JPS5778138A - Electron beam driwing device - Google Patents

Electron beam driwing device

Info

Publication number
JPS5778138A
JPS5778138A JP55153908A JP15390880A JPS5778138A JP S5778138 A JPS5778138 A JP S5778138A JP 55153908 A JP55153908 A JP 55153908A JP 15390880 A JP15390880 A JP 15390880A JP S5778138 A JPS5778138 A JP S5778138A
Authority
JP
Japan
Prior art keywords
throttle
electron beam
current
blanking
deflector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55153908A
Other languages
Japanese (ja)
Inventor
Kazumitsu Nakamura
Soichiro Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP55153908A priority Critical patent/JPS5778138A/en
Publication of JPS5778138A publication Critical patent/JPS5778138A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To reduce a drift of an electron beam by charge-up effect in a device for scanning an electron beam in a desired shape by setting the position of a blanking throttle position at the crossover point of the beam. CONSTITUTION:An electron beam formed in a desired shape by two shaping throttles 6, 9 and a deflector 8 is emitted and drawn on a target 13 by scanning it by a deflector 12. Means for detecting a beam current (or a reflected beam current or a transmitted beam current) flowing, for example, to a throttle 5 is attached to the throttle 5 forming a blanking controller of this device to most abruptly vary the current at the blanking deflecting time, thereby condensing and controlling a lens 3. Even if the throttle 5 is charged up in this manner, the position of the throttle 5 is set at the crossover position, thereby reducing the drift of the beam to emit the beam on the shaping throttle 6.
JP55153908A 1980-11-04 1980-11-04 Electron beam driwing device Pending JPS5778138A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55153908A JPS5778138A (en) 1980-11-04 1980-11-04 Electron beam driwing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55153908A JPS5778138A (en) 1980-11-04 1980-11-04 Electron beam driwing device

Publications (1)

Publication Number Publication Date
JPS5778138A true JPS5778138A (en) 1982-05-15

Family

ID=15572728

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55153908A Pending JPS5778138A (en) 1980-11-04 1980-11-04 Electron beam driwing device

Country Status (1)

Country Link
JP (1) JPS5778138A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4937458A (en) * 1987-10-16 1990-06-26 Hitachi, Ltd. Electron beam lithography apparatus including a beam blanking device utilizing a reference comparator

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5483773A (en) * 1977-12-16 1979-07-04 Fujitsu Ltd Electron-beam exposure unit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5483773A (en) * 1977-12-16 1979-07-04 Fujitsu Ltd Electron-beam exposure unit

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4937458A (en) * 1987-10-16 1990-06-26 Hitachi, Ltd. Electron beam lithography apparatus including a beam blanking device utilizing a reference comparator

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