JPS5788451A - Photomask - Google Patents

Photomask

Info

Publication number
JPS5788451A
JPS5788451A JP16459380A JP16459380A JPS5788451A JP S5788451 A JPS5788451 A JP S5788451A JP 16459380 A JP16459380 A JP 16459380A JP 16459380 A JP16459380 A JP 16459380A JP S5788451 A JPS5788451 A JP S5788451A
Authority
JP
Japan
Prior art keywords
alignment
photomask
alignment mark
area
circuit pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16459380A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6212507B2 (enrdf_load_stackoverflow
Inventor
Susumu Aiuchi
Minoru Ikeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP16459380A priority Critical patent/JPS5788451A/ja
Publication of JPS5788451A publication Critical patent/JPS5788451A/ja
Publication of JPS6212507B2 publication Critical patent/JPS6212507B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP16459380A 1980-11-25 1980-11-25 Photomask Granted JPS5788451A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16459380A JPS5788451A (en) 1980-11-25 1980-11-25 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16459380A JPS5788451A (en) 1980-11-25 1980-11-25 Photomask

Publications (2)

Publication Number Publication Date
JPS5788451A true JPS5788451A (en) 1982-06-02
JPS6212507B2 JPS6212507B2 (enrdf_load_stackoverflow) 1987-03-19

Family

ID=15796124

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16459380A Granted JPS5788451A (en) 1980-11-25 1980-11-25 Photomask

Country Status (1)

Country Link
JP (1) JPS5788451A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60262423A (ja) * 1984-06-11 1985-12-25 Nippon Kogaku Kk <Nikon> 投影露光方法
JPS6254263A (ja) * 1985-09-02 1987-03-09 Nippon Kogaku Kk <Nikon> マスク及び該マスクを用いる露光装置
JPS6254432A (ja) * 1985-09-02 1987-03-10 Seiko Epson Corp 半導体装置
JPS62144168A (ja) * 1985-12-18 1987-06-27 Hitachi Ltd レチクル
US6118517A (en) * 1996-08-29 2000-09-12 Nec Corporation Mask pattern for alignment

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60262423A (ja) * 1984-06-11 1985-12-25 Nippon Kogaku Kk <Nikon> 投影露光方法
JPS6254263A (ja) * 1985-09-02 1987-03-09 Nippon Kogaku Kk <Nikon> マスク及び該マスクを用いる露光装置
JPS6254432A (ja) * 1985-09-02 1987-03-10 Seiko Epson Corp 半導体装置
JPS62144168A (ja) * 1985-12-18 1987-06-27 Hitachi Ltd レチクル
US6118517A (en) * 1996-08-29 2000-09-12 Nec Corporation Mask pattern for alignment

Also Published As

Publication number Publication date
JPS6212507B2 (enrdf_load_stackoverflow) 1987-03-19

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