WO2018230592A1 - 真空処理装置 - Google Patents
真空処理装置 Download PDFInfo
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- WO2018230592A1 WO2018230592A1 PCT/JP2018/022529 JP2018022529W WO2018230592A1 WO 2018230592 A1 WO2018230592 A1 WO 2018230592A1 JP 2018022529 W JP2018022529 W JP 2018022529W WO 2018230592 A1 WO2018230592 A1 WO 2018230592A1
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- transport
- substrate holder
- substrate
- path
- unit
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32743—Means for moving the material to be treated for introducing the material into processing chamber
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G17/00—Conveyors having an endless traction element, e.g. a chain, transmitting movement to a continuous or substantially-continuous load-carrying surface or to a series of individual load-carriers; Endless-chain conveyors in which the chains form the load-carrying surface
- B65G17/30—Details; Auxiliary devices
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
- C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32715—Workpiece holder
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- H—ELECTRICITY
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- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
- H01J37/32761—Continuous moving
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- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32788—Means for moving the material to be treated for extracting the material from the process chamber
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
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- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67715—Changing the direction of the conveying path
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
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- H01L21/67751—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a single workpiece
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G17/00—Conveyors having an endless traction element, e.g. a chain, transmitting movement to a continuous or substantially-continuous load-carrying surface or to a series of individual load-carriers; Endless-chain conveyors in which the chains form the load-carrying surface
- B65G17/002—Conveyors having an endless traction element, e.g. a chain, transmitting movement to a continuous or substantially-continuous load-carrying surface or to a series of individual load-carriers; Endless-chain conveyors in which the chains form the load-carrying surface comprising load carriers resting on the traction element
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
Definitions
- the present invention relates to a technique of a vacuum processing apparatus that performs vacuum processing such as pass film formation on both surfaces of a substrate held in a substrate holder in a vacuum.
- a vacuum processing apparatus that performs vacuum processing such as passing film formation by placing a plurality of film formation substrates on a substrate holder such as a tray.
- a substrate to be processed is introduced (loaded) into a vacuum chamber and held in a substrate holder, and the processed substrate is removed from the substrate holder and discharged out of the vacuum chamber. (Unloading).
- the processing surface of the substrate is kept horizontal from the loading position to the unloading position, and each process is performed while moving on an annular conveyance path configured in a horizontal plane. ing.
- the present invention has been made in consideration of such problems of the conventional technology, and the object of the present invention is to form a film on both surfaces of a substrate in a pass-through vacuum processing apparatus using a plurality of substrate holders. It is an object of the present invention to provide a technique capable of efficiently performing the above-described processing and achieving the downsizing of the apparatus and the simplification of the configuration.
- the present invention made to achieve the above object performs a predetermined vacuum process on a vacuum chamber in which a single vacuum atmosphere is formed and a substrate provided in the vacuum chamber and held by a substrate holder.
- a plurality of first and second processing regions and a plurality of projection paths formed on the vertical plane are formed so as to form a series of rings, and have a conveyance path for conveying the substrate holder, and first and second driven parts.
- a substrate holder transport mechanism for transporting the substrate holder along the transport path, and the transport path is a first transport along the transport path in a state where the introduced substrate holder is horizontal.
- a first transport unit that transports in a direction, and a second transport unit that transports and discharges in a second transport direction opposite to the first transport direction along the transport path in a state where the substrate holder is leveled.
- the substrate holder in front of the first transfer unit A second folding unit that folds toward the second conveyance unit and conveys the second conveyance unit, the first conveyance unit passes through one of the first and second processing regions, and the second conveyance unit A transfer unit is configured to pass through the other of the first and second processing regions, and the substrate holder transfer mechanism is in contact with a first driven part of the substrate holder to hold the substrate
- a direction changing mechanism having a second direction changing path is provided, and the first driving unit of the substrate holder transport mechanism and the second driving unit of the direction changing mechanism are operated in synchronization to hold the substrate.
- the vacuum processing apparatus is configured to pass from the first transport unit to the second transport unit in the transport path.
- the present invention is the vacuum processing apparatus in which the first direction change path and the second direction change path are formed in an equivalent curved shape that protrudes toward the first transport direction.
- the first direction changing path and the second direction changing path are opposed to each other with a pair of guide members provided with a gap slightly larger than the diameter of the first driven shaft of the substrate holder.
- the vacuum processing apparatus is provided by being arranged close to each other.
- the first and second driven parts of the substrate holder are provided so as to extend in a direction orthogonal to the first and second transport directions, and the first and second driven parts are provided. This is a vacuum processing apparatus with different lengths.
- the present invention is the vacuum processing apparatus, wherein the direction changing mechanism is disposed at a position outside the substrate holder transport mechanism with respect to the first and second transport directions.
- the present invention is a vacuum processing apparatus in which the first and second processing regions perform film formation in a vacuum.
- the present invention is a vacuum processing apparatus in which the substrate holder is configured to hold a plurality of deposition target substrates side by side in a direction orthogonal to the first and second transport directions.
- the transfer path is formed so that the projected shape with respect to the vertical plane is a series of rings, and a plurality of substrate holders are transferred to the transfer path. Since the substrate holder transport mechanism for transporting along the substrate is provided, the space occupied by the transport path can be greatly reduced compared to the prior art, thereby achieving a significant space saving of the apparatus. Therefore, a vacuum processing apparatus having a small and simple configuration can be provided.
- the first transfer unit that transfers the introduced substrate holder in the first transfer direction along the transfer path in a state where the substrate holder is leveled is the first and second film formation.
- the second film forming region is configured to pass through the other one of the first and second film forming regions.
- the first driving unit of the substrate holder transport mechanism and the second driving unit of the direction changing mechanism are operated in synchronization, and the first and second driven parts of the substrate holder are moved to the first direction of the direction changing mechanism.
- the substrate holder By guiding and transporting along the first and second direction change paths, respectively, the substrate holder is transferred from the first transport section of the transport path to the second transport section while maintaining the vertical relationship. It is configured. According to the present invention having such a configuration, it is possible to provide a pass-through vacuum processing apparatus capable of efficiently processing both surfaces of a substrate.
- the substrate holder when the substrate holder is configured to hold a plurality of substrates side by side in a direction orthogonal to the transport direction, for example, a plurality of substrates in the substrate transport direction as in the prior art. Compared with the case where the substrate holder that holds the substrates side by side is transported and processed, the length of the substrate holder and the excess space associated with the substrate holder can be reduced. Can be achieved.
- FIG. 1 is a schematic configuration diagram showing an entire embodiment of a vacuum processing apparatus according to the present invention.
- FIG. 2 (a) is a plan view and FIG. 2 (b) is a front view.
- FIG. 3 (a) is a plan view and FIG. 3 (b) is a front view.
- FIGS. 4A to 4D show the configuration of the first drive unit provided in the transport drive member of the present embodiment.
- FIG. 4A is a side view seen from the downstream side in the transport direction
- FIG. b) is a front view
- FIG. 4C is a side view seen from the upstream side in the transport direction
- FIG. 4D is a perspective view.
- the front view which shows the structure of the direction change mechanism in this Embodiment.
