JPS5444474A - Contact forming method of semiconductor device - Google Patents

Contact forming method of semiconductor device

Info

Publication number
JPS5444474A
JPS5444474A JP11070477A JP11070477A JPS5444474A JP S5444474 A JPS5444474 A JP S5444474A JP 11070477 A JP11070477 A JP 11070477A JP 11070477 A JP11070477 A JP 11070477A JP S5444474 A JPS5444474 A JP S5444474A
Authority
JP
Japan
Prior art keywords
opening
polycrystal
pattern
film
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11070477A
Other languages
English (en)
Other versions
JPS6047738B2 (ja
Inventor
Takeya Ezaki
Onori Ishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP11070477A priority Critical patent/JPS6047738B2/ja
Publication of JPS5444474A publication Critical patent/JPS5444474A/ja
Publication of JPS6047738B2 publication Critical patent/JPS6047738B2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Drying Of Semiconductors (AREA)
JP11070477A 1977-09-14 1977-09-14 半導体装置のコンタクト形成方法 Expired JPS6047738B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11070477A JPS6047738B2 (ja) 1977-09-14 1977-09-14 半導体装置のコンタクト形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11070477A JPS6047738B2 (ja) 1977-09-14 1977-09-14 半導体装置のコンタクト形成方法

Publications (2)

Publication Number Publication Date
JPS5444474A true JPS5444474A (en) 1979-04-07
JPS6047738B2 JPS6047738B2 (ja) 1985-10-23

Family

ID=14542330

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11070477A Expired JPS6047738B2 (ja) 1977-09-14 1977-09-14 半導体装置のコンタクト形成方法

Country Status (1)

Country Link
JP (1) JPS6047738B2 (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5772384A (en) * 1980-10-24 1982-05-06 Nippon Telegr & Teleph Corp <Ntt> Manufacture of field-effect transistor
JPS57157543A (en) * 1981-03-25 1982-09-29 Toshiba Corp Manufacture of semiconductor device
JPS57184219A (en) * 1981-05-08 1982-11-12 Fujitsu Ltd Manufacture of semiconductor device
JPS589338A (ja) * 1981-06-30 1983-01-19 インタ−ナシヨナル・ビジネス・マシ−ンズ・コ−ポレ−シヨン 残留物の除去方法
JPS62500134A (ja) * 1984-08-30 1987-01-16 アメリカン テレフオン アンド テレグラフ カムパニ− 半導体デバイス内の電気コンタクト
JPS6246527A (ja) * 1985-08-26 1987-02-28 Sony Corp 半導体装置の製造方法

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5772384A (en) * 1980-10-24 1982-05-06 Nippon Telegr & Teleph Corp <Ntt> Manufacture of field-effect transistor
JPS57157543A (en) * 1981-03-25 1982-09-29 Toshiba Corp Manufacture of semiconductor device
JPH035656B2 (ja) * 1981-03-25 1991-01-28 Tokyo Shibaura Electric Co
JPS57184219A (en) * 1981-05-08 1982-11-12 Fujitsu Ltd Manufacture of semiconductor device
JPS589338A (ja) * 1981-06-30 1983-01-19 インタ−ナシヨナル・ビジネス・マシ−ンズ・コ−ポレ−シヨン 残留物の除去方法
JPH0371781B2 (ja) * 1981-06-30 1991-11-14 Intaanashonaru Bijinesu Mashiinzu Corp
JPS62500134A (ja) * 1984-08-30 1987-01-16 アメリカン テレフオン アンド テレグラフ カムパニ− 半導体デバイス内の電気コンタクト
JPS6246527A (ja) * 1985-08-26 1987-02-28 Sony Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS6047738B2 (ja) 1985-10-23

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