JPS5214388A - Process for complementary insulated gate semiconductor integrated circuit device - Google Patents
Process for complementary insulated gate semiconductor integrated circuit deviceInfo
- Publication number
- JPS5214388A JPS5214388A JP50090291A JP9029175A JPS5214388A JP S5214388 A JPS5214388 A JP S5214388A JP 50090291 A JP50090291 A JP 50090291A JP 9029175 A JP9029175 A JP 9029175A JP S5214388 A JPS5214388 A JP S5214388A
- Authority
- JP
- Japan
- Prior art keywords
- integrated circuit
- semiconductor integrated
- circuit device
- insulated gate
- gate semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
- H01L27/092—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
- H01L27/0927—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors comprising a P-well only in the substrate
Abstract
PURPOSE:To make the density of integration higher and to avoid apperance of parasitic MOS by varying the concentration distribution of well region with a layer of epitaxial growth.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50090291A JPS5214388A (en) | 1975-07-25 | 1975-07-25 | Process for complementary insulated gate semiconductor integrated circuit device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50090291A JPS5214388A (en) | 1975-07-25 | 1975-07-25 | Process for complementary insulated gate semiconductor integrated circuit device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5214388A true JPS5214388A (en) | 1977-02-03 |
Family
ID=13994416
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50090291A Pending JPS5214388A (en) | 1975-07-25 | 1975-07-25 | Process for complementary insulated gate semiconductor integrated circuit device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5214388A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57206063A (en) * | 1981-06-15 | 1982-12-17 | Toshiba Corp | Semiconductor substrate and manufacture therefor |
JPS58199537A (en) * | 1982-05-14 | 1983-11-19 | Matsushita Electric Ind Co Ltd | Manufacture of high resistance semiconductor layer |
JPS6037760A (en) * | 1983-07-05 | 1985-02-27 | エヌ・ベー・フイリツプス・フルーイランペンフアブリケン | Method of producing semiconductor device |
JPS60124964A (en) * | 1983-12-12 | 1985-07-04 | Fujitsu Ltd | Manufacture of semiconductor device |
US4660062A (en) * | 1982-09-16 | 1987-04-21 | Handotai Kenkyu Shinkokai | Insulated gate transistor having reduced channel length |
-
1975
- 1975-07-25 JP JP50090291A patent/JPS5214388A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57206063A (en) * | 1981-06-15 | 1982-12-17 | Toshiba Corp | Semiconductor substrate and manufacture therefor |
JPS58199537A (en) * | 1982-05-14 | 1983-11-19 | Matsushita Electric Ind Co Ltd | Manufacture of high resistance semiconductor layer |
US4660062A (en) * | 1982-09-16 | 1987-04-21 | Handotai Kenkyu Shinkokai | Insulated gate transistor having reduced channel length |
JPS6037760A (en) * | 1983-07-05 | 1985-02-27 | エヌ・ベー・フイリツプス・フルーイランペンフアブリケン | Method of producing semiconductor device |
JPH0412628B2 (en) * | 1983-07-05 | 1992-03-05 | Fuiritsupusu Furuuiranpenfuaburiken Nv | |
JPS60124964A (en) * | 1983-12-12 | 1985-07-04 | Fujitsu Ltd | Manufacture of semiconductor device |
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