- movement of the vacuum processing apparatus of this Embodiment (the 1) Explanatory drawing which shows operation
- movement of the substrate holder conveyance mechanism and direction change mechanism in this Embodiment (the 1) (A)-(c): Explanatory drawing which shows operation
- FIG. 1 is a schematic configuration diagram showing the entirety of an embodiment of a vacuum processing apparatus according to the present invention.
- 2 (a) and 2 (b) show the basic configuration of the substrate holder transport mechanism and the direction changing mechanism in the present embodiment.
- FIG. 2 (a) is a plan view and
- FIG. 2 (b) is a front view.
- FIG. 1 is a schematic configuration diagram showing the entirety of an embodiment of a vacuum processing apparatus according to the present invention.
- 2 (a) and 2 (b) show the basic configuration of the substrate holder transport mechanism and the direction changing mechanism in the present embodiment.
- FIG. 2 (a) is a plan view
- FIG. 2 (b) is a front view.
- FIG. 1 is a schematic configuration diagram showing the entirety of an embodiment of a vacuum processing apparatus according to the present invention.
- 2 (a) and 2 (b) show the basic configuration of the substrate holder transport mechanism and the direction changing mechanism in the present embodiment.
- FIG. 2 (a) is a plan view
- FIG. 3A and 3B show the structure of the substrate holder used in the present embodiment.
- FIG. 3A is a plan view and FIG. 3B is a front view.
- FIGS. 4A to 4D show the configuration of the first drive unit provided in the transport drive member of the present embodiment, and FIG. 4A is viewed from the downstream side in the transport direction.
- 4B is a front view
- FIG. 4C is a side view seen from the upstream side in the transport direction
- FIG. 4D is a perspective view.
- FIG. 5 is a front view showing a configuration of the direction changing mechanism in the present embodiment.
- the vacuum processing apparatus 1 of this Embodiment has the vacuum chamber 2 in which the single vacuum atmosphere connected to the vacuum exhaust apparatus 1a is formed. Inside the vacuum chamber 2 is provided a substrate holder transport mechanism 3 that transports a substrate holder 11 described later along a transport path.
- the substrate holder transport mechanism 3 is configured to continuously transport a plurality of substrate holders 11 that hold the substrate 10.
- the substrate holder transport mechanism 3 includes, for example, first and second circular driving wheels 31 and 32 having the same diameter, which are operated by a rotational driving force transmitted from a driving mechanism (not shown) made of a sprocket or the like.
- the first and second drive wheels 31 and 32 are arranged at a predetermined distance with their respective rotation axes parallel.
- a series of transport drive members 33 made of, for example, a chain or the like are bridged between the first and second drive wheels 31 and 32. Further, a structure in which a conveyance drive member 33 is bridged between the first and second drive wheels 31 and 32 is arranged in parallel at a predetermined distance (see FIG. 2A), and the pair of conveyances.
- the drive member 33 forms a series of annular conveyance paths with respect to the vertical plane.
- the substrate holder 11 is moved from the first drive wheel 31 toward the second drive wheel 32 to the upper part of the transport drive member 33 constituting the transport path, and the substrate holder 11 is transported to the first transport wheel.
- a forward-side transport unit (first transport unit) 33a that transports in the direction P1 is formed, and the transport direction of the substrate holder 11 is reversed by the transport drive member 33 around the second drive wheel 32.
- a turn-back portion 33b that changes direction is formed, and the substrate holder 11 is moved to the lower portion of the transport drive member 33 from the second drive wheel 32 toward the first drive wheel 31.
- a return path side transport section (second transport section) 33c for transporting in the second transport direction P2 is formed.
- the forward-side transport unit 33 a located above each transport drive member 33 and the return-side transport unit 33 c located below each transport drive member 33 are opposed to each other. However, they are configured to overlap in the vertical direction.
- the substrate holder transport mechanism 3 includes a substrate holder introduction unit 30A for introducing the substrate holder 11, a transport folding unit 30B for folding and transporting the substrate holder 11, and a substrate holder for discharging the substrate holder 11.
- a container discharge unit 30C is provided.
- a direction changing mechanism 40 which will be described later is provided in the vicinity of the conveyance folding portion 30B.
- regions 4 and 5 are provided.
- a first processing region 4 having, for example, a sputtering source 4 ⁇ / b> T is provided above the substrate holder transport mechanism 3, and, for example, a sputter is formed below the substrate holder transport mechanism 3.
- a second processing region 5 having a source 5T is provided.
- the forward-side transport unit 33a of the above-described transport drive member 33 is configured to linearly pass through the first processing region 4 in the horizontal direction
- the return-side transport unit 33c is configured to
- the second processing area 5 is configured to pass linearly in the horizontal direction.
- a substrate carry-in / out mechanism 6 is provided.
- the substrate carry-in / carry-out mechanism 6 of the present embodiment has a support portion 62 provided at the tip (upper) end of a drive rod 61 that is driven vertically, for example, by an elevating mechanism 60.
- a transfer robot 64 is provided on the support unit 62 of the substrate carry-in / out mechanism 6, and the substrate holder 11 is supported on the transfer robot 64 to move the substrate holder 11 in the vertical vertical direction.
- the substrate holder 11 is transferred to and received from the substrate holder transfer mechanism 3 by the transfer robot 64.
- the substrate holder 11 is delivered from the substrate carry-in / out mechanism 6 to the substrate holder introduction section 30A of the forward transfer section 33a of the substrate holder conveyance mechanism 3 (this position is referred to as “substrate holder delivery position”). And the substrate holder 11 is taken out from the substrate holder discharge portion 30C of the return path side conveyance unit 33c of the substrate holder conveyance mechanism 3 (this position is referred to as a “substrate holder removal position”).
- substrate holder discharge portion 30C of the return path side conveyance unit 33c of the substrate holder conveyance mechanism 3 this position is referred to as a “substrate holder removal position”.
- an upper portion of the vacuum chamber 2 is provided with a substrate loading / unloading chamber 2 ⁇ / b> A for loading the substrate 10 into the vacuum chamber 2 and unloading the substrate 10 from the vacuum chamber 2.
- the substrate loading / unloading chamber 2A is provided, for example, at a position above the support portion 62 of the above-described substrate loading / unloading mechanism 6 via the communication port 2B.
- the substrate loading / unloading chamber 2A can be opened and closed at the upper portion of the substrate loading / unloading chamber 2A.
- a lid 2a is provided.
- the unprocessed substrate 10a loaded into the substrate loading / unloading chamber 2A is transferred to and held by the substrate holder 11 on the transfer robot 64 of the support unit 62 of the substrate loading / unloading mechanism 6, and
- the processed substrate 10b is configured to be carried out from the substrate holder 11 on the transfer robot 64 of the support unit 62 of the substrate carry-in / out mechanism 6 to the atmosphere outside the vacuum chamber 2, for example.
- a sealing member 63 such as an O-ring is provided.
- the support portion 62 of the substrate loading / unloading mechanism 6 is raised toward the substrate loading / unloading chamber 2A side, and the communication member 2B is closed by bringing the seal member 63 on the support portion 62 into close contact with the inner wall of the vacuum chamber 2.
