JPS58135154A - 酸化バナジウムコ−ティング製品 - Google Patents
酸化バナジウムコ−ティング製品Info
- Publication number
- JPS58135154A JPS58135154A JP58016008A JP1600883A JPS58135154A JP S58135154 A JPS58135154 A JP S58135154A JP 58016008 A JP58016008 A JP 58016008A JP 1600883 A JP1600883 A JP 1600883A JP S58135154 A JPS58135154 A JP S58135154A
- Authority
- JP
- Japan
- Prior art keywords
- vanadium
- film
- glass substrate
- glass
- atmosphere
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910001935 vanadium oxide Inorganic materials 0.000 title claims description 86
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 title claims description 69
- 238000000576 coating method Methods 0.000 title claims description 21
- 239000011521 glass Substances 0.000 claims description 95
- 238000000034 method Methods 0.000 claims description 70
- 239000000758 substrate Substances 0.000 claims description 62
- 229910052720 vanadium Inorganic materials 0.000 claims description 56
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 53
- 239000007789 gas Substances 0.000 claims description 27
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 26
- 150000003682 vanadium compounds Chemical class 0.000 claims description 21
- 230000007704 transition Effects 0.000 claims description 20
- 238000002834 transmittance Methods 0.000 claims description 20
- 238000010438 heat treatment Methods 0.000 claims description 19
- 230000001590 oxidative effect Effects 0.000 claims description 19
- 230000003287 optical effect Effects 0.000 claims description 17
- 239000011248 coating agent Substances 0.000 claims description 16
- 238000005229 chemical vapour deposition Methods 0.000 claims description 15
- 229910052757 nitrogen Inorganic materials 0.000 claims description 13
- 150000001875 compounds Chemical class 0.000 claims description 10
- 238000001704 evaporation Methods 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 10
- 230000003595 spectral effect Effects 0.000 claims description 9
- GRUMUEUJTSXQOI-UHFFFAOYSA-N vanadium dioxide Chemical compound O=[V]=O GRUMUEUJTSXQOI-UHFFFAOYSA-N 0.000 claims description 9
- 239000007788 liquid Substances 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 8
- QQONPFPTGQHPMA-UHFFFAOYSA-N Propene Chemical group CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 claims description 7
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 5
- 239000011261 inert gas Substances 0.000 claims description 5
- 229910052741 iridium Inorganic materials 0.000 claims description 5
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052750 molybdenum Inorganic materials 0.000 claims description 5
- 239000011733 molybdenum Substances 0.000 claims description 5
- 229910052758 niobium Inorganic materials 0.000 claims description 5
- 239000010955 niobium Substances 0.000 claims description 5
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 5
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 5
- 229910001887 tin oxide Inorganic materials 0.000 claims description 5
- 230000008569 process Effects 0.000 claims description 4
- 229910052715 tantalum Inorganic materials 0.000 claims description 4
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 4
- 229910052721 tungsten Inorganic materials 0.000 claims description 4
- 239000010937 tungsten Substances 0.000 claims description 4
- 239000002019 doping agent Substances 0.000 claims description 3
- 239000005357 flat glass Substances 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 2
- BWKCCRPHMILRGD-UHFFFAOYSA-N chloro hypochlorite;tungsten Chemical compound [W].ClOCl BWKCCRPHMILRGD-UHFFFAOYSA-N 0.000 claims description 2
