JPS5320776A - Production of metal insulation film semiconductor device - Google Patents

Production of metal insulation film semiconductor device

Info

Publication number
JPS5320776A
JPS5320776A JP9551776A JP9551776A JPS5320776A JP S5320776 A JPS5320776 A JP S5320776A JP 9551776 A JP9551776 A JP 9551776A JP 9551776 A JP9551776 A JP 9551776A JP S5320776 A JPS5320776 A JP S5320776A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
insulation film
film semiconductor
metal insulation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9551776A
Other languages
Japanese (ja)
Inventor
Masahiko Yasuoka
Tsutomu Yoshihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP9551776A priority Critical patent/JPS5320776A/en
Publication of JPS5320776A publication Critical patent/JPS5320776A/en
Pending legal-status Critical Current

Links

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)

Abstract

PURPOSE: To shorten the distance between sources and drains, increase switching speed and increase the scale of integration by making shallow the diffusion depth near the gates of source, grain regions and making deep the diffusion depth directly under electrode mounting holes through the use of impurities of varying diffusion coefficients respectively.
COPYRIGHT: (C)1978,JPO&Japio
JP9551776A 1976-08-10 1976-08-10 Production of metal insulation film semiconductor device Pending JPS5320776A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9551776A JPS5320776A (en) 1976-08-10 1976-08-10 Production of metal insulation film semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9551776A JPS5320776A (en) 1976-08-10 1976-08-10 Production of metal insulation film semiconductor device

Publications (1)

Publication Number Publication Date
JPS5320776A true JPS5320776A (en) 1978-02-25

Family

ID=14139751

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9551776A Pending JPS5320776A (en) 1976-08-10 1976-08-10 Production of metal insulation film semiconductor device

Country Status (1)

Country Link
JP (1) JPS5320776A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5538034A (en) * 1978-09-11 1980-03-17 Oki Electric Ind Co Ltd Manufacturing of semiconductor integrated circuit
JPS5552269A (en) * 1978-10-11 1980-04-16 Nec Corp Preparation of semiconductor device
JPS55113376A (en) * 1979-02-22 1980-09-01 Nec Corp Manufacturing method of semiconductor device
JPS57153472A (en) * 1981-03-17 1982-09-22 Toshiba Corp Manufacture of semiconductor device
JPH02270334A (en) * 1990-02-26 1990-11-05 Seiko Epson Corp Semiconductor integrated circuit device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50106588A (en) * 1974-01-29 1975-08-22

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50106588A (en) * 1974-01-29 1975-08-22

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5538034A (en) * 1978-09-11 1980-03-17 Oki Electric Ind Co Ltd Manufacturing of semiconductor integrated circuit
JPS5552269A (en) * 1978-10-11 1980-04-16 Nec Corp Preparation of semiconductor device
JPS55113376A (en) * 1979-02-22 1980-09-01 Nec Corp Manufacturing method of semiconductor device
JPH033387B2 (en) * 1979-02-22 1991-01-18 Nippon Electric Co
JPS57153472A (en) * 1981-03-17 1982-09-22 Toshiba Corp Manufacture of semiconductor device
JPH02270334A (en) * 1990-02-26 1990-11-05 Seiko Epson Corp Semiconductor integrated circuit device

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