- the atmosphere in the substrate loading / unloading chamber 2A is isolated from the atmosphere in the vacuum chamber 2.
- the pair of transport drive members 33 of the substrate holder transport mechanism 3 of the present embodiment has a plurality of first drive units 36 at predetermined intervals. It is provided so as to protrude outward of the transport drive member 33.
- the first drive unit 36 has a J hook shape (the height of the first protrusion 36a on the downstream side in the transport direction is the height of the second protrusion 36b on the upstream side in the transport direction).
- a first driven shaft 12 to be described later
- the substrate holder 11 is configured to be driven in the first or second transport direction P1, P2.
- the substrate holder support mechanism 18 is composed of a rotatable member such as a plurality of rollers, for example, and is provided in the vicinity of the transport driving member 33.
- the forward path side substrate holder support mechanism 18a is provided in the vicinity of the upper side of the forward path side transport part 33a of the transport drive member 33, and the return path side substrate in the vicinity of the lower side of the return path side transport part 33c of the transport drive member 33.
- a cage support mechanism 18c is provided and arranged and configured to support both edge portions of the lower surface of the substrate holder 11 to be transported.
- the forward path side substrate holder support mechanism 18a is provided to the vicinity of the entrance of the first direction change path 51 of the direction change mechanism 40 to be described later, and the return path side substrate holder support mechanism 18c is a direction change mechanism to be described later. It is provided up to the vicinity of the discharge port of the 40 second direction change path 52.
- the substrate holder 11 used in the present embodiment is for performing vacuum processing on both surfaces of the substrate 10 and is made of a tray having an opening. As shown in FIGS. 2A and 3A, the substrate holder 11 of the present embodiment is formed in, for example, a long rectangular flat plate shape, and its longitudinal direction, that is, the first and second transport directions. For example, a plurality of holding portions 14 are provided that hold a plurality of, for example, a plurality of rectangular substrates 10 in a line in a direction orthogonal to P1 and P2.
- each holding portion 14 is provided with, for example, a rectangular opening having the same size and shape as each substrate 10 so that both surfaces of each substrate 10 are fully exposed, and each substrate 10 is held by a holding member (not shown). Is configured to hold.
- the substrate holder 11 is in a direction orthogonal to the transport direction as in the present embodiment. It is preferable that the plurality of substrates 10 be arranged in a row and held respectively. However, from the viewpoint of improving the processing efficiency, it is possible to arrange a plurality of substrates 10 in a plurality of rows in a direction orthogonal to the transport direction.
- first driven shafts (first driven parts) 12 are provided at both ends in the longitudinal direction of the substrate holder 11 at the upstream end in the first transport direction P1, respectively.
- a second driven shaft (second driven portion) 13 is provided at each end on the downstream side in the transport direction P1.
- first and second driven shafts 12 and 13 are circular in cross section around a rotation axis extending in the longitudinal direction of the substrate holder 11, that is, in the direction orthogonal to the first and second transport directions P1 and P2, respectively. It is formed in a shape (see FIGS. 3A and 3B). In the present embodiment, the dimension of the second driven shaft 13 is determined such that the length of the second driven shaft 13 is longer than the length of the first driven shaft 12.
- the first driven shafts 12 on both sides of the substrate holder 11 are substrate holders.
- the second driven shaft 13 is in contact with a second drive unit 46 described later when the substrate holder 11 is disposed in a direction changing mechanism 40 described later, and is in contact with the first drive unit 36 of the transport mechanism 3.
- the dimensions of the first and second driven shafts 12 and 13 are determined.
- a pair of direction changing mechanisms 40 having the same configuration is provided on the downstream side of the pair of transport driving members 33 in the first transport direction P1.
- the pair of direction changing mechanisms 40 are arranged at positions outside the pair of transport driving members 33 with respect to the first and second transport directions P1 and P2, respectively.
- the pair of direction changing mechanisms 40 are provided such that the upstream portion in the first transport direction P1 slightly overlaps the downstream portion in the first transport direction P1 of each transport drive member 33. .
- the first drive unit 36 provided in the transport drive member 33 of the present embodiment has a planar shape of the first protrusion 36a.
- a direction in which the substrate holder 11 is orthogonal to the transport direction at a side portion (a portion on the side with respect to the transport direction) formed on the front end portion (a portion on the outer side in the transport direction). Is provided with a first tapered portion 36c.
- the substrate is held at a side portion (a portion on the side in the transport direction) formed in a planar shape of the second protrusion 36b and at the tip portion (a portion on the outer side in the transport direction).
- a second taper portion 36d for aligning the container 11 in a direction orthogonal to the transport direction is provided.
- the first and second taper portions 36c and 36d are such that the dimensions of the first and second protrusions 36a and 36b in the width direction, that is, the direction orthogonal to the transport direction are the tip end side, that is, the transport direction outer side It is formed so as to become smaller toward each.
- the first and second taper portions 36c and 36d are respectively provided on both sides of the first projecting portion 36a and the second projecting portion 36b in the conveying direction. Yes.
- the size of the first tapered portion 36c provided in the first protrusion 36a in the first driving portion 36 is not particularly limited, but the substrate holder 11 is moved in the transport direction. From the viewpoint of surely performing alignment in the orthogonal direction, it is preferable to form the first protrusion 36a at an angle of 10 to 45 ° with respect to the side portion 360 formed in a planar shape.
- the length of the first tapered portion 36a in the direction of the first taper portion 36c toward the outer side in the transport direction is preferably set to 1 to 3 mm, respectively.
- the machining dimensions in the direction perpendicular to the conveying direction of the tapered portion 36c are preferably set to 1 to 15 mm, respectively.
- the dimension of the second tapered portion 36d provided on the second protrusion 36b is not particularly limited, but the direction in which the substrate holder 11 is orthogonal to the transport direction. From the viewpoint of ensuring alignment, it is preferable to form the second protrusion 36b at an angle of 5 to 45 ° with respect to the side portion 361 formed in a planar shape.
- the length of the second projecting portion 36b in the direction of the second taper portion 36d toward the outer side in the transport direction is preferably set to 1 to 5 mm.
- the processing dimensions in the direction orthogonal to the conveying direction of the portion 36d are preferably set to 1 to 50 mm, respectively.
- the first and second taper portions 36c and 36d are respectively connected to both the first protrusion 36a and the second protrusion 36b.
- the present invention is not limited to this, the present invention is not limited to this.
- the substrate holder 11 side is provided.
- the first and second taper portions 36c and 36d may be provided only in the side portion).
- the third taper portion 36e is formed such that a portion on the upstream side in the transport direction of the tip of the second protrusion 36b is inclined inward in the transport direction (FIGS. 4B and 4D).
- the third taper portion 36e is rounded at the upstream and downstream edges in the transport direction, and the central portion is formed in a flat shape.
- the size of the third taper portion 36e provided on the second protrusion 36b in the first drive portion 36 is not particularly limited, but the substrate holder 11 is mounted as described later.
