JPS52119182A - Electron beam exposure equipment - Google Patents

Electron beam exposure equipment

Info

Publication number
JPS52119182A
JPS52119182A JP3647076A JP3647076A JPS52119182A JP S52119182 A JPS52119182 A JP S52119182A JP 3647076 A JP3647076 A JP 3647076A JP 3647076 A JP3647076 A JP 3647076A JP S52119182 A JPS52119182 A JP S52119182A
Authority
JP
Japan
Prior art keywords
electron beam
beam exposure
exposure equipment
pitch
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3647076A
Other languages
Japanese (ja)
Other versions
JPS606087B2 (en
Inventor
Haruo Tsuchikawa
Hiroshi Yasuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP51036470A priority Critical patent/JPS606087B2/en
Publication of JPS52119182A publication Critical patent/JPS52119182A/en
Publication of JPS606087B2 publication Critical patent/JPS606087B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To reduce the exposure time by accumulating the position co-ordinate, the size, repeative pitch and the number of the times of one basic square pattern composing the pattern group in the register and by controlling the pitch through the add circuit after the exposure to expose it by regular number of times in matrix.
COPYRIGHT: (C)1977,JPO&Japio
JP51036470A 1976-03-31 1976-03-31 Electron beam exposure method Expired JPS606087B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51036470A JPS606087B2 (en) 1976-03-31 1976-03-31 Electron beam exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51036470A JPS606087B2 (en) 1976-03-31 1976-03-31 Electron beam exposure method

Publications (2)

Publication Number Publication Date
JPS52119182A true JPS52119182A (en) 1977-10-06
JPS606087B2 JPS606087B2 (en) 1985-02-15

Family

ID=12470689

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51036470A Expired JPS606087B2 (en) 1976-03-31 1976-03-31 Electron beam exposure method

Country Status (1)

Country Link
JP (1) JPS606087B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53137672A (en) * 1977-05-06 1978-12-01 Nec Corp Arrangement graph drawing circuit
JPS5511303A (en) * 1978-07-10 1980-01-26 Chiyou Lsi Gijutsu Kenkyu Kumiai Electron-beam exposure device
JPS5559720A (en) * 1978-10-27 1980-05-06 Nippon Telegr & Teleph Corp <Ntt> Electron beam exposure graphic drawing processing system
JPS5599724A (en) * 1979-01-25 1980-07-30 Jeol Ltd Method of exposing electron beam
JPS55138836A (en) * 1979-04-16 1980-10-30 Fujitsu Ltd Electron beam exposure apparatus
JPH0239517A (en) * 1988-07-29 1990-02-08 Jeol Ltd Charged particle beam lithography method

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53137672A (en) * 1977-05-06 1978-12-01 Nec Corp Arrangement graph drawing circuit
JPS5613378B2 (en) * 1977-05-06 1981-03-27
JPS5511303A (en) * 1978-07-10 1980-01-26 Chiyou Lsi Gijutsu Kenkyu Kumiai Electron-beam exposure device
JPS5559720A (en) * 1978-10-27 1980-05-06 Nippon Telegr & Teleph Corp <Ntt> Electron beam exposure graphic drawing processing system
JPS5599724A (en) * 1979-01-25 1980-07-30 Jeol Ltd Method of exposing electron beam
JPS55138836A (en) * 1979-04-16 1980-10-30 Fujitsu Ltd Electron beam exposure apparatus
JPH0239517A (en) * 1988-07-29 1990-02-08 Jeol Ltd Charged particle beam lithography method

Also Published As

Publication number Publication date
JPS606087B2 (en) 1985-02-15

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