBPAPFSJLV-UHFFFAOYSA-N 0.000 description 1
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- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
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- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 1
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- 239000004699 Ultra-high molecular weight polyethylene Substances 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- AVMNFQHJOOYCAP-UHFFFAOYSA-N acetic acid;propanoic acid Chemical compound CC(O)=O.CCC(O)=O AVMNFQHJOOYCAP-UHFFFAOYSA-N 0.000 description 1
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- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
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- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
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- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 238000007602 hot air drying Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
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- ZEZKMMFYTLTLJS-UHFFFAOYSA-N methanol;hydrobromide Chemical compound Br.OC ZEZKMMFYTLTLJS-UHFFFAOYSA-N 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
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- UJMWVICAENGCRF-UHFFFAOYSA-N oxygen difluoride Chemical compound FOF UJMWVICAENGCRF-UHFFFAOYSA-N 0.000 description 1
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- 229920000747 poly(lactic acid) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
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- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
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Description
大型ペリクルの製造方法を説明する。ペリクル膜の代表的な成膜方法として、スピンコート法とスリットコート法を例示して説明する。図1はスピンコート法の説明図であり、図2はスリットコート法の説明図である。
上記成膜方法で使用される成膜基板10、20の材質は、ソーダライムガラス、低熱膨張ガラス、石英ガラスが考えられるが、ソーダライムガラスが好ましい。
上記成膜方法で使用される成膜基板10、20の製法について説明する。説明は、製作工程の順序に沿って行う。即ち、まず前記ソーダライムガラスに対し物理研磨による加工をし、次に化学研磨による加工をし、最後に成膜基板の表面処理をするという順序で説明する。説明では省略するが、必要に応じて各工程で基板の洗浄や乾燥を行ってもよい。
1辺が570mmの正方形のソーダライムガラスを用意し、物理研磨、化学研磨を行った。この基板を純水でスクラブ洗浄後、超音波洗浄を行い、温風乾燥を行った後にヘキサメチルジシラザンの蒸着処理を行い、大型ペリクル用成膜基板とした。セルロースアセテートプロピオネート(CAP 480-20、Eastman Chemical Company製)を乳酸エチルに溶かしたポリマー溶液を窒素で0.01MPaに加圧し、口径0.1μmのメンブレンフィルターを通してろ過した液をスピンコート法でこの成膜基板上に塗布し、ホットプレートで乾燥した。スピンコート法はクローズドカップ方式のスピンコーターに前記ポリマー溶液をガラス基板上に300g供給し、ガラス基板を350rpmで60秒間回転させる。乾燥法は、ポリマー溶液を塗布した成膜基板を60℃のホットプレート上に30分間載せる。
1辺が1200mmの正方形のソーダライムガラスを用意し、物理研磨、化学研磨を行った。この基板を純水でスクラブ洗浄後、超音波洗浄を行い、温風乾燥を行った後にヘキサメチルジシラザンの蒸着処理を行い、大型ペリクル用成膜基板とした。蒸着法は実施例1と同じである。
1辺が1400mmの正方形のソーダライムガラスを用意し、物理研磨、化学研磨を行った。この基板を純水でスクラブ洗浄後、超音波洗浄を行い、温風乾燥を行った後にヘキサメチルジシラザンの蒸着処理を行い、大型ペリクル用成膜基板とした。蒸着法は実施例1と同じである。
1辺が1200mmの正方形のソーダライムガラスを用意し、物理研磨のみを行った。この基板を純水でスクラブ洗浄後、超音波洗浄を行い、温風乾燥を行った後にヘキサメチルジシラザンの蒸着処理を行い、大型ペリクル用成膜基板とした。蒸着法は実施例1と同じである。
1辺が570mmの正方形のソーダライムガラスを用意し、物理研磨、化学研磨を行った。この基板を純水でスクラブ洗浄後、超音波洗浄及び温風乾燥を行い、大型ペリクル用成膜基板とした。
1辺が800mmの正方形の低熱膨張ガラスを用意し、物理研磨、化学研磨を行った。この基板を純水でスクラブ洗浄後、超音波洗浄を行い、温風乾燥を行った後にヘキサメチルジシラザンの蒸着処理を行い、大型ペリクル用成膜基板とした。蒸着法は実施例1と同じである。
11 …ポリマー溶液
12 …回転台
13 …ホットプレート
14 …ペリクル膜
15 …仮枠
20 …成膜基板
51 …フッ素膜
52 …セルロース誘導体
61 …表面
62 …表面
Claims (5)
- 成膜基板上にポリマー溶液を均一に塗布し、該ポリマー溶液を乾燥させた後に仮枠を用いて剥離することによりペリクルを製造する大型ペリクルの製造方法において、
前記製造方法に使用される成膜基板は、面積が3000cm2以上であり、ソーダライムガラスを材料とし、物理研磨を行った後に化学研磨を行うことにより研磨痕が幅、深さとも0.5μm以下にしたものであることを特徴とする大型ペリクルの製造方法。
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JP6412727B2 (ja) * | 2014-06-30 | 2018-10-24 | 東京応化工業株式会社 | 樹脂基板の製造方法および表示デバイスの製造方法 |
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