- the second protrusion 36b is formed at an angle of 45 to 80 ° with respect to the portion 36f (see FIG. 4B) on the downstream side in the transport direction formed in a planar shape. It is preferable.
- the direction changing mechanism 40 of the present embodiment includes a first guide member 41, a second guide member 42, and a third guide member 43, and these first to third guides.
- the members 41 to 43 are arranged in this order from the upstream side in the first transport direction P1.
- the first to third guide members 41 to 43 are arranged at positions near the outside of the pair of transport driving members 33, respectively, and further outside the first to third guide members 41 to 43.
- a transport driving member 45 to be described later is arranged at a position in the vicinity.
- FIG. 2B a part of the direction changing mechanism 40 is omitted, and the positional relationship between the members in the transport direction is clarified by ignoring the overlapping relationship of the members.
- the first to third guide members 41 to 43 are made of, for example, plate-like members and are provided in the vertical direction.
- the portion of the first guide member 41 on the downstream side in the first transport direction P1 is formed in a curved surface shape that is convex toward the downstream side in the first transport direction P1, and the second guide.
- the upstream portion of the member 42 in the first transport direction P1 is formed in a curved surface shape that is concave toward the downstream side in the first transport direction P1.
- the first and second guide members 41 and 42 are a downstream portion of the first guide member 41 in the first transport direction P1 and a upstream portion of the second guide member 42 in the first transport direction P1. Are formed in an equivalent curved surface shape, and these portions are arranged close to each other with a gap slightly larger than the diameter of the first driven shaft 12 of the substrate holder 11. And the 1st direction change path
- downstream portion of the second guide member 42 in the first transport direction P1 is formed in a curved surface shape that protrudes toward the downstream side in the first transport direction P1
- the third guide member The portion of the upstream side 43 in the first transport direction P1 is formed in a curved surface shape that is concave toward the downstream side in the first transport direction P1.
- the second and third guide members 42 and 43 are the downstream portion of the second guide member 42 in the first transport direction P1 and the upstream portion of the third guide member 43 in the first transport direction P1. Are formed in an equivalent curved surface shape, and these portions are arranged close to each other with a gap slightly larger than the diameter of the second driven shaft 13 of the substrate holder 11. And the 2nd direction change path
- the downstream portion of the second guide member 42 in the first transport direction P1 has a curved surface shape equivalent to the downstream portion of the first guide member 41 in the first transport direction P1.
- the upstream portion of the third guide member 43 in the first transport direction P1 has a curved surface shape equivalent to the upstream portion of the second guide member 42 in the first transport direction P1.
- the 1st direction change path 51 and the 2nd direction change path 52 are formed in the equivalent curved surface shape. Further, in the present embodiment, the distance in the horizontal direction of each part of the first and second direction change paths 51 and 52 is between the first and second driven shafts 12 and 13 of the substrate holder 11. The dimension is determined so as to be equal to the distance.
- the upper opening of the first direction changing path 51 is the entrance of the first driven shaft 12 of the substrate holder 11, and the height position thereof is the outgoing path side substrate holding.
- the substrate holder 11 supported by the container support mechanism 18a is configured to be lower than the height position of the second driven shaft 13 (see FIG. 2B).
- the lower port of the first direction changing path 51 is the discharge port of the first driven shaft 12 of the substrate holder 11, and the height position of the first direction changing path 51 is connected to the return-side substrate holder support mechanism 18 c. It is comprised so that it may become a position higher than the height position of the 2nd driven shaft 13 of the supported substrate holder 11 (refer FIG.2 (b)).
- the upper opening serves as the entrance of the second driven shaft 13 of the substrate holder 11, and the height position thereof is the forward path side substrate holder support mechanism. It is comprised so that it may become a position equivalent to the height position of the 2nd driven shaft 13 of the board
- the lower port of the second direction changing path 52 is the discharge port of the second driven shaft 13 of the substrate holder 11, and the height position thereof is on the return path side substrate holder support mechanism 18 c. It is comprised so that it may become a position equivalent to the height position of the 2nd driven shaft 13 of the supported substrate holder 11 (refer FIG.2 (b)).
- the direction changing mechanism 40 includes, for example, a pair of sprockets and a transport driving member 45 including a chain spanned between the pair of sprockets. It is comprised so that it may become cyclic
- the conveyance driving member 45 is configured such that the curvature radius of the folded portion is equal to the curvature radius of the folding portion 33 b of the conveyance driving member 33 of the substrate holder conveyance mechanism 3. Further, the upper part of the transport driving member 45 is driven to move in the first transport direction P1, and the lower part is driven to move in the second transport direction P2.
- the transport driving member 45 is provided with a plurality of second drive units 46 protruding outward from the transport driving member 45 at a predetermined interval.
- the second drive unit 46 is formed with a recess in an outer portion of the transport drive member 45, and the edge of the recess comes into contact with the second driven shaft 13 of the substrate holder 11 and the substrate holder 11 is supported and driven along the second direction change path 52.
- the second drive unit 46 of the present embodiment reaches the position of the entrance and the exit of the second direction changing path 52, the end on the recess side is the second end.
- the path of the transport drive member 45 and the dimensions of the second drive unit 46 are set so as to retract from the direction change path 52 (see FIG. 2B).
- the transport driving member 33 of the substrate holder transport mechanism 3 so that the second drive section 46 operates in synchronization with the first drive section 36 of the substrate retainer transport mechanism 3. And the operation of the transport driving member 45 of the direction changing mechanism 40 is controlled.
- the first holder 36 of the substrate holder transport mechanism 3 drives the substrate holder 11 in the first transport direction P1 to move the first and second driven shafts 12 and 13.
- the first and second driving units 36 and 46 hold the first and second driven parts.
- the first and second drive units 36 and 46, and the first and second drive units 12 and 13 are supported and moved so that the drive shafts 12 and 13 are smoothly discharged from the first and second direction changing paths 51 and 52.
- the shapes and dimensions of the second direction changing paths 51 and 52 are set.
- the substrate holder 11 is moved from the direction change mechanism 40 to the substrate holder support mechanism 18.
- a delivery member 47 is provided for smooth delivery to the return path side substrate holder support mechanism 18c.
- the delivery member 47 is made of, for example, an elongated member extending in the horizontal direction, and is centered on a rotation shaft 48 provided at a position below the return path side substrate holder support mechanism 18c at the end portion on the second transport direction P2 side. As shown in FIG. The delivery member 47 is biased upward by an elastic member (not shown) on the first transport direction P1 side.
- a portion near the discharge port of the first direction changing path 51 on the second transport direction P2 side is continuous with the first direction changing path 51, and the substrate holder support mechanism A transfer portion 47a formed in a curved shape is provided so as to be continuous with the 18 return path side substrate holder support mechanism 18c (see FIG. 2B).
- an inclined surface 47b is provided at a portion on the first transport direction P1 side so as to incline downward toward the first transport direction P1.
- the inclined surface 47 b is provided at a height position facing the discharge port of the second direction changing path 52.
- the sealing member 63 on the support portion 62 of the substrate loading / unloading mechanism 6 is brought into close contact with the inner wall of the vacuum chamber 2 and the substrate is loaded into the atmosphere in the vacuum chamber 2.
