JPS5483773A - Electron-beam exposure unit - Google Patents

Electron-beam exposure unit

Info

Publication number
JPS5483773A
JPS5483773A JP15155577A JP15155577A JPS5483773A JP S5483773 A JPS5483773 A JP S5483773A JP 15155577 A JP15155577 A JP 15155577A JP 15155577 A JP15155577 A JP 15155577A JP S5483773 A JPS5483773 A JP S5483773A
Authority
JP
Japan
Prior art keywords
information
group
matrix
pattern
repeated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15155577A
Other languages
Japanese (ja)
Other versions
JPS5923102B2 (en
Inventor
Noriaki Nakayama
Seigo Igaki
Masahiro Okabe
Yasuo Furukawa
Yushi Inagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15155577A priority Critical patent/JPS5923102B2/en
Publication of JPS5483773A publication Critical patent/JPS5483773A/en
Publication of JPS5923102B2 publication Critical patent/JPS5923102B2/en
Expired legal-status Critical Current

Links

Abstract

PURPOSE: To control an exposure-pattern shape and position by using a pattern information for repeated exposure group and matrix information for repetition stored in a register group.
CONSTITUTION: Next pattern information group 30 is stored in the computer. Code 301 expresses that matrix information comes next, and information 302 consists of origin X and Y coordinates of the matrix, repeatitive pitches Dx and DY, and number NX and NY or repetitive times. Succesively, the number of square patterns 32 in the region of matrix 1, intra-group position coordinates X1 and Y1 of pattern 32, and dimentions X2 and Y2 of the square are shown after group information number 303, and this group information is repeated in a plural number of matrix regions. Random information 305 comes, which is not repeated, and patterns 34 and 35 consisting of the number of pieces, position coordinates and dimentions are given. By this information, automatic computing is done to control the deflector, thereby exposing group patterns sequentially.
COPYRIGHT: (C)1979,JPO&Japio
JP15155577A 1977-12-16 1977-12-16 Electron beam exposure equipment Expired JPS5923102B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15155577A JPS5923102B2 (en) 1977-12-16 1977-12-16 Electron beam exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15155577A JPS5923102B2 (en) 1977-12-16 1977-12-16 Electron beam exposure equipment

Publications (2)

Publication Number Publication Date
JPS5483773A true JPS5483773A (en) 1979-07-04
JPS5923102B2 JPS5923102B2 (en) 1984-05-30

Family

ID=15521072

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15155577A Expired JPS5923102B2 (en) 1977-12-16 1977-12-16 Electron beam exposure equipment

Country Status (1)

Country Link
JP (1) JPS5923102B2 (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5511303A (en) * 1978-07-10 1980-01-26 Chiyou Lsi Gijutsu Kenkyu Kumiai Electron-beam exposure device
JPS5778138A (en) * 1980-11-04 1982-05-15 Hitachi Ltd Electron beam driwing device
JPS57122529A (en) * 1981-01-23 1982-07-30 Nippon Telegr & Teleph Corp <Ntt> Drawing data processing system for electron beam exposure apparatus
JPS57124433A (en) * 1981-01-23 1982-08-03 Nippon Telegr & Teleph Corp <Ntt> Patterning data processing for electron beam expossing device
JPS5880837A (en) * 1981-11-09 1983-05-16 Toshiba Corp Pattern forming divice
JPS5957427A (en) * 1982-09-27 1984-04-03 Toshiba Corp Preparation of data drawn by electron beam
JPS61230252A (en) * 1985-04-05 1986-10-14 Hitachi Ltd Ion implantation device
JPS63218141A (en) * 1987-03-06 1988-09-12 Jeol Ltd Ion beam shotting method

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60175405U (en) * 1984-04-28 1985-11-20 株式会社小糸製作所 automotive lighting

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5511303A (en) * 1978-07-10 1980-01-26 Chiyou Lsi Gijutsu Kenkyu Kumiai Electron-beam exposure device
JPS5778138A (en) * 1980-11-04 1982-05-15 Hitachi Ltd Electron beam driwing device
JPS57122529A (en) * 1981-01-23 1982-07-30 Nippon Telegr & Teleph Corp <Ntt> Drawing data processing system for electron beam exposure apparatus
JPS57124433A (en) * 1981-01-23 1982-08-03 Nippon Telegr & Teleph Corp <Ntt> Patterning data processing for electron beam expossing device
JPS5880837A (en) * 1981-11-09 1983-05-16 Toshiba Corp Pattern forming divice
JPS5957427A (en) * 1982-09-27 1984-04-03 Toshiba Corp Preparation of data drawn by electron beam
JPH056338B2 (en) * 1982-09-27 1993-01-26 Tokyo Shibaura Electric Co
JPS61230252A (en) * 1985-04-05 1986-10-14 Hitachi Ltd Ion implantation device
JPH0526295B2 (en) * 1985-04-05 1993-04-15 Hitachi Ltd
JPS63218141A (en) * 1987-03-06 1988-09-12 Jeol Ltd Ion beam shotting method

Also Published As

Publication number Publication date
JPS5923102B2 (en) 1984-05-30

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