JPS5554569A - Vacuum coating apparatus having continuous or semicontinuous crude material transporting apparatus - Google Patents
Vacuum coating apparatus having continuous or semicontinuous crude material transporting apparatusInfo
- Publication number
- JPS5554569A JPS5554569A JP15062378A JP15062378A JPS5554569A JP S5554569 A JPS5554569 A JP S5554569A JP 15062378 A JP15062378 A JP 15062378A JP 15062378 A JP15062378 A JP 15062378A JP S5554569 A JPS5554569 A JP S5554569A
- Authority
- JP
- Japan
- Prior art keywords
- semicontinuous
- continuous
- crude material
- vacuum coating
- material transporting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000013058 crude material Substances 0.000 title 1
- 238000001771 vacuum deposition Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2844491A DE2844491C2 (de) | 1978-10-12 | 1978-10-12 | Vakuum-Beschichtungsanlage mit einer Einrichtung zum kontinuierlichen Substrattransport |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5554569A true JPS5554569A (en) | 1980-04-21 |
JPS5647952B2 JPS5647952B2 (ja) | 1981-11-12 |
Family
ID=6052035
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15062378A Granted JPS5554569A (en) | 1978-10-12 | 1978-12-07 | Vacuum coating apparatus having continuous or semicontinuous crude material transporting apparatus |
Country Status (4)
Country | Link |
---|---|
US (1) | US4261808A (ja) |
JP (1) | JPS5554569A (ja) |
BE (1) | BE872621A (ja) |
DE (1) | DE2844491C2 (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006183070A (ja) * | 2004-12-27 | 2006-07-13 | Fuji Electric Holdings Co Ltd | 薄膜形成装置 |
WO2017104826A1 (ja) * | 2015-12-17 | 2017-06-22 | 株式会社アルバック | 真空処理装置 |
WO2018084214A1 (ja) * | 2016-11-02 | 2018-05-11 | 株式会社アルバック | 真空処理装置 |
WO2018084286A1 (ja) * | 2016-11-04 | 2018-05-11 | 株式会社アルバック | 成膜装置 |
JP6442648B1 (ja) * | 2017-06-14 | 2018-12-19 | 株式会社アルバック | 真空処理装置 |
WO2020174642A1 (ja) * | 2019-02-28 | 2020-09-03 | 東芝三菱電機産業システム株式会社 | 成膜装置 |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2900724C2 (de) * | 1979-01-10 | 1986-05-28 | Siemens AG, 1000 Berlin und 8000 München | Vorrichtung zur Beschichtung von Substraten im Vakuum |
US5024747A (en) * | 1979-12-21 | 1991-06-18 | Varian Associates, Inc. | Wafer coating system |
US4647266A (en) * | 1979-12-21 | 1987-03-03 | Varian Associates, Inc. | Wafer coating system |
US4756815A (en) * | 1979-12-21 | 1988-07-12 | Varian Associates, Inc. | Wafer coating system |
JPS5730341A (en) * | 1980-07-30 | 1982-02-18 | Anelva Corp | Substrate processing device |
DE3107914A1 (de) * | 1981-03-02 | 1982-09-16 | Leybold-Heraeus GmbH, 5000 Köln | Verfahren und vorrichtung zum beschichten von formteilen durch katodenzerstaeubung |
EP0122092A3 (en) * | 1983-04-06 | 1985-07-10 | General Engineering Radcliffe Limited | Vacuum coating apparatus |
US4526670A (en) * | 1983-05-20 | 1985-07-02 | Lfe Corporation | Automatically loadable multifaceted electrode with load lock mechanism |
GB8421162D0 (en) * | 1984-08-21 | 1984-09-26 | British Telecomm | Growth of semi-conductors |
US4722298A (en) * | 1986-05-19 | 1988-02-02 | Machine Technology, Inc. | Modular processing apparatus for processing semiconductor wafers |
US5618388A (en) * | 1988-02-08 | 1997-04-08 | Optical Coating Laboratory, Inc. | Geometries and configurations for magnetron sputtering apparatus |
