JPS5493364A - Exposure system for electron beam - Google Patents
Exposure system for electron beamInfo
- Publication number
- JPS5493364A JPS5493364A JP15841177A JP15841177A JPS5493364A JP S5493364 A JPS5493364 A JP S5493364A JP 15841177 A JP15841177 A JP 15841177A JP 15841177 A JP15841177 A JP 15841177A JP S5493364 A JPS5493364 A JP S5493364A
- Authority
- JP
- Japan
- Prior art keywords
- electron
- exposure
- basic unit
- deflectors
- slits
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
- H01J37/3023—Programme control
- H01J37/3026—Patterning strategy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
- H01J2237/31761—Patterning strategy
- H01J2237/31762—Computer and memory organisation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15841177A JPS5493364A (en) | 1977-12-30 | 1977-12-30 | Exposure system for electron beam |
CA318,378A CA1125441A (en) | 1977-12-30 | 1978-12-21 | Electron beam exposure system and an apparatus for carrying out the same |
US05/971,693 US4291231A (en) | 1977-12-30 | 1978-12-21 | Electron beam exposure system and an apparatus for carrying out the same |
EP78300902A EP0002957B1 (en) | 1977-12-30 | 1978-12-22 | Electron beam exposure apparatus |
DE7878300902T DE2862123D1 (en) | 1977-12-30 | 1978-12-22 | Electron beam exposure apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15841177A JPS5493364A (en) | 1977-12-30 | 1977-12-30 | Exposure system for electron beam |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5493364A true JPS5493364A (en) | 1979-07-24 |
JPS5647695B2 JPS5647695B2 (ja) | 1981-11-11 |
Family
ID=15671158
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15841177A Granted JPS5493364A (en) | 1977-12-30 | 1977-12-30 | Exposure system for electron beam |
Country Status (5)
Country | Link |
---|---|
US (1) | US4291231A (ja) |
EP (1) | EP0002957B1 (ja) |
JP (1) | JPS5493364A (ja) |
CA (1) | CA1125441A (ja) |
DE (1) | DE2862123D1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5613725A (en) * | 1979-07-13 | 1981-02-10 | Jeol Ltd | Exposing method by electron ray |
JPS5791522A (en) * | 1980-11-28 | 1982-06-07 | Fujitsu Ltd | Electron beam exposure system |
JPS57114234A (en) * | 1980-12-24 | 1982-07-16 | Ibm | Pattern buffer interface for electron beam exposure system |
JPS5880837A (ja) * | 1981-11-09 | 1983-05-16 | Toshiba Corp | パタ−ン形成装置 |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57180128A (en) * | 1981-04-30 | 1982-11-06 | Toshiba Corp | Equipment for electron beam exposure |
JPS57204125A (en) * | 1981-06-10 | 1982-12-14 | Hitachi Ltd | Electron-ray drawing device |
JPS58121625A (ja) * | 1981-12-28 | 1983-07-20 | Fujitsu Ltd | 電子ビ−ム露光装置 |
JPS58162885U (ja) * | 1982-04-23 | 1983-10-29 | 泉陽機工株式会社 | 宙返りコ−スタ |
JPS593923A (ja) * | 1982-06-30 | 1984-01-10 | Fujitsu Ltd | 電子ビ−ム露光方法 |
JPS59124719A (ja) * | 1982-12-29 | 1984-07-18 | Fujitsu Ltd | 電子ビ−ム露光装置 |
JPS59143489U (ja) * | 1983-03-16 | 1984-09-26 | 明昌特殊産業株式会社 | 宙返りコ−スタ |
US4698509A (en) * | 1985-02-14 | 1987-10-06 | Varian Associates, Inc. | High speed pattern generator for electron beam lithography |
US4843563A (en) * | 1985-03-25 | 1989-06-27 | Canon Kabushiki Kaisha | Step-and-repeat alignment and exposure method and apparatus |
US4718019A (en) * | 1985-06-28 | 1988-01-05 | Control Data Corporation | Election beam exposure system and an apparatus for carrying out a pattern unwinder |
US4837447A (en) * | 1986-05-06 | 1989-06-06 | Research Triangle Institute, Inc. | Rasterization system for converting polygonal pattern data into a bit-map |
AU594798B2 (en) * | 1987-07-28 | 1990-03-15 | Ko-Lin Sun | A collapsible plastic crate |
US5058992A (en) * | 1988-09-07 | 1991-10-22 | Toppan Printing Co., Ltd. | Method for producing a display with a diffraction grating pattern and a display produced by the method |
IL97021A0 (en) * | 1991-01-24 | 1992-03-29 | Ibm Israel | Partitioning method for e-beam lithography |
US5159201A (en) * | 1991-07-26 | 1992-10-27 | International Business Machines Corporation | Shape decompositon system and method |
US5251140A (en) * | 1991-07-26 | 1993-10-05 | International Business Machines Corporation | E-beam control data compaction system and method |
JP2501726B2 (ja) * | 1991-10-08 | 1996-05-29 | インターナショナル・ビジネス・マシーンズ・コーポレイション | コンピュ―タ・イメ―ジ生成装置及びデ―タ減縮方法 |
US5366847A (en) * | 1992-02-24 | 1994-11-22 | Trw Inc. | Method and apparatus for optimizing semiconductor exposure process |
