JPS5776879A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5776879A JPS5776879A JP55152088A JP15208880A JPS5776879A JP S5776879 A JPS5776879 A JP S5776879A JP 55152088 A JP55152088 A JP 55152088A JP 15208880 A JP15208880 A JP 15208880A JP S5776879 A JPS5776879 A JP S5776879A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor layer
- property
- layer
- semi
- forms
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 7
- 229910001218 Gallium arsenide Inorganic materials 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000005036 potential barrier Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/778—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
- H01L29/7782—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with confinement of carriers by at least two heterojunctions, e.g. DHHEMT, quantum well HEMT, DHMODFET
- H01L29/7783—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with confinement of carriers by at least two heterojunctions, e.g. DHHEMT, quantum well HEMT, DHMODFET using III-V semiconductor material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/107—Substrate region of field-effect devices
- H01L29/1075—Substrate region of field-effect devices of field-effect transistors
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Junction Field-Effect Transistors (AREA)
- Bipolar Transistors (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55152088A JPS5776879A (en) | 1980-10-31 | 1980-10-31 | Semiconductor device |
DE8181109124T DE3166512D1 (en) | 1980-10-31 | 1981-10-28 | Heterojunction semiconductor device |
EP81109124A EP0051271B1 (en) | 1980-10-31 | 1981-10-28 | Heterojunction semiconductor device |
US06/935,171 US4772925A (en) | 1980-10-31 | 1986-11-26 | High speed switching field effect transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55152088A JPS5776879A (en) | 1980-10-31 | 1980-10-31 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5776879A true JPS5776879A (en) | 1982-05-14 |
JPH024140B2 JPH024140B2 (ja) | 1990-01-26 |
Family
ID=15532779
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55152088A Granted JPS5776879A (en) | 1980-10-31 | 1980-10-31 | Semiconductor device |
Country Status (4)
Country | Link |
---|---|
US (1) | US4772925A (ja) |
EP (1) | EP0051271B1 (ja) |
JP (1) | JPS5776879A (ja) |
DE (1) | DE3166512D1 (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59103389A (ja) * | 1982-12-04 | 1984-06-14 | Nippon Telegr & Teleph Corp <Ntt> | 超伝導素子及びその製法 |
JPS59228768A (ja) * | 1983-06-11 | 1984-12-22 | Agency Of Ind Science & Technol | 半導体集積回路 |
JPS613464A (ja) * | 1984-06-18 | 1986-01-09 | Hitachi Ltd | 半導体装置 |
JPS6147681A (ja) * | 1984-07-31 | 1986-03-08 | アメリカン テレフォン アンド テレグラフ カムパニー | 可変禁制帯デバイス |
JPS61131565A (ja) * | 1984-11-30 | 1986-06-19 | Fujitsu Ltd | 電界効果型半導体装置 |
JP2002330904A (ja) * | 2001-05-07 | 2002-11-19 | Kowa Co Ltd | 電気掃除機用吸込口の回転ロータ |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4633282A (en) * | 1982-10-04 | 1986-12-30 | Rockwell International Corporation | Metal-semiconductor field-effect transistor with a partial p-type drain |
JPH0810751B2 (ja) * | 1983-12-23 | 1996-01-31 | 株式会社日立製作所 | 半導体装置 |
GB2166286B (en) * | 1984-10-26 | 1988-07-20 | Stc Plc | Photo-detectors |
US4652896A (en) * | 1985-06-27 | 1987-03-24 | The United States Of America As Represented By The Secretary Of The Air Force | Modulation doped GaAs/AlGaAs field effect transistor |
EP0264932A1 (en) * | 1986-10-24 | 1988-04-27 | Sumitomo Electric Industries Limited | Field effect transistor |
US4855797A (en) * | 1987-07-06 | 1989-08-08 | Siemens Corporate Research And Support, Inc. | Modulation doped high electron mobility transistor with n-i-p-i structure |
US4839310A (en) * | 1988-01-27 | 1989-06-13 | Massachusetts Institute Of Technology | High mobility transistor with opposed-gates |
US5177026A (en) * | 1989-05-29 | 1993-01-05 | Mitsubishi Denki Kabushiki Kaisha | Method for producing a compound semiconductor MIS FET |
US4987463A (en) * | 1989-08-28 | 1991-01-22 | Motorola, Inc. | FET having a high trap concentration interface layer |
JP2822547B2 (ja) * | 1990-03-06 | 1998-11-11 | 富士通株式会社 | 高電子移動度トランジスタ |
