JPS5619053A - Manufacture of photomask - Google Patents

Manufacture of photomask

Info

Publication number
JPS5619053A
JPS5619053A JP9522179A JP9522179A JPS5619053A JP S5619053 A JPS5619053 A JP S5619053A JP 9522179 A JP9522179 A JP 9522179A JP 9522179 A JP9522179 A JP 9522179A JP S5619053 A JPS5619053 A JP S5619053A
Authority
JP
Japan
Prior art keywords
thin film
photomask
film
mixture
silicon oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9522179A
Other languages
English (en)
Japanese (ja)
Other versions
JPS623946B2 (fr
Inventor
Tatsuya Ikeuchi
Tomihiro Nakada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP9522179A priority Critical patent/JPS5619053A/ja
Publication of JPS5619053A publication Critical patent/JPS5619053A/ja
Publication of JPS623946B2 publication Critical patent/JPS623946B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging
    • G03F1/78—Patterning of masks by imaging by charged particle beam [CPB], e.g. electron beam patterning of masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP9522179A 1979-07-26 1979-07-26 Manufacture of photomask Granted JPS5619053A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9522179A JPS5619053A (en) 1979-07-26 1979-07-26 Manufacture of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9522179A JPS5619053A (en) 1979-07-26 1979-07-26 Manufacture of photomask

Publications (2)

Publication Number Publication Date
JPS5619053A true JPS5619053A (en) 1981-02-23
JPS623946B2 JPS623946B2 (fr) 1987-01-28

Family

ID=14131681

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9522179A Granted JPS5619053A (en) 1979-07-26 1979-07-26 Manufacture of photomask

Country Status (1)

Country Link
JP (1) JPS5619053A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004361507A (ja) * 2003-06-02 2004-12-24 Renesas Technology Corp フォトマスクの製造方法およびフォトマスク描画システム

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004361507A (ja) * 2003-06-02 2004-12-24 Renesas Technology Corp フォトマスクの製造方法およびフォトマスク描画システム

Also Published As

Publication number Publication date
JPS623946B2 (fr) 1987-01-28

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