JPS54148389A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS54148389A JPS54148389A JP5693378A JP5693378A JPS54148389A JP S54148389 A JPS54148389 A JP S54148389A JP 5693378 A JP5693378 A JP 5693378A JP 5693378 A JP5693378 A JP 5693378A JP S54148389 A JPS54148389 A JP S54148389A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- poly
- substrate
- manufacture
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Element Separation (AREA)
Abstract
PURPOSE: To reduce the number of projections by laminating the poly Si and Si3N4 on one main surface of the Si substrate and then forming the heat oxide film on the exposed surface of the substrate after removing the prescribed areas uniformly of the poly Si and Si3N4.
CONSTITUTION: Poly Si10 and Si3N45 are laminated on one surface of semiconductor substrate 3. Part of both layer 5 and 10 plus layer 2 are removed uniformly by the plasma etching and via resist mask 7. Then heat oxide layer 9 is formed on exposed epitaxial layer 2 after removing the mask. After this, layer 5 and 10 are removed, thus reducing greatly the bird peak of layer 9.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5693378A JPS54148389A (en) | 1978-05-12 | 1978-05-12 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5693378A JPS54148389A (en) | 1978-05-12 | 1978-05-12 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54148389A true JPS54148389A (en) | 1979-11-20 |
Family
ID=13041309
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5693378A Pending JPS54148389A (en) | 1978-05-12 | 1978-05-12 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54148389A (en) |
-
1978
- 1978-05-12 JP JP5693378A patent/JPS54148389A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS57204133A (en) | Manufacture of semiconductor integrated circuit | |
JPS5448484A (en) | Forming method of insulation film | |
JPS54148389A (en) | Manufacture of semiconductor device | |
JPS5331964A (en) | Production of semiconductor substrates | |
JPS5550636A (en) | Preparation of semiconductor device | |
JPS5444870A (en) | Manufacture of semiconductor device | |
JPS57180144A (en) | Manufacture of semiconductor device | |
JPS5527659A (en) | Method of manufacturing semiconductor device | |
JPS54109783A (en) | Manufacture of semiconductor device | |
JPS5478668A (en) | Manufacture of semiconductor device | |
JPS5548950A (en) | Manufacturing of semiconductor device | |
JPS5762542A (en) | Manufacture of semiconductor device | |
JPS54162490A (en) | Manufacture of semiconductor device | |
JPS5633826A (en) | Manufacture of target | |
JPS5791537A (en) | Manufacture of semiconductor device | |
JPS5735340A (en) | Manufacture of semiconductor device | |
JPS5762543A (en) | Manufacture of semiconductor device | |
JPS5527662A (en) | Method of manufacturing semiconductor device | |
JPS54139486A (en) | Manufacture of semiconductor device | |
JPS5511312A (en) | Manufacturing method of semiconductor device | |
JPS5267985A (en) | Manufacturing process of semiconductor unit | |
JPS5724547A (en) | Manufacture of semiconductor element | |
JPS57202754A (en) | Manufacture of semiconductor device | |
JPS57199231A (en) | Manufacture of semiconductor device | |
JPS5766659A (en) | Manufacture of complementary mos semiconductor device |