BE895752A - Surfaces de verre revetues d'oxyde de vanadium - Google Patents
Surfaces de verre revetues d'oxyde de vanadiumInfo
- Publication number
- BE895752A BE895752A BE0/210006A BE210006A BE895752A BE 895752 A BE895752 A BE 895752A BE 0/210006 A BE0/210006 A BE 0/210006A BE 210006 A BE210006 A BE 210006A BE 895752 A BE895752 A BE 895752A
- Authority
- BE
- Belgium
- Prior art keywords
- vanadium oxide
- glass surfaces
- surfaces coated
- coated
- glass
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/405—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/218—V2O5, Nb2O5, Ta2O5
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
- C03C2218/324—De-oxidation
Landscapes
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/344,257 US4393095A (en) | 1982-02-01 | 1982-02-01 | Chemical vapor deposition of vanadium oxide coatings |
Publications (1)
Publication Number | Publication Date |
---|---|
BE895752A true BE895752A (fr) | 1983-08-01 |
Family
ID=23349727
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE0/210006A BE895752A (fr) | 1982-02-01 | 1983-01-31 | Surfaces de verre revetues d'oxyde de vanadium |
Country Status (4)
Country | Link |
---|---|
US (1) | US4393095A (fr) |
JP (3) | JPS58135154A (fr) |
BE (1) | BE895752A (fr) |
CA (1) | CA1198019A (fr) |
Families Citing this family (68)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4857132A (en) * | 1987-07-16 | 1989-08-15 | Texas Instruments Incorporated | Processing apparatus for wafers |
US4830700A (en) * | 1987-07-16 | 1989-05-16 | Texas Instruments Incorporated | Processing apparatus and method |
US4838984A (en) * | 1987-07-16 | 1989-06-13 | Texas Instruments Incorporated | Method for etching films of mercury-cadmium-telluride and zinc sulfid |
US4830705A (en) * | 1987-07-16 | 1989-05-16 | Texas Instruments Incorporated | Method for etch of GaAs |
US4855160A (en) * | 1987-07-16 | 1989-08-08 | Texas Instruments Incorporated | Method for passivating wafer |
US4837113A (en) * | 1987-07-16 | 1989-06-06 | Texas Instruments Incorporated | Method for depositing compound from group II-VI |
US4842687A (en) * | 1987-07-16 | 1989-06-27 | Texas Instruments Incorporated | Method for etching tungsten |
US4828649A (en) * | 1987-07-16 | 1989-05-09 | Texas Instruments Incorporated | Method for etching an aluminum film doped with silicon |
US4863558A (en) * | 1987-07-16 | 1989-09-05 | Texas Instruments Incorporated | Method for etching tungsten |
US4844773A (en) * | 1987-07-16 | 1989-07-04 | Texas Instruments Incorporated | Process for etching silicon nitride film |
US4867841A (en) * | 1987-07-16 | 1989-09-19 | Texas Instruments Incorporated | Method for etch of polysilicon film |
US4855016A (en) * | 1987-07-16 | 1989-08-08 | Texas Instruments Incorporated | Method for etching aluminum film doped with copper |
US4872938A (en) * | 1987-07-16 | 1989-10-10 | Texas Instruments Incorporated | Processing apparatus |
US4842676A (en) * | 1987-07-16 | 1989-06-27 | Texas Instruments Incorporated | Process for etch of tungsten |
US4822450A (en) * | 1987-07-16 | 1989-04-18 | Texas Instruments Incorporated | Processing apparatus and method |
US4832779A (en) * | 1987-07-16 | 1989-05-23 | Texas Instruments Incorporated | Processing apparatus |
US4838990A (en) * | 1987-07-16 | 1989-06-13 | Texas Instruments Incorporated | Method for plasma etching tungsten |
US4820377A (en) * | 1987-07-16 | 1989-04-11 | Texas Instruments Incorporated | Method for cleanup processing chamber and vacuum process module |
US4849067A (en) * | 1987-07-16 | 1989-07-18 | Texas Instruments Incorporated | Method for etching tungsten |
