JPS54146966A - Pattern forming method - Google Patents
Pattern forming methodInfo
- Publication number
- JPS54146966A JPS54146966A JP5577278A JP5577278A JPS54146966A JP S54146966 A JPS54146966 A JP S54146966A JP 5577278 A JP5577278 A JP 5577278A JP 5577278 A JP5577278 A JP 5577278A JP S54146966 A JPS54146966 A JP S54146966A
- Authority
- JP
- Japan
- Prior art keywords
- film
- photo resistor
- plasma processing
- layer
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Drying Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5577278A JPS54146966A (en) | 1978-05-10 | 1978-05-10 | Pattern forming method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5577278A JPS54146966A (en) | 1978-05-10 | 1978-05-10 | Pattern forming method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54146966A true JPS54146966A (en) | 1979-11-16 |
JPS6213813B2 JPS6213813B2 (ja) | 1987-03-28 |
Family
ID=13008156
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5577278A Granted JPS54146966A (en) | 1978-05-10 | 1978-05-10 | Pattern forming method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54146966A (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56111226A (en) * | 1980-02-07 | 1981-09-02 | Nippon Telegr & Teleph Corp <Ntt> | Formation of fine pattern |
JPS5842231A (ja) * | 1981-09-08 | 1983-03-11 | Fujitsu Ltd | パターン形成方法 |
JPS58100428A (ja) * | 1981-12-10 | 1983-06-15 | Matsushita Electronics Corp | パタ−ン形成方法 |
JPS61214435A (ja) * | 1985-03-19 | 1986-09-24 | Rohm Co Ltd | 半導体のホトリソグラフィー方法 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03108619U (ja) * | 1990-02-23 | 1991-11-08 |
-
1978
- 1978-05-10 JP JP5577278A patent/JPS54146966A/ja active Granted
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56111226A (en) * | 1980-02-07 | 1981-09-02 | Nippon Telegr & Teleph Corp <Ntt> | Formation of fine pattern |
JPS6156866B2 (ja) * | 1980-02-07 | 1986-12-04 | Nippon Telegraph & Telephone | |
JPS5842231A (ja) * | 1981-09-08 | 1983-03-11 | Fujitsu Ltd | パターン形成方法 |
JPH03770B2 (ja) * | 1981-09-08 | 1991-01-08 | Fujitsu Ltd | |
JPS58100428A (ja) * | 1981-12-10 | 1983-06-15 | Matsushita Electronics Corp | パタ−ン形成方法 |
JPS61214435A (ja) * | 1985-03-19 | 1986-09-24 | Rohm Co Ltd | 半導体のホトリソグラフィー方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6213813B2 (ja) | 1987-03-28 |
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