JPS5528077A - Production of mask - Google Patents
Production of maskInfo
- Publication number
- JPS5528077A JPS5528077A JP10197378A JP10197378A JPS5528077A JP S5528077 A JPS5528077 A JP S5528077A JP 10197378 A JP10197378 A JP 10197378A JP 10197378 A JP10197378 A JP 10197378A JP S5528077 A JPS5528077 A JP S5528077A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- radiated part
- film
- ions
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 3
- 238000010894 electron beam technology Methods 0.000 abstract 4
- 150000002500 ions Chemical class 0.000 abstract 4
- 239000011651 chromium Substances 0.000 abstract 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 abstract 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 abstract 1
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 229910000423 chromium oxide Inorganic materials 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 238000000059 patterning Methods 0.000 abstract 1
- 238000001020 plasma etching Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10197378A JPS5528077A (en) | 1978-08-21 | 1978-08-21 | Production of mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10197378A JPS5528077A (en) | 1978-08-21 | 1978-08-21 | Production of mask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5528077A true JPS5528077A (en) | 1980-02-28 |
JPS6159505B2 JPS6159505B2 (enrdf_load_stackoverflow) | 1986-12-16 |
Family
ID=14314801
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10197378A Granted JPS5528077A (en) | 1978-08-21 | 1978-08-21 | Production of mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5528077A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56133738A (en) * | 1980-03-25 | 1981-10-20 | Mitsubishi Electric Corp | Forming method for pattern of photomask |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0191702U (enrdf_load_stackoverflow) * | 1987-12-09 | 1989-06-15 | ||
JPH0191703U (enrdf_load_stackoverflow) * | 1987-12-09 | 1989-06-15 | ||
JPH0191704U (enrdf_load_stackoverflow) * | 1987-12-09 | 1989-06-15 | ||
JPH02195846A (ja) * | 1989-01-25 | 1990-08-02 | Miyazaki Ishiyama Seika Kk | 千切り大根の保存方法 |
JPH0314430A (ja) * | 1989-06-08 | 1991-01-23 | Mitsui Toatsu Chem Inc | 流状物充填袋の整袋方法及び装置 |
-
1978
- 1978-08-21 JP JP10197378A patent/JPS5528077A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56133738A (en) * | 1980-03-25 | 1981-10-20 | Mitsubishi Electric Corp | Forming method for pattern of photomask |
Also Published As
Publication number | Publication date |
---|---|
JPS6159505B2 (enrdf_load_stackoverflow) | 1986-12-16 |
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