JPS5710930A - Dry development method - Google Patents

Dry development method

Info

Publication number
JPS5710930A
JPS5710930A JP8573280A JP8573280A JPS5710930A JP S5710930 A JPS5710930 A JP S5710930A JP 8573280 A JP8573280 A JP 8573280A JP 8573280 A JP8573280 A JP 8573280A JP S5710930 A JPS5710930 A JP S5710930A
Authority
JP
Japan
Prior art keywords
resist
gas plasma
irradiated
thickness
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8573280A
Other languages
English (en)
Other versions
JPS6054775B2 (ja
Inventor
Teruhiko Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP8573280A priority Critical patent/JPS6054775B2/ja
Publication of JPS5710930A publication Critical patent/JPS5710930A/ja
Publication of JPS6054775B2 publication Critical patent/JPS6054775B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
JP8573280A 1980-06-24 1980-06-24 ドライ現像方法 Expired JPS6054775B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8573280A JPS6054775B2 (ja) 1980-06-24 1980-06-24 ドライ現像方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8573280A JPS6054775B2 (ja) 1980-06-24 1980-06-24 ドライ現像方法

Publications (2)

Publication Number Publication Date
JPS5710930A true JPS5710930A (en) 1982-01-20
JPS6054775B2 JPS6054775B2 (ja) 1985-12-02

Family

ID=13867005

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8573280A Expired JPS6054775B2 (ja) 1980-06-24 1980-06-24 ドライ現像方法

Country Status (1)

Country Link
JP (1) JPS6054775B2 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6138303A (ja) * 1984-07-31 1986-02-24 川崎重工業株式会社 転炉排ガス処理装置の過熱蒸気発生装置
JP2007266594A (ja) * 2006-03-07 2007-10-11 Asml Netherlands Bv 強化リソグラフィパターニング方法およびシステム

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6138303A (ja) * 1984-07-31 1986-02-24 川崎重工業株式会社 転炉排ガス処理装置の過熱蒸気発生装置
JPH0322525B2 (ja) * 1984-07-31 1991-03-27 Kawasaki Heavy Ind Ltd
JP2007266594A (ja) * 2006-03-07 2007-10-11 Asml Netherlands Bv 強化リソグラフィパターニング方法およびシステム

Also Published As

Publication number Publication date
JPS6054775B2 (ja) 1985-12-02

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