JPS5791522A - Electron beam exposure system - Google Patents

Electron beam exposure system

Info

Publication number
JPS5791522A
JPS5791522A JP16748680A JP16748680A JPS5791522A JP S5791522 A JPS5791522 A JP S5791522A JP 16748680 A JP16748680 A JP 16748680A JP 16748680 A JP16748680 A JP 16748680A JP S5791522 A JPS5791522 A JP S5791522A
Authority
JP
Japan
Prior art keywords
data
pattern
electron beam
fundamental
throughput
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16748680A
Other languages
Japanese (ja)
Inventor
Yoshiaki Goto
Toshihiro Ishizuka
Yasuo Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16748680A priority Critical patent/JPS5791522A/en
Publication of JPS5791522A publication Critical patent/JPS5791522A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To improve the throughput of an electron beam exposure system by selectively reading a purality of pattern package memories storing fundamental pattern data different from each other, thereby drawing with electron beam of predetermined pattern. CONSTITUTION:When N-types of fundamental patterns are provided. M pieces of pattern packages 1 more than N pieces up to PPM-1-PPM-M are provided, data corresponding to the fundamental pattern are stored, a memory 1 is accessed via a selection switch 5 by a CPU3, exposure control data is fed to an exposure control circuit 4, the data of the memory is read via a selection switch 6, and a blanking signal B1, and a deflection signal def-x, def-y are controlled corresponding to the data. In this manner, the data transferring number can be reduced, thereby improving the throughput of the system.
JP16748680A 1980-11-28 1980-11-28 Electron beam exposure system Pending JPS5791522A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16748680A JPS5791522A (en) 1980-11-28 1980-11-28 Electron beam exposure system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16748680A JPS5791522A (en) 1980-11-28 1980-11-28 Electron beam exposure system

Publications (1)

Publication Number Publication Date
JPS5791522A true JPS5791522A (en) 1982-06-07

Family

ID=15850568

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16748680A Pending JPS5791522A (en) 1980-11-28 1980-11-28 Electron beam exposure system

Country Status (1)

Country Link
JP (1) JPS5791522A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59208827A (en) * 1983-05-13 1984-11-27 Toshiba Corp Pattern forming method
JPS6119125A (en) * 1984-07-05 1986-01-28 Matsushita Electric Ind Co Ltd Scanning type exposer

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5493364A (en) * 1977-12-30 1979-07-24 Fujitsu Ltd Exposure system for electron beam

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5493364A (en) * 1977-12-30 1979-07-24 Fujitsu Ltd Exposure system for electron beam

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59208827A (en) * 1983-05-13 1984-11-27 Toshiba Corp Pattern forming method
JPS6119125A (en) * 1984-07-05 1986-01-28 Matsushita Electric Ind Co Ltd Scanning type exposer

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