JPS54107279A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS54107279A
JPS54107279A JP1425178A JP1425178A JPS54107279A JP S54107279 A JPS54107279 A JP S54107279A JP 1425178 A JP1425178 A JP 1425178A JP 1425178 A JP1425178 A JP 1425178A JP S54107279 A JPS54107279 A JP S54107279A
Authority
JP
Japan
Prior art keywords
single crystal
linkage body
poly
thin film
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1425178A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6329828B2 (enrdf_load_stackoverflow
Inventor
Hiroshi Shiba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP1425178A priority Critical patent/JPS54107279A/ja
Priority to NL7901023A priority patent/NL190710C/xx
Priority to DE2954501A priority patent/DE2954501C2/de
Priority to GB8113447A priority patent/GB2070860B/en
Priority to GB8113448A priority patent/GB2075259B/en
Priority to GB08221018A priority patent/GB2102625B/en
Priority to DE2954502A priority patent/DE2954502C2/de
Priority to GB7904606A priority patent/GB2014785B/en
Priority to DE19792905022 priority patent/DE2905022A1/de
Priority to FR7903527A priority patent/FR2417187A1/fr
Priority to US06/011,582 priority patent/US4450470A/en
Publication of JPS54107279A publication Critical patent/JPS54107279A/ja
Publication of JPS6329828B2 publication Critical patent/JPS6329828B2/ja
Priority to US07/319,198 priority patent/US5017503A/en
Granted legal-status Critical Current

Links

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Semiconductor Integrated Circuits (AREA)
JP1425178A 1978-02-10 1978-02-10 Semiconductor device Granted JPS54107279A (en)

Priority Applications (12)

Application Number Priority Date Filing Date Title
JP1425178A JPS54107279A (en) 1978-02-10 1978-02-10 Semiconductor device
NL7901023A NL190710C (nl) 1978-02-10 1979-02-08 Geintegreerde halfgeleiderketen.
GB7904606A GB2014785B (en) 1978-02-10 1979-02-09 Semiconductor integrated circuit devices
GB8113447A GB2070860B (en) 1978-02-10 1979-02-09 Contacts of semiconductor material for integrated circuits
GB8113448A GB2075259B (en) 1978-02-10 1979-02-09 Semiconductor components for integrated circuits
GB08221018A GB2102625B (en) 1978-02-10 1979-02-09 Resistors for integrated circuit
DE2954502A DE2954502C2 (enrdf_load_stackoverflow) 1978-02-10 1979-02-09
DE2954501A DE2954501C2 (enrdf_load_stackoverflow) 1978-02-10 1979-02-09
DE19792905022 DE2905022A1 (de) 1978-02-10 1979-02-09 Integrierte halbleiterschaltung
FR7903527A FR2417187A1 (fr) 1978-02-10 1979-02-12 Dispositif a circuit integre a semi-conducteur
US06/011,582 US4450470A (en) 1978-02-10 1979-02-12 Semiconductor integrated circuit device
US07/319,198 US5017503A (en) 1978-02-10 1989-03-06 Process for making a bipolar transistor including selective oxidation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1425178A JPS54107279A (en) 1978-02-10 1978-02-10 Semiconductor device

Related Child Applications (3)

Application Number Title Priority Date Filing Date
JP60197202A Division JPS6169164A (ja) 1985-09-06 1985-09-06 論理回路装置
JP19720185A Division JPS6169150A (ja) 1985-09-06 1985-09-06 半導体集積回路装置
JP19720085A Division JPS6169149A (ja) 1985-09-06 1985-09-06 集積回路装置の製造方法

Publications (2)

Publication Number Publication Date
JPS54107279A true JPS54107279A (en) 1979-08-22
JPS6329828B2 JPS6329828B2 (enrdf_load_stackoverflow) 1988-06-15

Family

ID=11855863

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1425178A Granted JPS54107279A (en) 1978-02-10 1978-02-10 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS54107279A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS577150A (en) * 1980-06-16 1982-01-14 Fujitsu Ltd Manufacture of semiconductor device
US4418468A (en) * 1981-05-08 1983-12-06 Fairchild Camera & Instrument Corporation Process for fabricating a logic structure utilizing polycrystalline silicon Schottky diodes
JPS5968963A (ja) * 1982-10-13 1984-04-19 Mitsubishi Electric Corp 半導体装置及びその製造方法
JPS61216356A (ja) * 1985-03-20 1986-09-26 Nec Corp 半導体抵抗
JPS61255050A (ja) * 1985-05-08 1986-11-12 Nec Corp 半導体集積回路装置
JPS6233448A (ja) * 1985-08-06 1987-02-13 Sharp Corp 半導体装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51130183A (en) * 1975-05-06 1976-11-12 Matsushita Electric Ind Co Ltd Semiconductor ic and its process
JPS5278382A (en) * 1975-12-25 1977-07-01 Nec Corp Semiconductor device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51130183A (en) * 1975-05-06 1976-11-12 Matsushita Electric Ind Co Ltd Semiconductor ic and its process
JPS5278382A (en) * 1975-12-25 1977-07-01 Nec Corp Semiconductor device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS577150A (en) * 1980-06-16 1982-01-14 Fujitsu Ltd Manufacture of semiconductor device
US4418468A (en) * 1981-05-08 1983-12-06 Fairchild Camera & Instrument Corporation Process for fabricating a logic structure utilizing polycrystalline silicon Schottky diodes
JPS5968963A (ja) * 1982-10-13 1984-04-19 Mitsubishi Electric Corp 半導体装置及びその製造方法
JPS61216356A (ja) * 1985-03-20 1986-09-26 Nec Corp 半導体抵抗
JPS61255050A (ja) * 1985-05-08 1986-11-12 Nec Corp 半導体集積回路装置
JPS6233448A (ja) * 1985-08-06 1987-02-13 Sharp Corp 半導体装置

Also Published As

Publication number Publication date
JPS6329828B2 (enrdf_load_stackoverflow) 1988-06-15

Similar Documents

Publication Publication Date Title
JPS54107279A (en) Semiconductor device
JPS52156580A (en) Semiconductor integrated circuit device and its production
JPS5559759A (en) Semiconductor device
JPS56115557A (en) Manufacture of semiconductor device
JPS54107280A (en) Semiconductor integrated circuit unit
JPS52124860A (en) Electrode formation method for semiconductor devices
JPS5527659A (en) Method of manufacturing semiconductor device
JPS52113688A (en) Production of semiconductor device
JPS5319774A (en) Semiconductor integrated circuit
JPS53148992A (en) Manufacture of semiconductor device
JPS5380160A (en) Manufacture of substrate for semiconductor device
JPS5410688A (en) Production of semiconductor device
JPS5478681A (en) Semiconductor device
JPS5363986A (en) Production of semiconductor device
JPS5591864A (en) Manufacture of semiconductor device
JPS5323582A (en) Productio n of semiconductor device
JPS5783043A (en) Semiconductor device
JPS5379377A (en) Production of semiconductor device
JPS53108385A (en) Manufacture for semiconductor device
JPS52124879A (en) Production of semiconductor integrated circuit
JPS551108A (en) Mis integrated circuit
JPS5434785A (en) Semiconductor integrated circuit device
JPS55111165A (en) Semiconductor device
JPS5434784A (en) Semiconductor integrated circuit device
JPS5447490A (en) Production of semiconductor device