JPS58169976A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS58169976A
JPS58169976A JP57052770A JP5277082A JPS58169976A JP S58169976 A JPS58169976 A JP S58169976A JP 57052770 A JP57052770 A JP 57052770A JP 5277082 A JP5277082 A JP 5277082A JP S58169976 A JPS58169976 A JP S58169976A
Authority
JP
Japan
Prior art keywords
film
substrate
silicon
forming
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57052770A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0578193B2 (enrdf_load_stackoverflow
Inventor
Takashi Ito
隆司 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP57052770A priority Critical patent/JPS58169976A/ja
Publication of JPS58169976A publication Critical patent/JPS58169976A/ja
Publication of JPH0578193B2 publication Critical patent/JPH0578193B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]

Landscapes

  • Element Separation (AREA)
  • Formation Of Insulating Films (AREA)
JP57052770A 1982-03-30 1982-03-30 半導体装置の製造方法 Granted JPS58169976A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57052770A JPS58169976A (ja) 1982-03-30 1982-03-30 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57052770A JPS58169976A (ja) 1982-03-30 1982-03-30 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS58169976A true JPS58169976A (ja) 1983-10-06
JPH0578193B2 JPH0578193B2 (enrdf_load_stackoverflow) 1993-10-28

Family

ID=12924094

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57052770A Granted JPS58169976A (ja) 1982-03-30 1982-03-30 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS58169976A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS625641A (ja) * 1985-04-09 1987-01-12 フエアチヤイルド　セミコンダクタ　コ−ポレ−シヨン 低温プラズマ窒化方法及びその際に形成される窒化膜の適用
CN102487050A (zh) * 2010-12-03 2012-06-06 比亚迪股份有限公司 功率半导体器件及其制造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5676536A (en) * 1979-11-27 1981-06-24 Chiyou Lsi Gijutsu Kenkyu Kumiai Anodization of silicon nitride film
JPS56135936A (en) * 1980-03-28 1981-10-23 Nec Corp Manufacture of semiconductor device
JPS56135937A (en) * 1980-03-28 1981-10-23 Nec Corp Manufacture of semiconductor device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5676536A (en) * 1979-11-27 1981-06-24 Chiyou Lsi Gijutsu Kenkyu Kumiai Anodization of silicon nitride film
JPS56135936A (en) * 1980-03-28 1981-10-23 Nec Corp Manufacture of semiconductor device
JPS56135937A (en) * 1980-03-28 1981-10-23 Nec Corp Manufacture of semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS625641A (ja) * 1985-04-09 1987-01-12 フエアチヤイルド　セミコンダクタ　コ−ポレ−シヨン 低温プラズマ窒化方法及びその際に形成される窒化膜の適用
CN102487050A (zh) * 2010-12-03 2012-06-06 比亚迪股份有限公司 功率半导体器件及其制造方法

Also Published As

Publication number Publication date
JPH0578193B2 (enrdf_load_stackoverflow) 1993-10-28

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