US5798027A (en) * | 1988-02-08 | 1998-08-25 | Optical Coating Laboratory, Inc. | Process for depositing optical thin films on both planar and non-planar substrates |
US5225057A (en) * | 1988-02-08 | 1993-07-06 | Optical Coating Laboratory, Inc. | Process for depositing optical films on both planar and non-planar substrates |
DE3938267C2 (de) * | 1989-11-17 | 1997-03-27 | Leybold Ag | Vorrichtung zum Heizen von Substraten |
DE4111384C2 (de) * | 1991-04-09 | 1999-11-04 | Leybold Ag | Vorrichtung zur Beschichtung von Substraten |
JP3732250B2 (ja) * | 1995-03-30 | 2006-01-05 | キヤノンアネルバ株式会社 | インライン式成膜装置 |
TW552306B (en) | 1999-03-26 | 2003-09-11 | Anelva Corp | Method of removing accumulated films from the surfaces of substrate holders in film deposition apparatus, and film deposition apparatus |
US6833031B2 (en) | 2000-03-21 | 2004-12-21 | Wavezero, Inc. | Method and device for coating a substrate |
DE10131232C1 (de) * | 2001-06-28 | 2002-09-05 | Siemens Ag | Vorrichtung zur Beschichtung von Substraten mit oxidischem Material sowie Verwendung der Vorrichtung |
WO2006102913A1 (de) * | 2005-03-31 | 2006-10-05 | Applied Materials Gmbh & Co. Kg | Vorrichtung und verfahren zum beschichten von substraten |
US20080041314A1 (en) * | 2006-08-18 | 2008-02-21 | Robert William Bruce | Vaccum coater device and mechanism for transporting workpieces in same |
US20080121620A1 (en) * | 2006-11-24 | 2008-05-29 | Guo G X | Processing chamber |
DE102007009615A1 (de) * | 2007-02-26 | 2008-08-28 | Leybold Optics Gmbh | Anlage und Verfahren zur Vakuumbehandlung von bandförmigen Substraten |
US8349196B2 (en) * | 2007-12-06 | 2013-01-08 | Intevac, Inc. | System and method for commercial fabrication of patterned media |
US20100006420A1 (en) * | 2008-07-08 | 2010-01-14 | Seagate Technology Llc | Inline interlayer heater apparatus |
US8759084B2 (en) * | 2010-01-22 | 2014-06-24 | Michael J. Nichols | Self-sterilizing automated incubator |
JP5999190B2 (ja) * | 2012-10-01 | 2016-09-28 | 日産自動車株式会社 | インライン式コーティング装置、インライン式コーティング方法、およびセパレータ |
DE102014104366A1 (de) * | 2014-03-28 | 2015-10-01 | Von Ardenne Gmbh | Vorrichtung zum Behandeln von Substraten |
KR101991187B1 (ko) * | 2014-10-10 | 2019-06-19 | 캐논 아네르바 가부시키가이샤 | 성막 장치 |
WO2017101971A1 (en) * | 2015-12-14 | 2017-06-22 | Applied Materials, Inc. | Processing system for two-side processing of a substrate and method of two-side processing of a substrate |
CN108350567B (zh) * | 2016-08-25 | 2019-06-14 | 株式会社爱发科 | 成膜装置及成膜方法以及太阳能电池的制造方法 |
JP6654741B1 (ja) * | 2019-01-08 | 2020-02-26 | 株式会社アルバック | 真空処理装置 |
CN109609923B (zh) * | 2019-01-11 | 2023-08-25 | 广东谛思纳为新材料科技有限公司 | 一种便于拉链扣电离子镀铂加工的自动化装置 |
JP6814998B1 (ja) * | 2019-12-25 | 2021-01-20 | 株式会社プラズマイオンアシスト | プラズマ処理装置 |
CN112366627A (zh) * | 2020-11-24 | 2021-02-12 | 安徽精工电缆桥架有限公司 | 一种耐热耐腐蚀的电缆桥架 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB907688A (en) * | 1960-03-24 | 1962-10-10 | Ti Group Services Ltd | Improvements in or relating to the production of cured coatings of polymeric material |
US3288700A (en) * | 1963-10-23 | 1966-11-29 | Northern Electric Co | Sputtering apparatus including a folded flexible conveyor |
LU45647A1 (ja) * | 1964-03-12 | 1965-09-13 | ||
US3596285A (en) * | 1969-07-11 | 1971-07-27 | Teletype Corp | Liquid metal recorder |
DE2116190C3 (de) * | 1971-04-02 | 1979-08-30 | Flachglas Ag Delog-Detag, 4650 Gelsenkirchen | Vorrichtung zum Beschichten großflächiger Platten wie Glasscheiben, Keramik- oder Kunststoffplatten und dergleichen mittels Kathodenzerstäubung |