TW354411B (en) * | 1996-09-27 | 1999-03-11 | Sanyo Electric Co | Semiconductor device and its manufacturing process |
JP3705431B2 (ja) * | 2002-03-28 | 2005-10-12 | ユーディナデバイス株式会社 | 半導体装置及びその製造方法 |
WO2006038390A1 (ja) * | 2004-09-30 | 2006-04-13 | Sanken Electric Co., Ltd. | 半導体装置 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53126282A (en) * | 1977-04-08 | 1978-11-04 | Thomson Csf | Fet transistor |
US4157556A (en) * | 1977-01-06 | 1979-06-05 | Varian Associates, Inc. | Heterojunction confinement field effect transistor |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2725180A1 (de) * | 1977-06-03 | 1978-12-07 | Sollich Spezialmasch | Vorrichtung zum behandeln von kakaobutter enthaltenden massen |
GB2012480A (en) * | 1978-01-12 | 1979-07-25 | Plessey Co Ltd | Heterostructure field effect transistors |
US4194935A (en) * | 1978-04-24 | 1980-03-25 | Bell Telephone Laboratories, Incorporated | Method of making high mobility multilayered heterojunction devices employing modulated doping |
CA1145482A (en) * | 1979-12-28 | 1983-04-26 | Takashi Mimura | High electron mobility single heterojunction semiconductor device |
-
1980
- 1980-10-31 JP JP55152088A patent/JPS5776879A/ja active Granted
-
1981
- 1981-10-28 DE DE8181109124T patent/DE3166512D1/de not_active Expired
- 1981-10-28 EP EP81109124A patent/EP0051271B1/en not_active Expired
-
1986
- 1986-11-26 US US06/935,171 patent/US4772925A/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4157556A (en) * | 1977-01-06 | 1979-06-05 | Varian Associates, Inc. | Heterojunction confinement field effect transistor |
JPS53126282A (en) * | 1977-04-08 | 1978-11-04 | Thomson Csf | Fet transistor |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59103389A (ja) * | 1982-12-04 | 1984-06-14 | Nippon Telegr & Teleph Corp <Ntt> | 超伝導素子及びその製法 |
JPS6359272B2 (ja) * | 1982-12-04 | 1988-11-18 | ||
JPS59228768A (ja) * | 1983-06-11 | 1984-12-22 | Agency Of Ind Science & Technol | 半導体集積回路 |
JPS613464A (ja) * | 1984-06-18 | 1986-01-09 | Hitachi Ltd | 半導体装置 |
JPH07120790B2 (ja) * | 1984-06-18 | 1995-12-20 | 株式会社日立製作所 | 半導体装置 |
US5831296A (en) * | 1984-06-18 | 1998-11-03 | Hitachi, Ltd. | Semiconductor device |
JPS6147681A (ja) * | 1984-07-31 | 1986-03-08 | アメリカン テレフォン アンド テレグラフ カムパニー | 可変禁制帯デバイス |
JPS61131565A (ja) * | 1984-11-30 | 1986-06-19 | Fujitsu Ltd | 電界効果型半導体装置 |
JP2002330904A (ja) * | 2001-05-07 | 2002-11-19 | Kowa Co Ltd | 電気掃除機用吸込口の回転ロータ |
Also Published As
Publication number | Publication date |
---|---|
DE3166512D1 (en) | 1984-11-08 |
US4772925A (en) | 1988-09-20 |
EP0051271B1 (en) | 1984-10-03 |
EP0051271A1 (en) | 1982-05-12 |
JPH024140B2 (ja) | 1990-01-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5776879A (en) | Semiconductor device | |
EP0671769A3 (en) | Insulated gate field effect transistor | |
KR940008230B1 (ko) | 헤테로 접합 전계 효과 트랜지스터 | |
JPS56125868A (en) | Thin-film semiconductor device | |
JPS5595370A (en) | Compound semiconductor field-effect transistor | |
JPS55117281A (en) | 3[5 group compound semiconductor hetero structure mosfet | |
JPS5768073A (en) | Field effect transistor | |
EP0539949B1 (en) | High electron mobility transistor having improved electron controllability | |
JPS5752174A (en) | Multigate field effect transistor | |
JPS61161766A (ja) | 縦型mosfet | |
JPS56120169A (en) | Semiconductor device | |
JPS56165358A (en) | Semiconductor device | |
JPS5321581A (en) | Production of gaas schottky barrier gate type field effect transistors | |
JPS57109372A (en) | Semiconductor device | |
JPS53125779A (en) | Mos type semiconductor device | |
JPS57160170A (en) | Field effect semiconductor device | |
JPS57147283A (en) | Semiconductor device | |
JPH03155169A (ja) | 半導体装置 | |
JPS57199266A (en) | Field effect transistor and manufacture thereof | |
JPS57133681A (en) | Field-effect semiconductor device | |
JPH0714035B2 (ja) | 電界効果型半導体装置 | |
JPS645074A (en) | Field effect transistor | |
JPS57106081A (en) | Normally-off type schottky junction field effect transistor | |
JPS5734368A (en) | Protective diode for insulated gate field-effect transistor | |
JPS5698876A (en) | Junction type fet |