JPS5234675A - Manufacturing process of semiconductor device - Google Patents

Manufacturing process of semiconductor device

Info

Publication number
JPS5234675A
JPS5234675A JP11068875A JP11068875A JPS5234675A JP S5234675 A JPS5234675 A JP S5234675A JP 11068875 A JP11068875 A JP 11068875A JP 11068875 A JP11068875 A JP 11068875A JP S5234675 A JPS5234675 A JP S5234675A
Authority
JP
Japan
Prior art keywords
semiconductor device
manufacturing process
emitter
silicon layer
crystal silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11068875A
Other languages
Japanese (ja)
Other versions
JPS608624B2 (en
Inventor
Mikio Takagi
Kazufumi Nakayama
Hajime Kamioka
Shuichi Miyamoto
Haruo Shimoda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP50110688A priority Critical patent/JPS608624B2/en
Publication of JPS5234675A publication Critical patent/JPS5234675A/en
Publication of JPS608624B2 publication Critical patent/JPS608624B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Bipolar Transistors (AREA)

Abstract

PURPOSE: To form impurity bearing poly-crystal silicon layer on electrode contact windows of both emitter and base domains by same process.
COPYRIGHT: (C)1977,JPO&Japio
JP50110688A 1975-09-11 1975-09-11 Manufacturing method of semiconductor device Expired JPS608624B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50110688A JPS608624B2 (en) 1975-09-11 1975-09-11 Manufacturing method of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50110688A JPS608624B2 (en) 1975-09-11 1975-09-11 Manufacturing method of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5234675A true JPS5234675A (en) 1977-03-16
JPS608624B2 JPS608624B2 (en) 1985-03-04

Family

ID=14541914

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50110688A Expired JPS608624B2 (en) 1975-09-11 1975-09-11 Manufacturing method of semiconductor device

Country Status (1)

Country Link
JP (1) JPS608624B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57120370A (en) * 1981-01-19 1982-07-27 Matsushita Electronics Corp Manufacture of semiconductor device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4998578A (en) * 1973-01-22 1974-09-18

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4998578A (en) * 1973-01-22 1974-09-18

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57120370A (en) * 1981-01-19 1982-07-27 Matsushita Electronics Corp Manufacture of semiconductor device

Also Published As

Publication number Publication date
JPS608624B2 (en) 1985-03-04

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