- ZHXZNKNQUHUIGN-UHFFFAOYSA-N chloro hypochlorite;vanadium Chemical compound [V].ClOCl ZHXZNKNQUHUIGN-UHFFFAOYSA-N 0.000 claims description 2
- 230000006872 improvement Effects 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 2
- 150000002344 gold compounds Chemical group 0.000 claims 1
- 229910052762 osmium Inorganic materials 0.000 claims 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 claims 1
- 239000010408 film Substances 0.000 description 76
- 239000000523 sample Substances 0.000 description 9
- 230000005540 biological transmission Effects 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 239000003570 air Substances 0.000 description 6
- 239000002987 primer (paints) Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 238000000137 annealing Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- -1 silver halide Chemical class 0.000 description 3
- 230000008016 vaporization Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- 241000772415 Neovison vison Species 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000004043 responsiveness Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-M Butyrate Chemical compound CCCC([O-])=O FERIUCNNQQJTOY-UHFFFAOYSA-M 0.000 description 1
- 241001239379 Calophysus macropterus Species 0.000 description 1
- 241000270722 Crocodylidae Species 0.000 description 1
- 235000009852 Cucurbita pepo Nutrition 0.000 description 1
- 241000219104 Cucurbitaceae Species 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 241000755266 Kathetostoma giganteum Species 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- WGFUTMKFZYTBRE-UHFFFAOYSA-I [V+5].CCCC([O-])=O.CCCC([O-])=O.CCCC([O-])=O.CCCC([O-])=O.CCCC([O-])=O Chemical compound [V+5].CCCC([O-])=O.CCCC([O-])=O.CCCC([O-])=O.CCCC([O-])=O.CCCC([O-])=O WGFUTMKFZYTBRE-UHFFFAOYSA-I 0.000 description 1
- TXZIDXRIKBPYAF-UHFFFAOYSA-I [V+5].OC([O-])=O.OC([O-])=O.OC([O-])=O.OC([O-])=O.OC([O-])=O Chemical compound [V+5].OC([O-])=O.OC([O-])=O.OC([O-])=O.OC([O-])=O.OC([O-])=O TXZIDXRIKBPYAF-UHFFFAOYSA-I 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000004061 bleaching Methods 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 1
- LNNWVNGFPYWNQE-GMIGKAJZSA-N desomorphine Chemical compound C1C2=CC=C(O)C3=C2[C@]24CCN(C)[C@H]1[C@@H]2CCC[C@@H]4O3 LNNWVNGFPYWNQE-GMIGKAJZSA-N 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002736 metal compounds Chemical group 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003482 tantalum compounds Chemical class 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
- 150000003658 tungsten compounds Chemical class 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/405—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/218—V2O5, Nb2O5, Ta2O5
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
- C03C2218/324—De-oxidation
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US344906 | 1982-02-01 | ||
| US344860 | 1982-02-01 | ||
| US06/344,257 US4393095A (en) | 1982-02-01 | 1982-02-01 | Chemical vapor deposition of vanadium oxide coatings |
| US344257 | 1982-02-01 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58135154A true JPS58135154A (ja) | 1983-08-11 |
| JPS6238313B2 JPS6238313B2 (en, 2012) | 1987-08-17 |
Family
ID=23349727
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58016008A Granted JPS58135154A (ja) | 1982-02-01 | 1983-02-01 | 酸化バナジウムコ−ティング製品 |
| JP62062350A Pending JPS62256743A (ja) | 1982-02-01 | 1987-03-17 | サ−モクロミツクウインドガラスの製法 |
