JPS568822A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS568822A
JPS568822A JP8579380A JP8579380A JPS568822A JP S568822 A JPS568822 A JP S568822A JP 8579380 A JP8579380 A JP 8579380A JP 8579380 A JP8579380 A JP 8579380A JP S568822 A JPS568822 A JP S568822A
Authority
JP
Japan
Prior art keywords
mark
marks
wafer
mask
aligned
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8579380A
Other languages
Japanese (ja)
Other versions
JPS571890B2 (en
Inventor
Kazuo Takeda
Chikao Fujinuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Sanyo Electric Co Ltd
Sanyo Electric Co Ltd
Original Assignee
Tokyo Sanyo Electric Co Ltd
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Sanyo Electric Co Ltd, Sanyo Electric Co Ltd filed Critical Tokyo Sanyo Electric Co Ltd
Priority to JP8579380A priority Critical patent/JPS568822A/en
Publication of JPS568822A publication Critical patent/JPS568822A/en
Publication of JPS571890B2 publication Critical patent/JPS571890B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Abstract

PURPOSE:To remarkably simply aligning process of a mask in a semiconductor device by forming an indication mark at the corresponding position of the exposed mask to a wafer. CONSTITUTION:Indication marks 19, 19' of the shape being different from first and second marks 17, 18 respectively are formed at the end of a mark installing area pattern 16 of the first exposure mask 14. On the other hand, indication marks 22, 22' are also formed at the end of a mark installing area 20 of a semiconductor wafer 11b, are then aligned initially with the respective indication marks, and are thereafter aligned with an inner profile formed by the second mark 21 and an outer profile formed by the mark 18. After they are photoetched, they are aligned with a wafer by using the second exposure mask, are photoetched, and processed several times repeatedly. New marks are sequentially formed in this case, but when the in dication mark is formed at the corresponding position of the exposure mask with the wafer, the masking work can be remarkably simply executed.
JP8579380A 1980-06-23 1980-06-23 Manufacture of semiconductor device Granted JPS568822A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8579380A JPS568822A (en) 1980-06-23 1980-06-23 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8579380A JPS568822A (en) 1980-06-23 1980-06-23 Manufacture of semiconductor device

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP3617975A Division JPS568490B2 (en) 1975-03-25 1975-03-25

Publications (2)

Publication Number Publication Date
JPS568822A true JPS568822A (en) 1981-01-29
JPS571890B2 JPS571890B2 (en) 1982-01-13

Family

ID=13868758

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8579380A Granted JPS568822A (en) 1980-06-23 1980-06-23 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS568822A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59165421A (en) * 1983-03-10 1984-09-18 Nec Corp Mark for positioning of semiconductor device
JPS61150268A (en) * 1984-12-24 1986-07-08 Hitachi Ltd Manufacture of semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59165421A (en) * 1983-03-10 1984-09-18 Nec Corp Mark for positioning of semiconductor device
JPS6347329B2 (en) * 1983-03-10 1988-09-21 Nippon Electric Co
JPS61150268A (en) * 1984-12-24 1986-07-08 Hitachi Ltd Manufacture of semiconductor device

Also Published As

Publication number Publication date
JPS571890B2 (en) 1982-01-13

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