- the lid 2a of the substrate carry-in / out chamber 2A is opened.
- the substrate 10a before processing is mounted and held on the substrate holder 11 on the transport robot 64 of the support unit 62 of the substrate carry-in / out mechanism 6 using a transport robot (not shown).
- the lid portion 2a of the substrate loading / unloading chamber 2A is closed and evacuated to a predetermined pressure, and then the support portion 62 of the substrate loading / unloading mechanism 6 is moved to the above-described substrate holder delivery position.
- the substrate holder 11 is lowered so that the height of the substrate holder 11 is equal to the height of the forward transfer portion 33 a of the transfer drive member 33.
- the substrate holder 11 is placed on the substrate holder introduction portion 30 ⁇ / b> A of the substrate holder transfer mechanism 3 by the transfer robot 64 provided on the support portion 62 of the substrate carry-in / out mechanism 6.
- the first driven shaft 12 of the substrate holder 11 is positioned so as to be disposed in the groove of the first driving unit 36, and the forward path side substrate holder is supported. Place on mechanism 18a.
- the substrate holder 11 is displaced in the direction orthogonal to the first transport direction P1 (see FIG. 9B), and the edge of the substrate holder 11 on the direction side orthogonal to the transport direction. May contact the first drive unit 36, but in the present embodiment, as described above, the first projection 36a and the second projection 36b of the first drive unit 36 are respectively connected to the first projection 36a.
- the edge portions on the direction side orthogonal to the transport direction of the substrate holder 11 are the first and second protrusions 36a of the first drive portion 36. 36b, whereby the substrate holder 11 is aligned in a direction orthogonal to the transport direction and the positional deviation is corrected.
- the first driven shaft 12 of the substrate holder 11 is moved to the first It can arrange
- the forward-side transport unit 33a of the transport driving member 33 of the substrate holder transport mechanism 3 is moved in the first transport direction P1.
- the first driven shaft 12 of the substrate holder 11 is driven in the first conveyance direction P1 by the first drive unit 36 on the forward-side conveyance unit 33a of the conveyance drive member 33, and the substrate holder 11 is moved. It is conveyed on the forward path side conveyance unit 33a of the conveyance drive member 33 toward the conveyance folding unit 30B.
- FIGS. 10A to 10C and FIGS. 11A to 11C are explanatory views showing the operations of the substrate holder transport mechanism and the direction changing mechanism in the present embodiment.
- the first drive unit 36 of the substrate holder transport mechanism 3 is moved in the first transport direction P1, thereby transporting the substrate holder transport mechanism 3 as shown in FIG.
- the substrate holder 11 that has reached the folded portion 30B is further moved in the first transport direction P1, and the second driven shaft 13 of the substrate holder 11 enters the entrance of the second direction changing path 52 of the direction changing mechanism 40. Place at the position.
- the operation of the transport driving member 45 is controlled so that the second driving unit 46 of the direction changing mechanism 40 is positioned below the second driven shaft 13 of the substrate holder 11. Then, the transport driving member 33 of the substrate holder transport mechanism 3 is driven to move the first drive unit 36 in the first transport direction P1, and the transport driving member 45 of the direction changing mechanism 40 is driven to perform the second operation. Is moved in the first transport direction P1. In this case, control is performed so that the operations of the first drive unit 36 and the second drive unit 46 are synchronized.
- the first and second driven shafts 12 and 13 of the substrate holder 11 are supported and driven by the first and second driving units 36 and 46, respectively. And the second direction change paths 51 and 52 respectively move downward.
- the first driven shaft 12 of the substrate holder 11 does not contact at the same time in the first direction changing path 51, but the first guide member 41 and the second guide member 42
- the second driven shaft 13 is not in contact with the edge of the second guide member 42 and the third guide member 43 at the same time in the second direction changing path 52. Contact.
- the substrate holder 11 maintains a vertical relationship.
- the transport direction is changed to the second transport direction P2 opposite to the first transport direction P1 while maintaining the vertical relationship of the substrate holder 11.
- the first driven shaft 12 of the substrate holder 11 does not contact at the same time in the first direction changing path 51, but the first guide member 41 and the second guide member 42
- the second driven shaft 13 is not in contact with the edge of the second guide member 42 and the third guide member 43 at the same time in the second direction changing path 52. Contact.
- the first driven shaft of the substrate retainer 11 as shown in FIG. 12 is disposed at a position above the transfer member 47 via the discharge port of the first direction changing path 51 and the transfer portion 47a of the transfer member 47, and the second driven shaft 13 of the substrate holder 11 is The substrate holder 11 is disposed at the position of the discharge port of the second direction changing path 52, and then the substrate holder 11 is moved to the return side substrate holder support mechanism 18c of the substrate holder support mechanism 18 as shown in FIG. Delivered.
- retainer 11 are not contacting at the time shown in FIG.10 (c), and the board
- the second driven shaft 13 of the substrate holder 11 is brought into contact with the inclined surface 47 b of the delivery member 47 as shown in FIG.
- the delivery member 47 rotates and moves downward in contact, and the second driven shaft 13 of the substrate holder 11 passes over the delivery member 47 as shown in FIG. Move in the second transport direction P2.
- the delivery member 47 returns to its original position after this process by the biasing force of an elastic member (not shown).
- the return path side transport unit 33 c of the transport drive member 33 of the substrate holder transport mechanism 3 is moved in the second transport direction P ⁇ b> 2, and the first drive unit 36 performs the first drive.
- the substrate holder 11 is transported toward the substrate holder discharge portion 30C.
- the return path side conveyance portion 33c of the conveyance drive member 33 is moved in the second conveyance direction P2, and the first drive portion 36 performs the first drive.
- the first drive part 36 is inclined as shown in FIG. The contact between the portion 36 and the first driven shaft 12 is released, whereby the substrate holder 11 loses propulsive force.
- FIGS. 13A to 13D are explanatory views showing an operation of removing contact between the first driving unit of the transport driving member and the first driven shaft of the substrate holder in the present embodiment.
- the substrate holder 11 reaches the substrate holder discharge portion 30C, as shown in FIG. 13A, the second protrusion 36b of the first drive portion 36 is oriented in the vertical direction.
- the downstream portion 36 f in the transport direction is in contact with the first driven shaft 12 of the substrate holder 11.
- the substrate holder 11 moves on the return path side substrate holder support mechanism 18c in the second transport direction P2, As shown in FIG. 13B, the first drive unit 36 moves upward along the first drive wheel 31 (see FIG. 1), and the second protrusion 36b approaches the horizontal direction. As a result, the first driven shaft 12 of the substrate holder 11 comes into contact with the rounded portion on the downstream side in the transport direction at the tip of the second protrusion 36 b of the first drive unit 36. .
- the first drive unit 36 follows the first drive wheel 31 as shown in FIG.
- the tip of the second protrusion 36b of the first drive unit 36 is in contact with the first driven shaft 12 of the substrate holder 11 so that the first driven shaft 12 Get over the top.
- the third taper portion 36e formed at the distal end portion of the second protrusion 36b so that the upstream portion in the transport direction is inclined inward in the transport direction.