US4818326A (en) * | 1987-07-16 | 1989-04-04 | Texas Instruments Incorporated | Processing apparatus |
US4832777A (en) * | 1987-07-16 | 1989-05-23 | Texas Instruments Incorporated | Processing apparatus and method |
US4904621A (en) * | 1987-07-16 | 1990-02-27 | Texas Instruments Incorporated | Remote plasma generation process using a two-stage showerhead |
US4832778A (en) * | 1987-07-16 | 1989-05-23 | Texas Instruments Inc. | Processing apparatus for wafers |
US4816098A (en) * | 1987-07-16 | 1989-03-28 | Texas Instruments Incorporated | Apparatus for transferring workpieces |
US4842686A (en) * | 1987-07-17 | 1989-06-27 | Texas Instruments Incorporated | Wafer processing apparatus and method |
JP2588910B2 (ja) * | 1987-10-26 | 1997-03-12 | 日本板硝子株式会社 | 改良された調光体 |
US5318108A (en) * | 1988-04-15 | 1994-06-07 | Midwest Research Institute | Gas-controlled dynamic vacuum insulation with gas gate |
US4988533A (en) * | 1988-05-27 | 1991-01-29 | Texas Instruments Incorporated | Method for deposition of silicon oxide on a wafer |
JPH0723235B2 (ja) * | 1989-02-23 | 1995-03-15 | 旭硝子株式会社 | 熱線反射物品 |
JPH041926U (fr) * | 1990-04-23 | 1992-01-09 | ||
US5274241A (en) * | 1990-07-19 | 1993-12-28 | Westinghouse Electric Corp. | Optical and electromagnetic field |
US5103103A (en) * | 1990-07-19 | 1992-04-07 | Westinghouse Electric Corp. | Microwave shield |
JP2735147B2 (ja) * | 1994-06-08 | 1998-04-02 | 工業技術院長 | サーモクロミック材料の製造法 |
JP2764539B2 (ja) * | 1994-06-24 | 1998-06-11 | 工業技術院長 | サーモクロミック材料の製造方法 |
US5580662A (en) * | 1995-03-09 | 1996-12-03 | Chunghwa Picture Tubes, Ltd. | Antistatic coating for video display screen |
US5572086A (en) * | 1995-05-18 | 1996-11-05 | Chunghwa Picture Tubes, Ltd. | Broadband antireflective and antistatic coating for CRT |
FR2738813B1 (fr) * | 1995-09-15 | 1997-10-17 | Saint Gobain Vitrage | Substrat a revetement photo-catalytique |
US5652477A (en) * | 1995-11-08 | 1997-07-29 | Chunghwa Picture Tubes, Ltd. | Multilayer antistatic/antireflective coating for display device |
US5773150A (en) * | 1995-11-17 | 1998-06-30 | Chunghwa Picture Tubes, Ltd. | Polymeric antistatic coating for cathode ray tubes |
GB9619781D0 (en) * | 1996-09-23 | 1996-11-06 | Secr Defence | Multi layer interference coatings |
US20030039843A1 (en) * | 1997-03-14 | 2003-02-27 | Christopher Johnson | Photoactive coating, coated article, and method of making same |
US20020155299A1 (en) | 1997-03-14 | 2002-10-24 | Harris Caroline S. | Photo-induced hydrophilic article and method of making same |
US7096692B2 (en) * | 1997-03-14 | 2006-08-29 | Ppg Industries Ohio, Inc. | Visible-light-responsive photoactive coating, coated article, and method of making same |
US5989514A (en) * | 1997-07-21 | 1999-11-23 | Nanogram Corporation | Processing of vanadium oxide particles with heat |
US6579612B1 (en) | 1999-06-24 | 2003-06-17 | International Business Machines Corporation | Magnetostrictive sensor structure |
FR2809388B1 (fr) * | 2000-05-23 | 2002-12-20 | Saint Gobain Vitrage | Vitrage comprenant au moins une couche a proprietes thermochromes |
US7323249B2 (en) * | 2000-08-31 | 2008-01-29 | Ppg Industries Ohio, Inc. | Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby |
US6677063B2 (en) | 2000-08-31 | 2004-01-13 | Ppg Industries Ohio, Inc. | Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby |
US6623662B2 (en) | 2001-05-23 | 2003-09-23 | Chunghwa Picture Tubes, Ltd. | Carbon black coating for CRT display screen with uniform light absorption |
US6746530B2 (en) | 2001-08-02 | 2004-06-08 | Chunghwa Pictures Tubes, Ltd. | High contrast, moisture resistant antistatic/antireflective coating for CRT display screen |