US5590048A (en) * | 1992-06-05 | 1996-12-31 | Fujitsu Limited | Block exposure pattern data extracting system and method for charged particle beam exposure |
US5481472A (en) * | 1993-05-18 | 1996-01-02 | International Business Machines Corporation | Method and apparatus for automatically recognizing repeated shapes for data compaction |
JP2647000B2 (ja) * | 1994-05-25 | 1997-08-27 | 日本電気株式会社 | 電子ビームの露光方法 |
JP2005195571A (ja) * | 2003-12-12 | 2005-07-21 | Fuji Photo Film Co Ltd | 放射線像変換パネル |
JP2005276869A (ja) * | 2004-03-23 | 2005-10-06 | Jeol Ltd | 荷電粒子ビーム描画装置。 |
JP2005276870A (ja) | 2004-03-23 | 2005-10-06 | Jeol Ltd | 荷電粒子ビーム装置。 |
US7898447B2 (en) * | 2009-07-16 | 2011-03-01 | Nuflare Technology, Inc. | Methods and systems for testing digital-to-analog converter/amplifier circuits |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50145865A (ja) * | 1974-04-18 | 1975-11-22 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2294489A1 (fr) * | 1974-12-13 | 1976-07-09 | Thomson Csf | Dispositif pour le trace programme de dessins par bombardement de particules |
JPS5283177A (en) * | 1975-12-31 | 1977-07-11 | Fujitsu Ltd | Electron beam exposure device |
JPS5412675A (en) * | 1977-06-30 | 1979-01-30 | Jeol Ltd | Electon beam exposure method |
US4147937A (en) * | 1977-11-01 | 1979-04-03 | Fujitsu Limited | Electron beam exposure system method and apparatus |
US4132898A (en) * | 1977-11-01 | 1979-01-02 | Fujitsu Limited | Overlapping boundary electron exposure system method and apparatus |
-
1977
- 1977-12-30 JP JP15841177A patent/JPS5493364A/ja active Granted
-
1978
- 1978-12-21 US US05/971,693 patent/US4291231A/en not_active Expired - Lifetime
- 1978-12-21 CA CA318,378A patent/CA1125441A/en not_active Expired
- 1978-12-22 EP EP78300902A patent/EP0002957B1/en not_active Expired
- 1978-12-22 DE DE7878300902T patent/DE2862123D1/de not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50145865A (ja) * | 1974-04-18 | 1975-11-22 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5613725A (en) * | 1979-07-13 | 1981-02-10 | Jeol Ltd | Exposing method by electron ray |
JPS5741813B2 (ja) * | 1979-07-13 | 1982-09-04 | ||
JPS5791522A (en) * | 1980-11-28 | 1982-06-07 | Fujitsu Ltd | Electron beam exposure system |
JPS57114234A (en) * | 1980-12-24 | 1982-07-16 | Ibm | Pattern buffer interface for electron beam exposure system |
JPH0422016B2 (ja) * | 1980-12-24 | 1992-04-15 | Intaanashonaru Bijinesu Mashiinzu Corp | |
JPS5880837A (ja) * | 1981-11-09 | 1983-05-16 | Toshiba Corp | パタ−ン形成装置 |
Also Published As
Publication number | Publication date |
---|---|
US4291231A (en) | 1981-09-22 |
EP0002957A2 (en) | 1979-07-11 |
EP0002957A3 (en) | 1979-07-25 |
EP0002957B1 (en) | 1982-12-08 |
CA1125441A (en) | 1982-06-08 |
JPS5647695B2 (ja) | 1981-11-11 |
DE2862123D1 (en) | 1983-01-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5493364A (en) | Exposure system for electron beam | |
JPS6425415A (en) | Beam exposure system | |
ATE60958T1 (de) | Elektronenstrahl-belichtungsvorrichtung. | |
JPS52119185A (en) | Electron beam exposure equipment | |
JPS5483773A (en) | Electron-beam exposure unit | |
JPS5776837A (en) | Apparatus for multipile electron beam exposure | |
JPS5381116A (en) | Radiation sensitive polymer and its working method | |
JPS52119182A (en) | Electron beam exposure equipment | |
JPS5772327A (en) | Formation of resist pattern | |
JPS5431282A (en) | Pattern formation method | |
JPS57208133A (en) | Electron-beam exposure method | |
JPS5251874A (en) | Electron beam exposure device | |
JPS6292434A (ja) | 電子ビ−ム露光装置 | |
JPS55138836A (en) | Electron beam exposure apparatus | |
JPS53120276A (en) | Electron beam exposure method | |
JPS52119079A (en) | Electron beam exposure | |
JPS51120671A (en) | Photomask fault processing method | |
JPS53143175A (en) | Electron beam drawing apparatus | |
JPS5276879A (en) | Counting device for number of exposure times of electron beam exposure device | |
JPS55120134A (en) | Apparatus for electron-beam lithography | |
JPS5483772A (en) | Electron-beam exposure unit | |
JPS57109085A (en) | System for optimizing object program of parallel computer | |
JPS5636133A (en) | Exposing method by electron beam | |
JPS5354480A (en) | Electron beam exposure apparatus | |
JPS5455382A (en) | Electron beam exposure system |