JPS53133428A - Radiation sensitive copying constitute - Google Patents

Radiation sensitive copying constitute

Info

Publication number
JPS53133428A
JPS53133428A JP4919578A JP4919578A JPS53133428A JP S53133428 A JPS53133428 A JP S53133428A JP 4919578 A JP4919578 A JP 4919578A JP 4919578 A JP4919578 A JP 4919578A JP S53133428 A JPS53133428 A JP S53133428A
Authority
JP
Japan
Prior art keywords
constitute
radiation sensitive
sensitive copying
copying
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4919578A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6244258B2 (xx
Inventor
Buuru Geruharuto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of JPS53133428A publication Critical patent/JPS53133428A/ja
Publication of JPS6244258B2 publication Critical patent/JPS6244258B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
    • C07D251/24—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Adhesives Or Adhesive Processes (AREA)
JP4919578A 1977-04-25 1978-04-24 Radiation sensitive copying constitute Granted JPS53133428A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2718259A DE2718259C2 (de) 1977-04-25 1977-04-25 Strahlungsempfindliches Gemisch

Publications (2)

Publication Number Publication Date
JPS53133428A true JPS53133428A (en) 1978-11-21
JPS6244258B2 JPS6244258B2 (xx) 1987-09-18

Family

ID=6007163

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4919578A Granted JPS53133428A (en) 1977-04-25 1978-04-24 Radiation sensitive copying constitute

Country Status (16)

Country Link
JP (1) JPS53133428A (xx)
AU (1) AU514951B2 (xx)
BE (1) BE866306A (xx)
BR (1) BR7802525A (xx)
CA (1) CA1103508A (xx)
CH (1) CH634158A5 (xx)
DE (1) DE2718259C2 (xx)
DK (1) DK176878A (xx)
ES (1) ES469089A1 (xx)
FR (1) FR2389157A1 (xx)
GB (1) GB1602903A (xx)
IE (1) IE46622B1 (xx)
IT (1) IT1102622B (xx)
NL (1) NL185179C (xx)
SE (1) SE423286B (xx)
ZA (1) ZA782332B (xx)

Cited By (131)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55126235A (en) * 1979-03-22 1980-09-29 Fuji Photo Film Co Ltd Photosensitive composition
JPS58190946A (ja) * 1982-04-30 1983-11-08 Sharp Corp ホトレジスト
JPS61275747A (ja) * 1985-05-30 1986-12-05 Nec Corp ネガレジスト材料
JPS62115150A (ja) * 1985-07-02 1987-05-26 Fuji Photo Film Co Ltd 感光性組成物
JPS6442645A (en) * 1987-08-11 1989-02-14 Tomoegawa Paper Co Ltd Optical coloring composition
JPH02979A (ja) * 1987-12-12 1990-01-05 Hoechst Ag フレキソ印刷に使用するための、現像されたレリーフ印刷版の後処理法
US4934791A (en) * 1987-12-09 1990-06-19 Matsushita Electric Industrial Co., Ltd. Color filter
JPH02217855A (ja) * 1989-02-20 1990-08-30 Tokyo Ohka Kogyo Co Ltd ネガ型電子線レジスト組成物
JPH04136860A (ja) * 1990-09-28 1992-05-11 Tokyo Ohka Kogyo Co Ltd ネガ型放射線感応性レジスト組成物
US5304456A (en) * 1991-01-31 1994-04-19 Sumitomo Chemical Company, Limited Negative photoresist composition
EP0690074A1 (en) 1994-06-28 1996-01-03 Toyo Ink Manufacturing Co., Ltd. Photopolymerization initiator composition and photopolymerizable composition
EP0702271A1 (en) 1994-09-06 1996-03-20 Fuji Photo Film Co., Ltd. Positive working printing plate
EP0726498A1 (en) 1995-02-10 1996-08-14 Fuji Photo Film Co., Ltd. Photopolymerizable composition
KR100359884B1 (ko) * 1998-08-18 2002-12-18 주식회사 엘지화학 테트라히드로퀴놀리닐 및 인돌리닐 트리아진계 화합물 및광중합 개시제
EP1602982A2 (en) 2004-05-31 2005-12-07 Fuji Photo Film Co., Ltd. method of producing a lithographic printing plate and planographic printing method
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EP1621339A1 (en) 2004-07-29 2006-02-01 Fuji Photo Film Co., Ltd. Plate-making method of lithographic printing plate
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EP1621341A2 (en) 2004-07-30 2006-02-01 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor and lithographic printing method
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EP1669195A1 (en) 2004-12-13 2006-06-14 Fuji Photo Film Co., Ltd. Lithographic printing method
EP1685957A2 (en) 2005-01-26 2006-08-02 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor, lithographic printing method and packaged body of lithographic printing plate precursors
EP1701213A2 (en) 2005-03-08 2006-09-13 Fuji Photo Film Co., Ltd. Photosensitive composition
EP1707352A1 (en) 2005-03-31 2006-10-04 Fuji Photo Film Co., Ltd. Method of producing a planographic printing plate
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US7449574B2 (en) 2005-11-07 2008-11-11 Lg Chem, Ltd. Triazine based photoactive compound containing oxime ester
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Also Published As

Publication number Publication date
BE866306A (fr) 1978-10-24
JPS6244258B2 (xx) 1987-09-18
DE2718259C2 (de) 1982-11-25
ES469089A1 (es) 1979-09-16
ZA782332B (en) 1979-04-25
IT1102622B (it) 1985-10-07
IE46622B1 (en) 1983-08-10
DK176878A (da) 1978-10-26
DE2718259A1 (de) 1978-11-02
FR2389157A1 (fr) 1978-11-24
BR7802525A (pt) 1978-12-05
AU3535578A (en) 1979-10-25
NL185179C (nl) 1990-02-01
NL7804304A (nl) 1978-10-27
AU514951B2 (en) 1981-03-05
IE780788L (en) 1978-10-25
CA1103508A (en) 1981-06-23
FR2389157B1 (xx) 1980-10-31
NL185179B (nl) 1989-09-01
CH634158A5 (en) 1983-01-14
SE423286B (sv) 1982-04-26
IT7849012A0 (it) 1978-04-21
GB1602903A (en) 1981-11-18
SE7804588L (sv) 1978-10-26

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