JPS5710267A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5710267A JPS5710267A JP8488580A JP8488580A JPS5710267A JP S5710267 A JPS5710267 A JP S5710267A JP 8488580 A JP8488580 A JP 8488580A JP 8488580 A JP8488580 A JP 8488580A JP S5710267 A JPS5710267 A JP S5710267A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- oxide films
- polycrystalline
- films
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6758—Thin-film transistors [TFT] characterised by the insulating substrates
- H10D30/6759—Silicon-on-sapphire [SOS] substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/611—Insulated-gate field-effect transistors [IGFET] having multiple independently-addressable gate electrodes influencing the same channel
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/637—Lateral IGFETs having no inversion channels, e.g. buried channel lateral IGFETs, normally-on lateral IGFETs or depletion-mode lateral IGFETs
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8488580A JPS5710267A (en) | 1980-06-23 | 1980-06-23 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8488580A JPS5710267A (en) | 1980-06-23 | 1980-06-23 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5710267A true JPS5710267A (en) | 1982-01-19 |
JPH0467336B2 JPH0467336B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-10-28 |
Family
ID=13843210
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8488580A Granted JPS5710267A (en) | 1980-06-23 | 1980-06-23 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5710267A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58153850A (ja) * | 1982-03-08 | 1983-09-13 | 極東鋼弦コンクリ−ト振興株式会社 | リング状pc鋼材の緊張・定着用ブロツク |
US5264720A (en) * | 1989-09-22 | 1993-11-23 | Nippondenso Co., Ltd. | High withstanding voltage transistor |
EP0588300A3 (en) * | 1992-09-15 | 1994-10-12 | Canon Kk | Semiconductor transistor. |
JPH0878692A (ja) * | 1994-09-01 | 1996-03-22 | Nec Corp | Soi型半導体装置およびその製造方法 |
US5753542A (en) * | 1985-08-02 | 1998-05-19 | Semiconductor Energy Laboratory Co., Ltd. | Method for crystallizing semiconductor material without exposing it to air |
US5962869A (en) * | 1988-09-28 | 1999-10-05 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor material and method for forming the same and thin film transistor |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5513947A (en) * | 1978-07-17 | 1980-01-31 | Seiko Epson Corp | Semiconductor integrated circuit device |
-
1980
- 1980-06-23 JP JP8488580A patent/JPS5710267A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5513947A (en) * | 1978-07-17 | 1980-01-31 | Seiko Epson Corp | Semiconductor integrated circuit device |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58153850A (ja) * | 1982-03-08 | 1983-09-13 | 極東鋼弦コンクリ−ト振興株式会社 | リング状pc鋼材の緊張・定着用ブロツク |
US5753542A (en) * | 1985-08-02 | 1998-05-19 | Semiconductor Energy Laboratory Co., Ltd. | Method for crystallizing semiconductor material without exposing it to air |
US5962869A (en) * | 1988-09-28 | 1999-10-05 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor material and method for forming the same and thin film transistor |
US5264720A (en) * | 1989-09-22 | 1993-11-23 | Nippondenso Co., Ltd. | High withstanding voltage transistor |
EP0588300A3 (en) * | 1992-09-15 | 1994-10-12 | Canon Kk | Semiconductor transistor. |
US5789790A (en) * | 1992-09-15 | 1998-08-04 | Canon Kabushiki Kaisha | Semiconductor device |
US5998854A (en) * | 1992-09-15 | 1999-12-07 | Canon Kabushiki Kaisha | Semiconductor device |
JPH0878692A (ja) * | 1994-09-01 | 1996-03-22 | Nec Corp | Soi型半導体装置およびその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0467336B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-10-28 |
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