JPS57183393A - Apparatus for growing single crystal - Google Patents

Apparatus for growing single crystal

Info

Publication number
JPS57183393A
JPS57183393A JP6521081A JP6521081A JPS57183393A JP S57183393 A JPS57183393 A JP S57183393A JP 6521081 A JP6521081 A JP 6521081A JP 6521081 A JP6521081 A JP 6521081A JP S57183393 A JPS57183393 A JP S57183393A
Authority
JP
Japan
Prior art keywords
single crystal
heat source
heating means
temperature
outer circumference
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6521081A
Other languages
Japanese (ja)
Inventor
Masayoshi Sasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP6521081A priority Critical patent/JPS57183393A/en
Publication of JPS57183393A publication Critical patent/JPS57183393A/en
Pending legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE: To provide a single crystal growing apparatus giving a uniform and high quality single crystal, by placing the second heat source along the outer circumference of the zone corresponding to the moving range of the pulling device in the single crystal pulling chamber.
CONSTITUTION: The single crystal pulling chamber 8 is furnished with the first heat source 6 for heating the molten liquid 3 in the crucible 4 and the second single crystal heating means 14 at the outer circumference of the zone corresponding to the moving range of the single crystal pulling device 9. The single crystal heating means 14 is constructed of the second heat source 11, the heat- shielding plate 12 enclosing the heat source 11, and the quartz tube inserted into the heat source 11. The temperature of the single crystal 2 pulled up with the device 9 can be maintained at a constant level by the heat source 11 of the heating means 14. The temperature of the heat source 11 is preferably 1,200± 150°C. The apparatus enables the control of the temperature distribution, cooling process, and thermal history of the single crystal rod 2 during growth, and gives a uniform single crystal 2.
COPYRIGHT: (C)1982,JPO&Japio
JP6521081A 1981-05-01 1981-05-01 Apparatus for growing single crystal Pending JPS57183393A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6521081A JPS57183393A (en) 1981-05-01 1981-05-01 Apparatus for growing single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6521081A JPS57183393A (en) 1981-05-01 1981-05-01 Apparatus for growing single crystal

Publications (1)

Publication Number Publication Date
JPS57183393A true JPS57183393A (en) 1982-11-11

Family

ID=13280317

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6521081A Pending JPS57183393A (en) 1981-05-01 1981-05-01 Apparatus for growing single crystal

Country Status (1)

Country Link
JP (1) JPS57183393A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61201692A (en) * 1985-03-04 1986-09-06 Mitsubishi Metal Corp Method for pulling and growing silicon single crystal with less generation of defect
CN110923806A (en) * 2019-12-24 2020-03-27 西安奕斯伟硅片技术有限公司 Single crystal furnace and preparation method of single crystal silicon rod
CN111850675A (en) * 2019-04-30 2020-10-30 上海新昇半导体科技有限公司 Semiconductor crystal growth device and method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61201692A (en) * 1985-03-04 1986-09-06 Mitsubishi Metal Corp Method for pulling and growing silicon single crystal with less generation of defect
JPH0367994B2 (en) * 1985-03-04 1991-10-24 Mitsubishi Materiaru Kk
CN111850675A (en) * 2019-04-30 2020-10-30 上海新昇半导体科技有限公司 Semiconductor crystal growth device and method
CN110923806A (en) * 2019-12-24 2020-03-27 西安奕斯伟硅片技术有限公司 Single crystal furnace and preparation method of single crystal silicon rod
CN110923806B (en) * 2019-12-24 2021-07-23 西安奕斯伟硅片技术有限公司 Single crystal furnace and preparation method of single crystal silicon rod

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