JPS5483773A - Electron-beam exposure unit - Google Patents
Electron-beam exposure unitInfo
- Publication number
- JPS5483773A JPS5483773A JP15155577A JP15155577A JPS5483773A JP S5483773 A JPS5483773 A JP S5483773A JP 15155577 A JP15155577 A JP 15155577A JP 15155577 A JP15155577 A JP 15155577A JP S5483773 A JPS5483773 A JP S5483773A
- Authority
- JP
- Japan
- Prior art keywords
- information
- group
- matrix
- pattern
- repeated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To control an exposure-pattern shape and position by using a pattern information for repeated exposure group and matrix information for repetition stored in a register group.
CONSTITUTION: Next pattern information group 30 is stored in the computer. Code 301 expresses that matrix information comes next, and information 302 consists of origin X and Y coordinates of the matrix, repeatitive pitches Dx and DY, and number NX and NY or repetitive times. Succesively, the number of square patterns 32 in the region of matrix 1, intra-group position coordinates X1 and Y1 of pattern 32, and dimentions X2 and Y2 of the square are shown after group information number 303, and this group information is repeated in a plural number of matrix regions. Random information 305 comes, which is not repeated, and patterns 34 and 35 consisting of the number of pieces, position coordinates and dimentions are given. By this information, automatic computing is done to control the deflector, thereby exposing group patterns sequentially.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15155577A JPS5923102B2 (en) | 1977-12-16 | 1977-12-16 | Electron beam exposure equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15155577A JPS5923102B2 (en) | 1977-12-16 | 1977-12-16 | Electron beam exposure equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5483773A true JPS5483773A (en) | 1979-07-04 |
JPS5923102B2 JPS5923102B2 (en) | 1984-05-30 |
Family
ID=15521072
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15155577A Expired JPS5923102B2 (en) | 1977-12-16 | 1977-12-16 | Electron beam exposure equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5923102B2 (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5511303A (en) * | 1978-07-10 | 1980-01-26 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Electron-beam exposure device |
JPS5778138A (en) * | 1980-11-04 | 1982-05-15 | Hitachi Ltd | Electron beam driwing device |
JPS57122529A (en) * | 1981-01-23 | 1982-07-30 | Nippon Telegr & Teleph Corp <Ntt> | Drawing data processing system for electron beam exposure apparatus |
JPS57124433A (en) * | 1981-01-23 | 1982-08-03 | Nippon Telegr & Teleph Corp <Ntt> | Patterning data processing for electron beam expossing device |
JPS5880837A (en) * | 1981-11-09 | 1983-05-16 | Toshiba Corp | Pattern forming divice |
JPS5957427A (en) * | 1982-09-27 | 1984-04-03 | Toshiba Corp | Preparation of data drawn by electron beam |
JPS61230252A (en) * | 1985-04-05 | 1986-10-14 | Hitachi Ltd | Ion implantation device |
JPS63218141A (en) * | 1987-03-06 | 1988-09-12 | Jeol Ltd | Ion beam shotting method |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60175405U (en) * | 1984-04-28 | 1985-11-20 | 株式会社小糸製作所 | automotive lighting |
-
1977
- 1977-12-16 JP JP15155577A patent/JPS5923102B2/en not_active Expired
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5511303A (en) * | 1978-07-10 | 1980-01-26 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Electron-beam exposure device |
JPS5778138A (en) * | 1980-11-04 | 1982-05-15 | Hitachi Ltd | Electron beam driwing device |
JPS57122529A (en) * | 1981-01-23 | 1982-07-30 | Nippon Telegr & Teleph Corp <Ntt> | Drawing data processing system for electron beam exposure apparatus |
JPS57124433A (en) * | 1981-01-23 | 1982-08-03 | Nippon Telegr & Teleph Corp <Ntt> | Patterning data processing for electron beam expossing device |
JPS5880837A (en) * | 1981-11-09 | 1983-05-16 | Toshiba Corp | Pattern forming divice |
JPS5957427A (en) * | 1982-09-27 | 1984-04-03 | Toshiba Corp | Preparation of data drawn by electron beam |
JPH056338B2 (en) * | 1982-09-27 | 1993-01-26 | Tokyo Shibaura Electric Co | |
JPS61230252A (en) * | 1985-04-05 | 1986-10-14 | Hitachi Ltd | Ion implantation device |
JPH0526295B2 (en) * | 1985-04-05 | 1993-04-15 | Hitachi Ltd | |
JPS63218141A (en) * | 1987-03-06 | 1988-09-12 | Jeol Ltd | Ion beam shotting method |
Also Published As
Publication number | Publication date |
---|---|
JPS5923102B2 (en) | 1984-05-30 |
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