JPS5527662A - Method of manufacturing semiconductor device - Google Patents
Method of manufacturing semiconductor deviceInfo
- Publication number
- JPS5527662A JPS5527662A JP10108678A JP10108678A JPS5527662A JP S5527662 A JPS5527662 A JP S5527662A JP 10108678 A JP10108678 A JP 10108678A JP 10108678 A JP10108678 A JP 10108678A JP S5527662 A JPS5527662 A JP S5527662A
- Authority
- JP
- Japan
- Prior art keywords
- film
- pattern
- semiconductor substrate
- conductor film
- conductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
PURPOSE: To prevent poor contact with a semiconductor substrate by covering the semiconductor substrate with the first coductor film to protect the surface of the semiconductor substrate from being stained by photo-sensitive resin films, developers, etc.
CONSTITUTION: Forming an insulator film 12 with opening holes on a semiconductor substrate 11, an impurity duffusion layer 13 is formed, and on the layer, the first conductor layer 14 is formed all over, the first pattern 15 is formed with a photo- sensitive resin film, and using the first pattern 15 as a mask, the conductor film 14 is made thinner by etching. Next, the second conductor film 17 is formed all over the surface and a photo-sensitive resin film 18 is formed in a pattern inverse to the first pattern 15. Next, after etching the second conductor film 17 using the resin film 18 as a mask, the resin films 15 and 18 are removed, and using a pattern 19 formed with the conductor film 17 as a mask, the first conductor film 14 is etched and a bilateral conductor film 21 is formed.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10108678A JPS5527662A (en) | 1978-08-18 | 1978-08-18 | Method of manufacturing semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10108678A JPS5527662A (en) | 1978-08-18 | 1978-08-18 | Method of manufacturing semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5527662A true JPS5527662A (en) | 1980-02-27 |
Family
ID=14291281
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10108678A Pending JPS5527662A (en) | 1978-08-18 | 1978-08-18 | Method of manufacturing semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5527662A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180023964A (en) | 2015-07-28 | 2018-03-07 | 키타가와고우교가부시끼가이샤 | Manufacturing method of reverse osmosis membrane |
-
1978
- 1978-08-18 JP JP10108678A patent/JPS5527662A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180023964A (en) | 2015-07-28 | 2018-03-07 | 키타가와고우교가부시끼가이샤 | Manufacturing method of reverse osmosis membrane |
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