JPS55138836A - Electron beam exposure apparatus - Google Patents

Electron beam exposure apparatus

Info

Publication number
JPS55138836A
JPS55138836A JP4645479A JP4645479A JPS55138836A JP S55138836 A JPS55138836 A JP S55138836A JP 4645479 A JP4645479 A JP 4645479A JP 4645479 A JP4645479 A JP 4645479A JP S55138836 A JPS55138836 A JP S55138836A
Authority
JP
Japan
Prior art keywords
electron beam
registers
exposure
exposure apparatus
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4645479A
Other languages
Japanese (ja)
Inventor
Yasuo Furukawa
Seigo Igaki
Yoshiaki Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4645479A priority Critical patent/JPS55138836A/en
Publication of JPS55138836A publication Critical patent/JPS55138836A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To arbitrarily set the size of an exposure pattern in an electron beam exposure apparatus by dividing a field to be exposed into a plurality of subfields to be partitioned by an input value to a register in the number of scanning bits, respectively. CONSTITUTION:An electron beam emitted from an electron gun G is deflected by deflectors Lx and Ly to irradiate the beam to predetermined exposure position P. Registers 4, 13 specify the addresses of divided areas forming an exposure area, and registers 6, 8 specify the number of the secondary scanning bits in the divided area. An electron beam is irradiated to the divided area having scanning are drawn by the registers 6, 8 and addresses specified by the registers 4, 13 corresponding to the exposure pattern.
JP4645479A 1979-04-16 1979-04-16 Electron beam exposure apparatus Pending JPS55138836A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4645479A JPS55138836A (en) 1979-04-16 1979-04-16 Electron beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4645479A JPS55138836A (en) 1979-04-16 1979-04-16 Electron beam exposure apparatus

Publications (1)

Publication Number Publication Date
JPS55138836A true JPS55138836A (en) 1980-10-30

Family

ID=12747602

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4645479A Pending JPS55138836A (en) 1979-04-16 1979-04-16 Electron beam exposure apparatus

Country Status (1)

Country Link
JP (1) JPS55138836A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5093571A (en) * 1973-12-19 1975-07-25
JPS52119182A (en) * 1976-03-31 1977-10-06 Fujitsu Ltd Electron beam exposure equipment
JPS5599724A (en) * 1979-01-25 1980-07-30 Jeol Ltd Method of exposing electron beam

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5093571A (en) * 1973-12-19 1975-07-25
JPS52119182A (en) * 1976-03-31 1977-10-06 Fujitsu Ltd Electron beam exposure equipment
JPS5599724A (en) * 1979-01-25 1980-07-30 Jeol Ltd Method of exposing electron beam

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