JPS5718113A - Manufacture of elastic surface wave lattice type transducer - Google Patents
Manufacture of elastic surface wave lattice type transducerInfo
- Publication number
- JPS5718113A JPS5718113A JP9298180A JP9298180A JPS5718113A JP S5718113 A JPS5718113 A JP S5718113A JP 9298180 A JP9298180 A JP 9298180A JP 9298180 A JP9298180 A JP 9298180A JP S5718113 A JPS5718113 A JP S5718113A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- electrode
- auxiliary layer
- lattice type
- electrode material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
Abstract
PURPOSE:To obtain a tiny lattice type transducer, by putting in order an electrode material, an auxiliary layer and a resist mask on a piezoelectric substrate, executing an oblique vapor deposition of an inorganic material, and after that, etching the auxiliary layer, and subsequently etching the electrode material. CONSTITUTION:An Al film 30, an organic auxiliary layer 31, and a resist 32 are put on a piezoelectric substrate 21, electronic beam exposure and development are executed, and after that, the upper part of the resist is covered with Ti 37 by means of an oblique vapor deposition 36. Subsequently, an opening 39 is made on the auxiliary layer 31 vertically by an O2 ion beam 38 by a mask of Ti 37. An electrode pattern 40 is made by etch-removing the electrode material 30 of the opening part, and peeling off the layers 32, 31. An unnecessary electrode material on a scribe line 44 is removed by putting a resist mask 41 and etch-removing an electrode of an opening part 43. According to such a constitution, even if a resist oozes out at the opening part of a resist pattern, it does not exert influence on the following process, therefore, an elastic surface wave lattice type trasducer having an electrode of a very small size is obtained easily.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9298180A JPS5718113A (en) | 1980-07-08 | 1980-07-08 | Manufacture of elastic surface wave lattice type transducer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9298180A JPS5718113A (en) | 1980-07-08 | 1980-07-08 | Manufacture of elastic surface wave lattice type transducer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5718113A true JPS5718113A (en) | 1982-01-29 |
Family
ID=14069553
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9298180A Pending JPS5718113A (en) | 1980-07-08 | 1980-07-08 | Manufacture of elastic surface wave lattice type transducer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5718113A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61291894A (en) * | 1985-06-20 | 1986-12-22 | Dai Ichi High Frequency Co Ltd | Finned pipe for heat exchanger and heat exchanger using it |
US7343654B2 (en) * | 2004-01-23 | 2008-03-18 | Seiko Epson Corporation | Method of manufacturing a piezoelectric element and a liquid ink jet head |
-
1980
- 1980-07-08 JP JP9298180A patent/JPS5718113A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61291894A (en) * | 1985-06-20 | 1986-12-22 | Dai Ichi High Frequency Co Ltd | Finned pipe for heat exchanger and heat exchanger using it |
JPH0519078B2 (en) * | 1985-06-20 | 1993-03-15 | Daiichi Koshuha Kogyo Kk | |
US7343654B2 (en) * | 2004-01-23 | 2008-03-18 | Seiko Epson Corporation | Method of manufacturing a piezoelectric element and a liquid ink jet head |
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