JPS5732640A - Production of semiconductor device - Google Patents
Production of semiconductor deviceInfo
- Publication number
- JPS5732640A JPS5732640A JP10868980A JP10868980A JPS5732640A JP S5732640 A JPS5732640 A JP S5732640A JP 10868980 A JP10868980 A JP 10868980A JP 10868980 A JP10868980 A JP 10868980A JP S5732640 A JPS5732640 A JP S5732640A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- layer
- metal layer
- etched
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10868980A JPS5732640A (en) | 1980-08-06 | 1980-08-06 | Production of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10868980A JPS5732640A (en) | 1980-08-06 | 1980-08-06 | Production of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5732640A true JPS5732640A (en) | 1982-02-22 |
Family
ID=14491151
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10868980A Pending JPS5732640A (en) | 1980-08-06 | 1980-08-06 | Production of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5732640A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59136935A (ja) * | 1983-01-27 | 1984-08-06 | Nec Corp | 半導体装置の製造方法 |
JPS60186097U (ja) * | 1984-05-21 | 1985-12-10 | 株式会社明電舎 | 電気水処理装置 |
-
1980
- 1980-08-06 JP JP10868980A patent/JPS5732640A/ja active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59136935A (ja) * | 1983-01-27 | 1984-08-06 | Nec Corp | 半導体装置の製造方法 |
JPH0148652B2 (ja) * | 1983-01-27 | 1989-10-20 | Nippon Electric Co | |
JPS60186097U (ja) * | 1984-05-21 | 1985-12-10 | 株式会社明電舎 | 電気水処理装置 |
JPH0351036Y2 (ja) * | 1984-05-21 | 1991-10-31 |
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