JPS5320776A - Production of metal insulation film semiconductor device - Google Patents
Production of metal insulation film semiconductor deviceInfo
- Publication number
- JPS5320776A JPS5320776A JP9551776A JP9551776A JPS5320776A JP S5320776 A JPS5320776 A JP S5320776A JP 9551776 A JP9551776 A JP 9551776A JP 9551776 A JP9551776 A JP 9551776A JP S5320776 A JPS5320776 A JP S5320776A
- Authority
- JP
- Japan
- Prior art keywords
- production
- semiconductor device
- insulation film
- film semiconductor
- metal insulation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE: To shorten the distance between sources and drains, increase switching speed and increase the scale of integration by making shallow the diffusion depth near the gates of source, grain regions and making deep the diffusion depth directly under electrode mounting holes through the use of impurities of varying diffusion coefficients respectively.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9551776A JPS5320776A (en) | 1976-08-10 | 1976-08-10 | Production of metal insulation film semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9551776A JPS5320776A (en) | 1976-08-10 | 1976-08-10 | Production of metal insulation film semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5320776A true JPS5320776A (en) | 1978-02-25 |
Family
ID=14139751
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9551776A Pending JPS5320776A (en) | 1976-08-10 | 1976-08-10 | Production of metal insulation film semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5320776A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5538034A (en) * | 1978-09-11 | 1980-03-17 | Oki Electric Ind Co Ltd | Manufacturing of semiconductor integrated circuit |
JPS5552269A (en) * | 1978-10-11 | 1980-04-16 | Nec Corp | Preparation of semiconductor device |
JPS55113376A (en) * | 1979-02-22 | 1980-09-01 | Nec Corp | Manufacturing method of semiconductor device |
JPS57153472A (en) * | 1981-03-17 | 1982-09-22 | Toshiba Corp | Manufacture of semiconductor device |
JPH02270334A (en) * | 1990-02-26 | 1990-11-05 | Seiko Epson Corp | Semiconductor integrated circuit device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50106588A (en) * | 1974-01-29 | 1975-08-22 |
-
1976
- 1976-08-10 JP JP9551776A patent/JPS5320776A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50106588A (en) * | 1974-01-29 | 1975-08-22 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5538034A (en) * | 1978-09-11 | 1980-03-17 | Oki Electric Ind Co Ltd | Manufacturing of semiconductor integrated circuit |
JPS5552269A (en) * | 1978-10-11 | 1980-04-16 | Nec Corp | Preparation of semiconductor device |
JPS55113376A (en) * | 1979-02-22 | 1980-09-01 | Nec Corp | Manufacturing method of semiconductor device |
JPH033387B2 (en) * | 1979-02-22 | 1991-01-18 | Nippon Electric Co | |
JPS57153472A (en) * | 1981-03-17 | 1982-09-22 | Toshiba Corp | Manufacture of semiconductor device |
JPH02270334A (en) * | 1990-02-26 | 1990-11-05 | Seiko Epson Corp | Semiconductor integrated circuit device |
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