- the surface of the third tapered portion 36e is provided when the tip of the second protruding portion 36b of the first driving portion 36 gets over the upper portion of the first driven shaft 12 of the substrate holder 11. Becomes almost horizontal.
- the first taper 36e having the third taper portion 36e is obtained as shown in FIG.
- the drive unit 36 does not contact (interfere) with the first driven shaft 12, and the contact between the second protrusion 36 b of the first drive unit 36 and the first driven shaft 12 of the substrate holder 11 does not occur.
- the substrate holder 11 is moved in the second transport direction P2 without coming out of contact with the second protrusion 36b of the first drive unit 36 and the second driven shaft 13 of the substrate holder 11. Will be able to.
- the upstream portion of the second projecting portion 36b of the first driving portion 36 that is moved by the transport driving member 33 is located on the inner side in the transport direction.
- the third tapered portion 36e formed so as to be inclined contact between the first driving portion 36 and the first driven shaft 12 can be made as compared with the prior art that does not have the third tapered portion 36e.
- the moving distance during the removing operation can be shortened and the operation time can be shortened, whereby the timing for delivering the substrate holder 11 to the substrate carry-in / out mechanism 6 can be greatly advanced.
- the substrate holder 11 is moved in the second transfer direction P2 by the transfer robot 64 of the substrate loading / unloading mechanism 6 shown in FIG.
- the substrate holder 11 is taken out by using the transfer robot 64 of the substrate carry-in / out mechanism 6, and the substrate holder 11 is arranged on the support unit 62 together with the transfer robot 64 as shown in FIG.
- the support portion 62 of the substrate loading / unloading mechanism 6 is raised, and the sealing member 63 on the support portion 62 is brought into close contact with the inner wall of the vacuum chamber 2, so that the substrate is kept against the atmosphere in the vacuum chamber 2. Venting to atmospheric pressure is performed with the atmosphere in the loading / unloading chamber 2A isolated.
- the lid 2a of the substrate loading / unloading chamber 2A is opened, and the processed substrate 10b is taken out from the substrate holder 11 into the atmosphere using a transfer robot (not shown). After that, returning to the state shown in FIG. 6, the above-described vacuum processing is performed on each of the plurality of substrates 10 by repeating the above-described operation.
- the transfer path is formed so that the projection shape with respect to the vertical plane is a series of annular shapes, and a plurality of Since the substrate holder transport mechanism 3 for transporting the substrate holder 11 along the transport path is provided, the space occupied by the transport path can be greatly reduced as compared with the prior art. Since significant space saving can be achieved, a vacuum processing apparatus having a small and simple configuration can be provided.
- the forward-side transport unit 33a of the transport driving member 33 that transports the introduced substrate holder 11 in the first transport direction P1 along the transport path in a horizontal state is the first process.
- the return path conveyance unit 33 c is configured to pass through the second processing region 5.
- the first driving unit 36 of the substrate holder transport mechanism 3 and the second driving unit 46 of the direction changing mechanism 40 are operated in synchronization, and the first and second driven shafts 12 of the substrate holder 11 are operated.
- the substrate holder 11 is configured to hold a plurality of substrates 10 in a direction orthogonal to the transport direction, the substrate transport direction as in the prior art is performed. Compared with the case where a substrate holder that holds a plurality of substrates side by side is transported and processed, the length of the substrate holder and the excess space associated therewith can be reduced. Space can be achieved.
- the present invention is not limited to the above-described embodiment, and various changes can be made.
- the upper part of the transport driving member 33 is the forward transport part 33a, which is the first transport part
- the lower part of the transport drive member 33 is the second transport part.
- the present invention is not limited to this, and it is possible to reverse these vertical relationships.
- the substrate holder transport mechanism 3 and the direction changing mechanism 40 are configured from a pair of sprockets and a chain spanned between the pair of sprockets. It is also possible to use an annular transport driving mechanism. Further, the substrate holder support mechanism 18 can be configured using a belt or a rail instead of a roller.
- direction changing mechanism 40 is not limited to the above-described embodiment configured by the first to third guide members 41 to 43 described above, and can be modified as follows.
- the guide member 44 corresponding to the second guide member 42 and the guide member 43A corresponding to the third guide member 43 are provided, and the pair of guide members 44, 43A is comprised so that the 1st and 2nd direction change path
- the guide member 44 is formed in, for example, the letter “te” (a shape similar to T) of Hiragana, and the upstream portion 44 a in the first transport direction P 1 is the second guide member 42 of the second guide member 42. 1 is formed in a curved surface shape equivalent to the upstream portion of the conveyance direction P1.
- the first driven shaft 12 of the substrate holder 11 driven by the first driving unit 36 described above is brought into contact with the portion 44a on the upstream side of the guide member 44 in the first transport direction P1, and this portion. It is comprised so that it may guide below from 44a along 44a.
- the guide member 43A has an upstream portion 43a in the first transport direction P1 having a curved surface shape equivalent to the upstream portion of the third guide member 43 in the first transport direction P1. .
- the second driven shaft 13 of the substrate holder 11 driven by the second driving unit 46 described above is brought into contact with the portion 43a on the upstream side in the first transport direction P1 of the guide member 43A. It is comprised so that it may guide below from the upper direction along 43a.
- the first guide member 41 described above becomes unnecessary, and the material of the guide member 44 corresponding to the second guide member 42 can be reduced. Simplification of the configuration of the conversion mechanism 40 and, in turn, simplification of the device configuration and cost reduction can be achieved.
- first and second driving units 36 and 46 is not limited to the above embodiment, and the first and second driven shafts 12 and 13 of the substrate holder 11 are reliably in contact with and supported. As long as it can be driven, various shapes can be employed.
- the sputtering apparatus is described as an example of the processing in vacuum.
- the present invention is not limited to this, and for example, plasma processing, ion implantation processing, vapor deposition processing, chemical vapor deposition processing, and the like.
- the present invention can be applied to a vacuum processing apparatus that performs various processes such as a focused ion beam process and an etching process.
- the first and second processing regions 4 and 5 can be provided with processing sources for performing different processing.
- the present invention is not limited to the case where the unprocessed substrate 10a is loaded into the vacuum chamber 2 and the processed substrate 10b is unloaded from the vacuum chamber 2 as in the above embodiment, but also the unprocessed substrate 10a.
- This can also be applied to the case where the substrate 10 is carried into the vacuum chamber 2 together with the substrate holder 11 and the processed substrate 10 b is carried out of the vacuum chamber 2 together with the substrate holder 11.