JP3849008B2 (ja) * | 2001-09-20 | 2006-11-22 | 独立行政法人産業技術総合研究所 | 高性能自動調光窓コーティング材料 |
US6521346B1 (en) | 2001-09-27 | 2003-02-18 | Chunghwa Picture Tubes, Ltd. | Antistatic/antireflective coating for video display screen with improved refractivity |
US6764580B2 (en) * | 2001-11-15 | 2004-07-20 | Chungwa Picture Tubes, Ltd. | Application of multi-layer antistatic/antireflective coating to video display screen by sputtering |
US6656331B2 (en) | 2002-04-30 | 2003-12-02 | Chunghwa Picture Tubes, Ltd. | Application of antistatic/antireflective coating to a video display screen |
JP4533996B2 (ja) * | 2005-01-28 | 2010-09-01 | 独立行政法人産業技術総合研究所 | 高断熱自動調光ガラス及びその製造方法 |
TWI252150B (en) * | 2005-03-22 | 2006-04-01 | Speed Tech Corp | In mold decoration fabrication of injection molding |
WO2008004787A1 (fr) * | 2006-07-06 | 2008-01-10 | Electronics And Telecommunications Research Institute | Procédé de formation de film mince à base de trioxyde de vanadium présentant une transition métal-isolant abrupte |
KR100842287B1 (ko) * | 2006-07-06 | 2008-06-30 | 한국전자통신연구원 | 급격한 금속-절연체 전이를 갖는 v2o3 박막의 제조방법 |
US7761053B2 (en) * | 2006-09-08 | 2010-07-20 | Mpb Communications Inc. | Variable emittance thermochromic material and satellite system |
DE102007061272A1 (de) | 2007-12-19 | 2009-06-25 | Schott Ag | Schichten, insbesondere photonische Schichten, enthaltend thermochrome Verbindungen, auf Glas- oder Glaskeramiksubstraten |
WO2011118700A1 (fr) * | 2010-03-24 | 2011-09-29 | 独立行政法人産業技術総合研究所 | Procédé de fabrication d'un mince film optique de dioxyde de vanadium |
US8334161B2 (en) * | 2010-07-02 | 2012-12-18 | Sunpower Corporation | Method of fabricating a solar cell with a tunnel dielectric layer |
EP2450322A1 (fr) * | 2010-09-13 | 2012-05-09 | Korea Electronics Technology Institute | Système à double fenêtre/porte pour bloquer les rayons infrarouges |
WO2013184556A1 (fr) | 2012-06-05 | 2013-12-12 | President And Fellows Of Harvard College | Revêtements optiques ultraminces et dispositifs et procédés d'utilisation de revêtements optiques ultraminces |
CN103014701A (zh) * | 2012-12-22 | 2013-04-03 | 蚌埠玻璃工业设计研究院 | 一种二氧化钒薄膜的制备方法 |
CN106892573A (zh) * | 2017-03-20 | 2017-06-27 | 武汉理工大学 | 一种环保型热致变色二氧化钒薄膜的制备方法 |
CN108515009A (zh) * | 2018-04-12 | 2018-09-11 | 四川星明能源环保科技有限公司 | A相二氧化钒薄膜及其制备方法 |
CN116655255B (zh) * | 2023-08-01 | 2023-10-13 | 中国耀华玻璃集团有限公司 | 一种易清洁的温致节能阳光控制膜玻璃及在线生产方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3483110A (en) * | 1967-05-19 | 1969-12-09 | Bell Telephone Labor Inc | Preparation of thin films of vanadium dioxide |
ZA735383B (en) * | 1972-12-15 | 1975-03-26 | Ppg Industries Inc | Coating composition vaporizer |
IT996924B (it) * | 1972-12-21 | 1975-12-10 | Glaverbel | Procedimento per formare uno strato di ossido metallico |
US4307942A (en) * | 1974-05-20 | 1981-12-29 | The Southwall Corporation | Solar control system |
JPS5141643A (ja) * | 1974-10-05 | 1976-04-08 | Daito Kiko Kk | Metsukyokaitenkago |
-
1982
- 1982-02-01 US US06/344,257 patent/US4393095A/en not_active Expired - Fee Related
-
1983
- 1983-01-31 BE BE0/210006A patent/BE895752A/fr unknown
- 1983-01-31 CA CA000420619A patent/CA1198019A/fr not_active Expired
- 1983-02-01 JP JP58016008A patent/JPS58135154A/ja active Granted
-
1987
- 1987-03-17 JP JP62062349A patent/JPS62256742A/ja active Pending
- 1987-03-17 JP JP62062350A patent/JPS62256743A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
US4393095A (en) | 1983-07-12 |
JPS62256742A (ja) | 1987-11-09 |
JPS6238313B2 (fr) | 1987-08-17 |
CA1198019A (fr) | 1985-12-17 |
JPS62256743A (ja) | 1987-11-09 |
JPS58135154A (ja) | 1983-08-11 |
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