AU3535578A - Radiation sensitive copying composition containing a substituted s-triazine - Google Patents

Radiation sensitive copying composition containing a substituted s-triazine

Info

Publication number
AU3535578A
AU3535578A AU35355/78A AU3535578A AU3535578A AU 3535578 A AU3535578 A AU 3535578A AU 35355/78 A AU35355/78 A AU 35355/78A AU 3535578 A AU3535578 A AU 3535578A AU 3535578 A AU3535578 A AU 3535578A
Authority
AU
Australia
Prior art keywords
triazine
substituted
composition containing
radiation sensitive
sensitive copying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
AU35355/78A
Other versions
AU514951B2 (en
Inventor
G Buhr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of AU3535578A publication Critical patent/AU3535578A/en
Application granted granted Critical
Publication of AU514951B2 publication Critical patent/AU514951B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
    • C07D251/24—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Adhesives Or Adhesive Processes (AREA)
AU35355/78A 1977-04-25 1978-04-21 Radiation sensitive copying composition containing a substituted s-triazine Expired AU514951B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEDE2718259 1977-04-25
DE2718259A DE2718259C2 (en) 1977-04-25 1977-04-25 Radiation-sensitive mixture

Publications (2)

Publication Number Publication Date
AU3535578A true AU3535578A (en) 1979-10-25
AU514951B2 AU514951B2 (en) 1981-03-05

Family

ID=6007163

Family Applications (1)

Application Number Title Priority Date Filing Date
AU35355/78A Expired AU514951B2 (en) 1977-04-25 1978-04-21 Radiation sensitive copying composition containing a substituted s-triazine

Country Status (16)

Country Link
JP (1) JPS53133428A (en)
AU (1) AU514951B2 (en)
BE (1) BE866306A (en)
BR (1) BR7802525A (en)
CA (1) CA1103508A (en)
CH (1) CH634158A5 (en)
DE (1) DE2718259C2 (en)
DK (1) DK176878A (en)
ES (1) ES469089A1 (en)
FR (1) FR2389157A1 (en)
GB (1) GB1602903A (en)
IE (1) IE46622B1 (en)
IT (1) IT1102622B (en)
NL (1) NL185179C (en)
SE (1) SE423286B (en)
ZA (1) ZA782332B (en)

Families Citing this family (148)

