JPS5235584A - Manufacturing process of semiconductor device - Google Patents
Manufacturing process of semiconductor deviceInfo
- Publication number
- JPS5235584A JPS5235584A JP11121975A JP11121975A JPS5235584A JP S5235584 A JPS5235584 A JP S5235584A JP 11121975 A JP11121975 A JP 11121975A JP 11121975 A JP11121975 A JP 11121975A JP S5235584 A JPS5235584 A JP S5235584A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- manufacturing process
- eliminated
- formation
- way
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Bipolar Transistors (AREA)
Abstract
PURPOSE: Formation of isolation layer is eliminated by forming mesa groove, and base layer is thinly formed. In this way, an emitter impurity transistor of high hFE can be obtained.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11121975A JPS5235584A (en) | 1975-09-13 | 1975-09-13 | Manufacturing process of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11121975A JPS5235584A (en) | 1975-09-13 | 1975-09-13 | Manufacturing process of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5235584A true JPS5235584A (en) | 1977-03-18 |
Family
ID=14555535
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11121975A Pending JPS5235584A (en) | 1975-09-13 | 1975-09-13 | Manufacturing process of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5235584A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4750547A (en) * | 1985-11-07 | 1988-06-14 | Takao Sakamoto | Method for cleaning inner surfaces of heat-transfer tubes in a heat-exchanger |
JPS6476714A (en) * | 1987-09-18 | 1989-03-22 | Nec Corp | Semiconductor substrate |
JP2013138168A (en) * | 2011-11-28 | 2013-07-11 | Toshiba Corp | Semiconductor device and method of manufacturing the same |
-
1975
- 1975-09-13 JP JP11121975A patent/JPS5235584A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4750547A (en) * | 1985-11-07 | 1988-06-14 | Takao Sakamoto | Method for cleaning inner surfaces of heat-transfer tubes in a heat-exchanger |
JPS6476714A (en) * | 1987-09-18 | 1989-03-22 | Nec Corp | Semiconductor substrate |
JPH06101444B2 (en) * | 1987-09-18 | 1994-12-12 | 日本電気株式会社 | Semiconductor substrate |
JP2013138168A (en) * | 2011-11-28 | 2013-07-11 | Toshiba Corp | Semiconductor device and method of manufacturing the same |
US8866264B2 (en) | 2011-11-28 | 2014-10-21 | Kabushiki Kaisha Toshiba | Semiconductor device and manufacturing method of the same |
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