| JP62062349A Pending JPS62256742A (ja) | 1982-02-01 | 1987-03-17 | 酸化バナジウムフイルムの化学蒸着法 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62062350A Pending JPS62256743A (ja) | 1982-02-01 | 1987-03-17 | サ−モクロミツクウインドガラスの製法 |
| JP62062349A Pending JPS62256742A (ja) | 1982-02-01 | 1987-03-17 | 酸化バナジウムフイルムの化学蒸着法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4393095A (en, 2012) |
| JP (3) | JPS58135154A (en, 2012) |
| BE (1) | BE895752A (en, 2012) |
| CA (1) | CA1198019A (en, 2012) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01112220A (ja) * | 1987-10-26 | 1989-04-28 | Nippon Sheet Glass Co Ltd | 改良された調光体 |
| JPH03137039A (ja) * | 1989-02-23 | 1991-06-11 | Asahi Glass Co Ltd | 熱線反射物品 |
Families Citing this family (69)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4904621A (en) * | 1987-07-16 | 1990-02-27 | Texas Instruments Incorporated | Remote plasma generation process using a two-stage showerhead |
| US4842687A (en) * | 1987-07-16 | 1989-06-27 | Texas Instruments Incorporated | Method for etching tungsten |
| US4842676A (en) * | 1987-07-16 | 1989-06-27 | Texas Instruments Incorporated | Process for etch of tungsten |
| US4855160A (en) * | 1987-07-16 | 1989-08-08 | Texas Instruments Incorporated | Method for passivating wafer |
| US4849067A (en) * | 1987-07-16 | 1989-07-18 | Texas Instruments Incorporated | Method for etching tungsten |
| US4820377A (en) * | 1987-07-16 | 1989-04-11 | Texas Instruments Incorporated | Method for cleanup processing chamber and vacuum process module |
| US4844773A (en) * | 1987-07-16 | 1989-07-04 | Texas Instruments Incorporated | Process for etching silicon nitride film |
| US4818326A (en) * | 1987-07-16 | 1989-04-04 | Texas Instruments Incorporated | Processing apparatus |
| US4830705A (en) * | 1987-07-16 | 1989-05-16 | Texas Instruments Incorporated | Method for etch of GaAs |
| US4816098A (en) * | 1987-07-16 | 1989-03-28 | Texas Instruments Incorporated | Apparatus for transferring workpieces |
| US4838984A (en) * | 1987-07-16 | 1989-06-13 | Texas Instruments Incorporated | Method for etching films of mercury-cadmium-telluride and zinc sulfid |
| US4832779A (en) * | 1987-07-16 | 1989-05-23 | Texas Instruments Incorporated | Processing apparatus |
| US4855016A (en) * | 1987-07-16 | 1989-08-08 | Texas Instruments Incorporated | Method for etching aluminum film doped with copper |
| US4872938A (en) * | 1987-07-16 | 1989-10-10 | Texas Instruments Incorporated | Processing apparatus |
| US4832777A (en) * | 1987-07-16 | 1989-05-23 | Texas Instruments Incorporated | Processing apparatus and method |
| US4837113A (en) * | 1987-07-16 | 1989-06-06 | Texas Instruments Incorporated | Method for depositing compound from group II-VI |
| US4828649A (en) * | 1987-07-16 | 1989-05-09 | Texas Instruments Incorporated | Method for etching an aluminum film doped with silicon |
| US4867841A (en) * | 1987-07-16 | 1989-09-19 | Texas Instruments Incorporated | Method for etch of polysilicon film |
| US4857132A (en) * | 1987-07-16 | 1989-08-15 | Texas Instruments Incorporated | Processing apparatus for wafers |
| US4838990A (en) * | 1987-07-16 | 1989-06-13 | Texas Instruments Incorporated | Method for plasma etching tungsten |
| US4863558A (en) * | 1987-07-16 | 1989-09-05 | Texas Instruments Incorporated | Method for etching tungsten |
| US4822450A (en) * | 1987-07-16 | 1989-04-18 | Texas Instruments Incorporated | Processing apparatus and method |
| US4832778A (en) * | 1987-07-16 | 1989-05-23 | Texas Instruments Inc. | Processing apparatus for wafers |
| US4830700A (en) * | 1987-07-16 | 1989-05-16 | Texas Instruments Incorporated | Processing apparatus and method |