* Cited by examiner, † Cited by third party
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US4330590A (en) * 1980-02-14 1982-05-18 Minnesota Mining And Manufacturing Company Photoactive mixture of acrylic monomers and chromophore-substituted halomethyl-2-triazine
US4329384A (en) * 1980-02-14 1982-05-11 Minnesota Mining And Manufacturing Company Pressure-sensitive adhesive tape produced from photoactive mixture of acrylic monomers and polynuclear-chromophore-substituted halomethyl-2-triazine
US4391687A (en) 1980-02-14 1983-07-05 Minnesota Mining And Manufacturing Company Photoactive mixture of acrylic monomers and chromophore-substituted halomethyl-1-triazine
DE3144480A1 (en) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE COPY MATERIAL MADE THEREOF
JPS58190946A (en) * 1982-04-30 1983-11-08 Sharp Corp Photoresist
DE3337024A1 (en) * 1983-10-12 1985-04-25 Hoechst Ag, 6230 Frankfurt LIGHT SENSITIVE COMPOUNDS HAVING TRICHLORMETHYL GROUPS, METHOD FOR THE PRODUCTION THEREOF AND LIGHT SENSITIVE MIXTURE CONTAINING THESE COMPOUNDS
JPS61275747A (en) * 1985-05-30 1986-12-05 Nec Corp Negative type resist material
JPH0766186B2 (en) * 1985-07-02 1995-07-19 富士写真フイルム株式会社 Photosensitive composition
DE3606155A1 (en) * 1986-02-26 1987-08-27 Basf Ag PHOTOPOLYMERIZABLE MIXTURE, THIS CONTAINING LIGHT-SENSITIVE RECORDING ELEMENT, AND METHOD FOR PRODUCING A FLAT PRINT MOLD BY THIS LIGHT-SENSITIVE RECORDING ELEMENT
US4837128A (en) * 1986-08-08 1989-06-06 Fuji Photo Film Co., Ltd. Light-sensitive composition
JPS6358440A (en) * 1986-08-29 1988-03-14 Fuji Photo Film Co Ltd Photosensitive composition
JPS6442645A (en) * 1987-08-11 1989-02-14 Tomoegawa Paper Co Ltd Optical coloring composition
DE3821585A1 (en) * 1987-09-13 1989-03-23 Hoechst Ag POSITIVELY WORKING RADIATION-SENSITIVE MIXTURE AND PRODUCTION OF RADIATION-SENSITIVE RECORDING MATERIAL FOR HIGH-ENERGY RADIATION
US4934791A (en) * 1987-12-09 1990-06-19 Matsushita Electric Industrial Co., Ltd. Color filter
DE3742275A1 (en) * 1987-12-12 1989-06-22 Hoechst Ag METHOD FOR TREATING DEVELOPED RELIEF PRESSURE FORMS FOR FLEXODRUCK
JP2505033B2 (en) * 1988-11-28 1996-06-05 東京応化工業株式会社 Electron beam resist composition and method for forming fine pattern using the same
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DE3912652A1 (en) * 1989-04-18 1990-10-25 Hoechst Ag LIGHT-SENSITIVE BIS-TRICHLORMETHYL-S-TRIAZINE, METHOD FOR THE PRODUCTION THEREOF, AND LIGHT-SENSITIVE MIXTURE CONTAINING THESE COMPOUNDS
DE69130003T2 (en) * 1990-05-25 1999-02-11 Mitsubishi Chemical Corp., Tokio/Tokyo Negative photosensitive composition and method for forming a photoresist pattern
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TW207009B (en) * 1991-01-31 1993-06-01 Sumitomo Chemical Co
DE4120173A1 (en) * 1991-06-19 1992-12-24 Hoechst Ag POSITIVELY WORKING RADIATION-SENSITIVE MIXTURE AND PRODUCTION OF RADIATION-SENSITIVE RECORDING MATERIAL THEREFOR
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DE4444669A1 (en) 1994-12-15 1996-06-20 Hoechst Ag Radiation sensitive mixture
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DE19803564A1 (en) 1998-01-30 1999-08-05 Agfa Gevaert Ag Polymers with units of N-substituted maleimide and their use in radiation-sensitive mixtures
KR100359884B1 (en) * 1998-08-18 2002-12-18 주식회사 엘지화학 Tetrahydroquinolinyl and indolinyl triazine compounds and photopolymerization initiators
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Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1298414B (en) * 1967-11-09 1969-06-26 Kalle Ag Photosensitive mixture

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Publication number Publication date
BE866306A (en) 1978-10-24
JPS6244258B2 (en) 1987-09-18
DE2718259C2 (en) 1982-11-25
ES469089A1 (en) 1979-09-16
ZA782332B (en) 1979-04-25
IT1102622B (en) 1985-10-07
IE46622B1 (en) 1983-08-10
DK176878A (en) 1978-10-26
DE2718259A1 (en) 1978-11-02
FR2389157A1 (en) 1978-11-24
BR7802525A (en) 1978-12-05
JPS53133428A (en) 1978-11-21
NL185179C (en) 1990-02-01
NL7804304A (en) 1978-10-27
AU514951B2 (en) 1981-03-05
IE780788L (en) 1978-10-25
CA1103508A (en) 1981-06-23
FR2389157B1 (en) 1980-10-31
NL185179B (en) 1989-09-01
CH634158A5 (en) 1983-01-14
SE423286B (en) 1982-04-26
IT7849012A0 (en) 1978-04-21
GB1602903A (en) 1981-11-18
SE7804588L (en) 1978-10-26

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