JPS5444474A - Contact forming method of semiconductor device - Google Patents
Contact forming method of semiconductor deviceInfo
- Publication number
- JPS5444474A JPS5444474A JP11070477A JP11070477A JPS5444474A JP S5444474 A JPS5444474 A JP S5444474A JP 11070477 A JP11070477 A JP 11070477A JP 11070477 A JP11070477 A JP 11070477A JP S5444474 A JPS5444474 A JP S5444474A
- Authority
- JP
- Japan
- Prior art keywords
- opening
- polycrystal
- pattern
- film
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11070477A JPS6047738B2 (ja) | 1977-09-14 | 1977-09-14 | 半導体装置のコンタクト形成方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11070477A JPS6047738B2 (ja) | 1977-09-14 | 1977-09-14 | 半導体装置のコンタクト形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5444474A true JPS5444474A (en) | 1979-04-07 |
JPS6047738B2 JPS6047738B2 (ja) | 1985-10-23 |
Family
ID=14542330
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11070477A Expired JPS6047738B2 (ja) | 1977-09-14 | 1977-09-14 | 半導体装置のコンタクト形成方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6047738B2 (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5772384A (en) * | 1980-10-24 | 1982-05-06 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of field-effect transistor |
JPS57157543A (en) * | 1981-03-25 | 1982-09-29 | Toshiba Corp | Manufacture of semiconductor device |
JPS57184219A (en) * | 1981-05-08 | 1982-11-12 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS589338A (ja) * | 1981-06-30 | 1983-01-19 | インタ−ナシヨナル・ビジネス・マシ−ンズ・コ−ポレ−シヨン | 残留物の除去方法 |
JPS62500134A (ja) * | 1984-08-30 | 1987-01-16 | アメリカン テレフオン アンド テレグラフ カムパニ− | 半導体デバイス内の電気コンタクト |
JPS6246527A (ja) * | 1985-08-26 | 1987-02-28 | Sony Corp | 半導体装置の製造方法 |
-
1977
- 1977-09-14 JP JP11070477A patent/JPS6047738B2/ja not_active Expired
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5772384A (en) * | 1980-10-24 | 1982-05-06 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of field-effect transistor |
JPS57157543A (en) * | 1981-03-25 | 1982-09-29 | Toshiba Corp | Manufacture of semiconductor device |
JPH035656B2 (ja) * | 1981-03-25 | 1991-01-28 | Tokyo Shibaura Electric Co | |
JPS57184219A (en) * | 1981-05-08 | 1982-11-12 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS589338A (ja) * | 1981-06-30 | 1983-01-19 | インタ−ナシヨナル・ビジネス・マシ−ンズ・コ−ポレ−シヨン | 残留物の除去方法 |
JPH0371781B2 (ja) * | 1981-06-30 | 1991-11-14 | Intaanashonaru Bijinesu Mashiinzu Corp | |
JPS62500134A (ja) * | 1984-08-30 | 1987-01-16 | アメリカン テレフオン アンド テレグラフ カムパニ− | 半導体デバイス内の電気コンタクト |
JPS6246527A (ja) * | 1985-08-26 | 1987-02-28 | Sony Corp | 半導体装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6047738B2 (ja) | 1985-10-23 |
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