JPS5315466B2 (ja) * | 1973-04-28 | 1978-05-25 | ||
DE2415119A1 (de) * | 1974-03-28 | 1975-10-16 | Siemens Ag | Kathodenzerstaeubungsanlage mit kontinuierlichem substratdurchlauf |
US3873025A (en) * | 1974-05-06 | 1975-03-25 | Stora Kopparbergs Bergslags Ab | Method and apparatus for atomizing a liquid medium and for spraying the atomized liquid medium in a predetermined direction |
US4022939A (en) * | 1975-12-18 | 1977-05-10 | Western Electric Company, Inc. | Synchronous shielding in vacuum deposition system |
JPS5421175A (en) * | 1977-07-18 | 1979-02-17 | Tokyo Ouka Kougiyou Kk | Improvement of plasma reaction processor |
US4131533A (en) * | 1977-12-30 | 1978-12-26 | International Business Machines Corporation | RF sputtering apparatus having floating anode shield |
-
1978
- 1978-10-12 DE DE2844491A patent/DE2844491C2/de not_active Expired
- 1978-12-07 JP JP15062378A patent/JPS5554569A/ja active Granted
- 1978-12-08 BE BE192207A patent/BE872621A/xx unknown
- 1978-12-20 US US05/971,275 patent/US4261808A/en not_active Expired - Lifetime
Cited By (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006183070A (ja) * | 2004-12-27 | 2006-07-13 | Fuji Electric Holdings Co Ltd | 薄膜形成装置 |
JP4591080B2 (ja) * | 2004-12-27 | 2010-12-01 | 富士電機システムズ株式会社 | 薄膜形成装置 |
WO2017104826A1 (ja) * | 2015-12-17 | 2017-06-22 | 株式会社アルバック | 真空処理装置 |
JP6255544B2 (ja) * | 2015-12-17 | 2017-12-27 | 株式会社アルバック | 真空処理装置 |
US10994938B2 (en) | 2015-12-17 | 2021-05-04 | Ulvac, Inc. | Vacuum processing device |
WO2018084214A1 (ja) * | 2016-11-02 | 2018-05-11 | 株式会社アルバック | 真空処理装置 |
JP6336231B1 (ja) * | 2016-11-02 | 2018-06-06 | 株式会社アルバック | 真空処理装置 |
US10612130B2 (en) | 2016-11-02 | 2020-04-07 | Ulvac, Inc. | Vacuum processing apparatus |
KR20180102197A (ko) * | 2016-11-02 | 2018-09-14 | 가부시키가이샤 알박 | 진공 처리 장치 |
CN108884561A (zh) * | 2016-11-02 | 2018-11-23 | 株式会社爱发科 | 真空处理装置 |
CN108884561B (zh) * | 2016-11-02 | 2019-08-06 | 株式会社爱发科 | 真空处理装置 |
TWI662644B (zh) * | 2016-11-02 | 2019-06-11 | 日商愛發科股份有限公司 | 真空處理裝置 |
KR20190002726A (ko) * | 2016-11-04 | 2019-01-08 | 가부시키가이샤 알박 | 성막 장치 |
CN109923238A (zh) * | 2016-11-04 | 2019-06-21 | 株式会社爱发科 | 成膜装置 |
JP6379322B1 (ja) * | 2016-11-04 | 2018-08-22 | 株式会社アルバック | 成膜装置 |
CN109923238B (zh) * | 2016-11-04 | 2020-05-22 | 株式会社爱发科 | 成膜装置 |
WO2018084286A1 (ja) * | 2016-11-04 | 2018-05-11 | 株式会社アルバック | 成膜装置 |
WO2018230592A1 (ja) * | 2017-06-14 | 2018-12-20 | 株式会社アルバック | 真空処理装置 |
KR20190087651A (ko) * | 2017-06-14 | 2019-07-24 | 가부시키가이샤 알박 | 진공 처리 장치 |
JP6442648B1 (ja) * | 2017-06-14 | 2018-12-19 | 株式会社アルバック | 真空処理装置 |
WO2020174642A1 (ja) * | 2019-02-28 | 2020-09-03 | 東芝三菱電機産業システム株式会社 | 成膜装置 |
CN111868297A (zh) * | 2019-02-28 | 2020-10-30 | 东芝三菱电机产业系统株式会社 | 成膜装置 |
KR20200127217A (ko) * | 2019-02-28 | 2020-11-10 | 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 | 성막 장치 |
CN111868297B (zh) * | 2019-02-28 | 2022-12-16 | 东芝三菱电机产业系统株式会社 | 成膜装置 |
US11732360B2 (en) | 2019-02-28 | 2023-08-22 | Toshiba Mitsubishi-Electric Industrial Systems Corporation | Film forming apparatus |
Also Published As
Publication number | Publication date |
---|---|
DE2844491C2 (de) | 1983-04-14 |
BE872621A (fr) | 1979-03-30 |
JPS5647952B2 (ja) | 1981-11-12 |
DE2844491A1 (de) | 1980-04-17 |
US4261808A (en) | 1981-04-14 |
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