- Conveyance drive member (conveyance path) 33a Outward side transport unit (first transport unit) 33b ... Folding part 33c ... Return path side conveyance part (second conveyance part) 36 ... 1st drive part 40 ... Direction change mechanism 41 ... 1st guide member 42 ... 2nd guide member 43 ... 3rd guide member 45 ... Conveyance drive member 46 ... 2nd drive part 51 ... 1st Direction change path 52 ... second direction change path
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Abstract
Description
このような真空処理装置としては、処理対象である基板を真空槽内に導入(ローディング)して基板保持器に保持させ、処理が終了した基板を基板保持器から取り外して真空槽の外へ排出(アンローディング)する。
特に、基板の両面に処理を行う装置においては、上述した課題がより深刻になるとともにスループットを向上させることが困難であるという問題がある。
本発明は、前記第1の方向転換経路と前記第2の方向転換経路とが、前記第1の搬送方向側に凸となる同等の曲線形状に形成されている真空処理装置である。
本発明は、前記第1の方向転換経路と前記第2の方向転換経路とが、それぞれ一対のガイド部材を前記基板保持器の第1の被駆動軸の直径より若干大きな隙間を設けて対向するように近接して配置することによって設けられている真空処理装置である。
本発明は、前記基板保持器の第1及び第2の被駆動部が前記第1及び第2の搬送方向に対して直交する方向に延びるように設けられ、当該第1及び第2の被駆動部の長さが異なる真空処理装置である。
本発明は、前記方向転換機構が、前記第1及び第2の搬送方向に関して前記基板保持器搬送機構の外側の位置に配置されている真空処理装置である。
本発明は、前記第1及び第2の処理領域が、真空中で成膜を行うものである真空処理装置である。
本発明は、前記基板保持器は、前記第1及び第2の搬送方向に対して直交する方向に複数の成膜対象基板を並べて保持するように構成されている真空処理装置である。
図1は、本発明に係る真空処理装置の実施の形態の全体を示す概略構成図である。
また、図2(a)(b)は、本実施の形態における基板保持器搬送機構及び方向転換機構の基本構成を示すもので、図2(a)は平面図、図2(b)は正面図である。
さらにまた、図4(a)~(d)は、本実施の形態の搬送駆動部材に設けられる第1の駆動部の構成を示すもので、図4(a)は搬送方向下流側から見た側面図、図4(b)は正面図、図4(c)は搬送方向上流側から見た側面図、図4(d)は斜視図である。
さらにまた、図5は、本実施の形態における方向転換機構の構成を示す正面図である。
真空槽2の内部には、後述する基板保持器11を搬送経路に沿って搬送する基板保持器搬送機構3が設けられている。
ここで、基板保持器搬送機構3は、例えばスプロケット等からなり駆動機構(図示せず)から回転駆動力が伝達されて動作する同一径の円形の第1及び第2の駆動輪31、32を有し、これら第1及び第2の駆動輪31、32が、それぞれの回転軸線を平行にした状態で所定距離をおいて配置されている。
さらに、これら第1及び第2の駆動輪31、32に搬送駆動部材33が架け渡された構造体が所定の距離をおいて平行に配置され(図2(a)参照)、これら一対の搬送駆動部材33により鉛直面に対して一連の環状となる搬送経路が形成されている。
ここで、搬送折り返し部30Bの近傍には、後述する方向転換機構40が設けられている。
本実施の形態では、真空槽2内において、基板保持器搬送機構3の上部に、例えばスパッタ源4Tを有する第1の処理領域4が設けられ、基板保持器搬送機構3の下部に、例えばスパッタ源5Tを有する第2の処理領域5が設けられている。
この基板搬入搬出室2Aは、例えば上述した基板搬入搬出機構6の支持部62の上方の位置に連通口2Bを介して設けられており、例えば基板搬入搬出室2Aの上部には、開閉可能な蓋部2aが設けられている。
基板保持器支持機構18は、例えば複数のローラ等の回転可能な部材からなるもので、それぞれ搬送駆動部材33の近傍に設けられている。
図2(a)及び図3(a)に示すように、本実施の形態の基板保持器11は、例えば長尺矩形の平板状に形成され、その長手方向即ち第1及び第2の搬送方向P1、P2に対して直交する方向に例えば矩形状の複数の基板10を一列に並べてそれぞれ保持する複数の保持部14が設けられている。
ただし、処理効率を向上させる観点からは、搬送方向に対して直交する方向に複数の基板10を複数列に並べることも可能である。
本実施の形態では、第2の被駆動軸13の長さが第1の被駆動軸12の長さより長くなるようにその寸法が定められている。
本実施の形態の場合、一対の方向転換機構40は、それぞれ第1及び第2の搬送方向P1、P2に関して一対の搬送駆動部材33の外側の位置に配置されている。
本実施の形態では、第1及び第2のテーパ部36c、36dは、それぞれ第1の突部36a及び第2の突部36bの搬送方向に対して側方側の部分の両方に設けられている。
この場合、第3のテーパ部36eは、その搬送方向上流側及び下流側の縁部にアール加工が施され、その中央部分は平面状に形成されている。
ここで、第1のガイド部材41の第1の搬送方向P1の下流側の部分は、第1の搬送方向P1の下流側に向って凸となる曲面形状に形成され、また、第2のガイド部材42の第1の搬送方向P1の上流側の部分は、第1の搬送方向P1の下流側に向って凹となる曲面形状に形成されている。
さらに、本実施の形態では、第1及び第2の方向転換経路51、52の各部分の水平方向についての距離が、基板保持器11の第1及び第2の被駆動軸12、13の間の距離と同等となるようにその寸法が定められている。
また、搬送駆動部材45の上側の部分が第1の搬送方向P1に移動し、下側の部分が第2の搬送方向P2に移動するように駆動される。
第2の駆動部46は、搬送駆動部材45の外方側の部分に凹部が形成され、この凹部の縁部が基板保持器11の第2の被駆動軸13と接触して当該基板保持器11を第2の方向転換経路52に沿って支持駆動するように構成されている。
本実施の形態では、まず、図6に示すように、基板搬入搬出機構6の支持部62上のシール部材63を真空槽2の内壁に密着させて真空槽2内の雰囲気に対して基板搬入搬出室2A内の雰囲気を隔離した状態で、大気圧までベントした後、基板搬入搬出室2Aの蓋部2aを開ける。
その後、図示しない搬送ロボットを用いて処理前の基板10aを基板搬入搬出機構6の支持部62の搬送ロボット64上の基板保持器11に装着して保持させる。
この動作の際、基板保持器11が第1の搬送方向P1に対して直交する方向にずれ(図9(b)参照)、基板保持器11の搬送方向に対して直交する方向側の縁部が第1の駆動部36に接触する場合があるが、本実施の形態では、上述したように、第1の駆動部36の第1の突部36a及び第2の突部36bにそれぞれ第1及び第2のテーパ部36c、36dが設けられているから、基板保持器11の搬送方向に対して直交する方向側の縁部が第1の駆動部36の第1及び第2の突部36a、36bに当接し、これにより基板保持器11が搬送方向に対して直交する方向にアライメントされて位置ずれが補正され、その結果、基板保持器11の第1の被駆動軸12を第1の駆動部36の溝部内に円滑に配置することができる。