| US4842686A (en) * | 1987-07-17 | 1989-06-27 | Texas Instruments Incorporated | Wafer processing apparatus and method |
| US5318108A (en) * | 1988-04-15 | 1994-06-07 | Midwest Research Institute | Gas-controlled dynamic vacuum insulation with gas gate |
| US4988533A (en) * | 1988-05-27 | 1991-01-29 | Texas Instruments Incorporated | Method for deposition of silicon oxide on a wafer |
| JPH041926U (en, 2012) * | 1990-04-23 | 1992-01-09 | ||
| US5103103A (en) * | 1990-07-19 | 1992-04-07 | Westinghouse Electric Corp. | Microwave shield |
| US5274241A (en) * | 1990-07-19 | 1993-12-28 | Westinghouse Electric Corp. | Optical and electromagnetic field |
| JP2735147B2 (ja) * | 1994-06-08 | 1998-04-02 | 工業技術院長 | サーモクロミック材料の製造法 |
| JP2764539B2 (ja) * | 1994-06-24 | 1998-06-11 | 工業技術院長 | サーモクロミック材料の製造方法 |
| US5580662A (en) * | 1995-03-09 | 1996-12-03 | Chunghwa Picture Tubes, Ltd. | Antistatic coating for video display screen |
| US5572086A (en) * | 1995-05-18 | 1996-11-05 | Chunghwa Picture Tubes, Ltd. | Broadband antireflective and antistatic coating for CRT |
| FR2738813B1 (fr) * | 1995-09-15 | 1997-10-17 | Saint Gobain Vitrage | Substrat a revetement photo-catalytique |
| US5652477A (en) * | 1995-11-08 | 1997-07-29 | Chunghwa Picture Tubes, Ltd. | Multilayer antistatic/antireflective coating for display device |
| US5773150A (en) * | 1995-11-17 | 1998-06-30 | Chunghwa Picture Tubes, Ltd. | Polymeric antistatic coating for cathode ray tubes |
| GB9619781D0 (en) * | 1996-09-23 | 1996-11-06 | Secr Defence | Multi layer interference coatings |
| US20030039843A1 (en) * | 1997-03-14 | 2003-02-27 | Christopher Johnson | Photoactive coating, coated article, and method of making same |
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| US3483110A (en) * | 1967-05-19 | 1969-12-09 | Bell Telephone Labor Inc | Preparation of thin films of vanadium dioxide |
| JPS4989716A (en, 2012) * | 1972-12-15 | 1974-08-27 | ||
| JPS4990313A (en, 2012) * | 1972-12-21 | 1974-08-29 | ||
| JPS5141643A (ja) * | 1974-10-05 | 1976-04-08 | Daito Kiko Kk | Metsukyokaitenkago |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4307942A (en) * | 1974-05-20 | 1981-12-29 | The Southwall Corporation | Solar control system |
-
1982
- 1982-02-01 US US06/344,257 patent/US4393095A/en not_active Expired - Fee Related
-
1983
- 1983-01-31 CA CA000420619A patent/CA1198019A/en not_active Expired
- 1983-01-31 BE BE0/210006A patent/BE895752A/fr unknown
- 1983-02-01 JP JP58016008A patent/JPS58135154A/ja active Granted
-
1987
- 1987-03-17 JP JP62062350A patent/JPS62256743A/ja active Pending
- 1987-03-17 JP JP62062349A patent/JPS62256742A/ja active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3483110A (en) * | 1967-05-19 | 1969-12-09 | Bell Telephone Labor Inc | Preparation of thin films of vanadium dioxide |
| JPS4989716A (en, 2012) * | 1972-12-15 | 1974-08-27 | ||
| JPS4990313A (en, 2012) * | 1972-12-21 | 1974-08-29 | ||
| JPS5141643A (ja) * | 1974-10-05 | 1976-04-08 | Daito Kiko Kk | Metsukyokaitenkago |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01112220A (ja) * | 1987-10-26 | 1989-04-28 | Nippon Sheet Glass Co Ltd | 改良された調光体 |
| JPH03137039A (ja) * | 1989-02-23 | 1991-06-11 | Asahi Glass Co Ltd | 熱線反射物品 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6238313B2 (en, 2012) | 1987-08-17 |
| JPS62256742A (ja) | 1987-11-09 |
| JPS62256743A (ja) | 1987-11-09 |
| BE895752A (fr) | 1983-08-01 |
| US4393095A (en) | 1983-07-12 |
| CA1198019A (en) | 1985-12-17 |
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