その後、この状態で、図9(b)に示すように、基板保持器搬送機構3の搬送駆動部材33の往路側搬送部33aを第1の搬送方向P1に移動させる。
本実施の形態では、基板保持器搬送機構3の第1の駆動部36を第1の搬送方向P1に移動させることにより、図10(a)に示すように、基板保持器搬送機構3の搬送折り返し部30Bに到達した基板保持器11を更に第1の搬送方向P1に移動させ、基板保持器11の第2の被駆動軸13を方向転換機構40の第2の方向転換経路52の進入口の位置に配置する。
そして、基板保持器搬送機構3の搬送駆動部材33を駆動して第1の駆動部36を第1の搬送方向P1に移動させるとともに、方向転換機構40の搬送駆動部材45を駆動して第2の駆動部46を第1の搬送方向P1に移動させる。この場合、第1の駆動部36と第2の駆動部46の動作が同期するように制御する。
なお、受け渡し部材47は、この過程の後に図示しない弾性部材の付勢力によって元の位置に戻る。
基板保持器11が基板保持器排出部30Cに到達した時点では、図13(a)に示すように、第1の駆動部36の第2の突部36bが、鉛直方向に向けられた状態で、その搬送方向下流側の部分36fが基板保持器11の第1の被駆動軸12に接触している。
その後、図6に示す状態に戻り、上述した動作を繰り返すことにより、複数の基板10に対してそれぞれ両面に上述した真空処理を行う。
例えば上記実施の形態においては、搬送駆動部材33のうち上側の部分を第1の搬送部である往路側搬送部33aとするとともに、搬送駆動部材33のうち下側の部分を第2の搬送部である復路側搬送部33cとするようにしたが、本発明はこれに限られず、これらの上下関係を逆にすることもできる。
さらに、基板保持器支持機構18については、ローラではなくベルトやレールを用いて構成することもできる。
この場合、第1及び第2の処理領域4、5には、異なる処理を行う処理源を設けることもできる。
2…真空槽
3…基板保持器搬送機構
4…第1の処理領域
4T…スパッタ源
5…第2の処理領域
5T…スパッタ源
6…基板搬入搬出機構
10…基板
11…基板保持器
12…第1の被駆動軸(第1の被駆動部)
13…第2の被駆動軸(第2の被駆動部)
30A…基板保持器導入部
30B…搬送折り返し部
30C…基板保持器排出部
31…第1の駆動輪
32…第2の駆動輪
33…搬送駆動部材(搬送経路)
33a…往路側搬送部(第1の搬送部)
33b…折り返し部
33c…復路側搬送部(第2の搬送部)
36…第1の駆動部
40…方向転換機構
41…第1のガイド部材
42…第2のガイド部材
43…第3のガイド部材
45…搬送駆動部材
46…第2の駆動部
51…第1の方向転換経路
52…第2の方向転換経路
Claims (7)
- 単一の真空雰囲気が形成される真空槽と、
前記真空槽内に設けられ、基板保持器に保持された基板上に所定の真空処理を行う第1及び第2の処理領域と、
鉛直面に対する投影形状が一連の環状となるように形成され、前記基板保持器を搬送する搬送経路と、
第1及び第2の被駆動部を有する複数の前記基板保持器を前記搬送経路に沿って搬送する基板保持器搬送機構とを備え、
前記搬送経路は、導入された前記基板保持器を水平にした状態で前記搬送経路に沿って第1の搬送方向に搬送する第1の搬送部と、前記基板保持器を水平にした状態で前記搬送経路に沿って前記第1の搬送方向と反対方向の第2の搬送方向に搬送して排出する第2の搬送部と、前記基板保持器を前記第1の搬送部から前記第2の搬送部に向って折り返して搬送する搬送折り返し部とを有し、前記第1の搬送部が、前記第1及び第2の処理領域のうち一方を通過し、かつ、前記第2の搬送部が、前記第1及び第2の処理領域のうち他方を通過するように構成され、
前記基板保持器搬送機構は、前記基板保持器の第1の被駆動部と接触して当該基板保持器を前記搬送経路に沿って駆動する複数の第1の駆動部を有し、
前記搬送経路の搬送折り返し部の近傍に、前記基板保持器の第2の被駆動部と接触して当該基板保持器を前記第1及び第2の搬送方向にそれぞれ駆動する複数の第2の駆動部と、前記基板保持器の第1及び第2の被駆動部を当該基板保持器を前記第1の搬送方向から前記第2の搬送方向へ方向転換するようにそれぞれ案内して搬送するための第1及び第2の方向転換経路とを有する方向転換機構が設けられ、
前記基板保持器搬送機構の第1の駆動部と前記方向転換機構の第2の駆動部とを同期して動作させ、前記基板保持器の第1及び第2の被駆動部を前記方向転換機構の第1及び第2の方向転換経路に沿ってそれぞれ案内して搬送することにより、前記基板保持器を上下関係を維持した状態で前記搬送経路の第1の搬送部から第2の搬送部に受け渡すように構成されている真空処理装置。 - 前記第1の方向転換経路と前記第2の方向転換経路とが、前記第1の搬送方向側に凸となる同等の曲線形状に形成されている請求項1記載の真空処理装置。
- 前記第1の方向転換経路と前記第2の方向転換経路とが、それぞれ一対のガイド部材を前記基板保持器の第1の被駆動軸の直径より若干大きな隙間を設けて対向するように近接して配置することによって設けられている請求項2記載の真空処理装置。
- 前記基板保持器の第1及び第2の被駆動部が前記第1及び第2の搬送方向に対して直交する方向に延びるように設けられ、当該第1及び第2の被駆動部の長さが異なる請求項1乃至3のいずれか1項記載の真空処理装置。
- 前記方向転換機構が、前記第1及び第2の搬送方向に関して前記基板保持器搬送機構の外側の位置に配置されている請求項1乃至3のいずれか1項記載の真空処理装置。
- 前記第1及び第2の処理領域が、真空中で成膜を行うものである請求項1乃至3のいずれか1項記載の真空処理装置。
- 前記基板保持器は、前記第1及び第2の搬送方向に対して直交する方向に複数の成膜対象基板を並べて保持するように構成されている請求項1乃至3のいずれか1項記載の真空処理装置。
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JP2021118356A (ja) * | 2020-01-22 | 2021-08-10 | フォン アルデンヌ アセット ゲーエムベーハー ウント コー カーゲー | 循環式コンベヤ輸送ホイール、基板キャリア、及び方法 |
US11795003B2 (en) | 2020-01-22 | 2023-10-24 | VON ARDENNE Asset GmbH & Co. KG | Circulation conveyor transport wheel, substrate carrier and method |
JP7483641B2 (ja) | 2020-01-22 | 2024-05-15 | フォン アルデンヌ アセット ゲーエムベーハー ウント コー カーゲー | 循環式コンベヤ輸送ホイール、基板キャリア、及び方法 |
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CN114709124A (zh) | 2022-07-05 |
KR102035985B1 (ko) | 2019-10-23 |
JP6442648B1 (ja) | 2018-12-19 |
KR20190087651A (ko) | 2019-07-24 |
CN110678576A (zh) | 2020-01-10 |
CN110678576B (zh) | 2022-03-22 |
TW201906050A (zh) | 2019-02-01 |
TWI697065B (zh) | 2020-06-21 |
JPWO2018230592A1 (ja) | 2019-06-27 |
US20200002807A1 (en) | 2020-01-02 |
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