SE7804588L - RADIATIVE COPYING MASS - Google Patents

RADIATIVE COPYING MASS

Info

Publication number
SE7804588L
SE7804588L SE7804588A SE7804588A SE7804588L SE 7804588 L SE7804588 L SE 7804588L SE 7804588 A SE7804588 A SE 7804588A SE 7804588 A SE7804588 A SE 7804588A SE 7804588 L SE7804588 L SE 7804588L
Authority
SE
Sweden
Prior art keywords
radiative
copying
mass
copying mass
radiative copying
Prior art date
Application number
SE7804588A
Other languages
Swedish (sv)
Other versions
SE423286B (en
Inventor
G Buhr
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of SE7804588L publication Critical patent/SE7804588L/en
Publication of SE423286B publication Critical patent/SE423286B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
    • C07D251/24—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Adhesives Or Adhesive Processes (AREA)
SE7804588A 1977-04-25 1978-04-21 APPLICATION OF A CHLORMYLETRATED S-TRIAZIN AS A RADIO SENSITIVE COMPOUND IN A COPYING MATERIAL SE423286B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2718259A DE2718259C2 (en) 1977-04-25 1977-04-25 Radiation-sensitive mixture

Publications (2)

Publication Number Publication Date
SE7804588L true SE7804588L (en) 1978-10-26
SE423286B SE423286B (en) 1982-04-26

Family

ID=6007163

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7804588A SE423286B (en) 1977-04-25 1978-04-21 APPLICATION OF A CHLORMYLETRATED S-TRIAZIN AS A RADIO SENSITIVE COMPOUND IN A COPYING MATERIAL

Country Status (16)

Country Link
JP (1) JPS53133428A (en)
AU (1) AU514951B2 (en)
BE (1) BE866306A (en)
BR (1) BR7802525A (en)
CA (1) CA1103508A (en)
CH (1) CH634158A5 (en)
DE (1) DE2718259C2 (en)
DK (1) DK176878A (en)
ES (1) ES469089A1 (en)
FR (1) FR2389157A1 (en)
GB (1) GB1602903A (en)
IE (1) IE46622B1 (en)
IT (1) IT1102622B (en)
NL (1) NL185179C (en)
SE (1) SE423286B (en)
ZA (1) ZA782332B (en)

Families Citing this family (148)

* Cited by examiner, † Cited by third party
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DE3606155A1 (en) * 1986-02-26 1987-08-27 Basf Ag PHOTOPOLYMERIZABLE MIXTURE, THIS CONTAINING LIGHT-SENSITIVE RECORDING ELEMENT, AND METHOD FOR PRODUCING A FLAT PRINT MOLD BY THIS LIGHT-SENSITIVE RECORDING ELEMENT
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DE3821585A1 (en) * 1987-09-13 1989-03-23 Hoechst Ag POSITIVELY WORKING RADIATION-SENSITIVE MIXTURE AND PRODUCTION OF RADIATION-SENSITIVE RECORDING MATERIAL FOR HIGH-ENERGY RADIATION
US4934791A (en) * 1987-12-09 1990-06-19 Matsushita Electric Industrial Co., Ltd. Color filter
DE3742275A1 (en) * 1987-12-12 1989-06-22 Hoechst Ag METHOD FOR TREATING DEVELOPED RELIEF PRESSURE FORMS FOR FLEXODRUCK
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DE3912652A1 (en) * 1989-04-18 1990-10-25 Hoechst Ag LIGHT-SENSITIVE BIS-TRICHLORMETHYL-S-TRIAZINE, METHOD FOR THE PRODUCTION THEREOF, AND LIGHT-SENSITIVE MIXTURE CONTAINING THESE COMPOUNDS
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NL185179C (en) 1990-02-01
NL7804304A (en) 1978-10-27
DK176878A (en) 1978-10-26
ES469089A1 (en) 1979-09-16
NL185179B (en) 1989-09-01
GB1602903A (en) 1981-11-18
IT7849012A0 (en) 1978-04-21
IT1102622B (en) 1985-10-07
ZA782332B (en) 1979-04-25
DE2718259C2 (en) 1982-11-25
JPS6244258B2 (en) 1987-09-18
DE2718259A1 (en) 1978-11-02
CA1103508A (en) 1981-06-23
JPS53133428A (en) 1978-11-21
FR2389157B1 (en) 1980-10-31
AU514951B2 (en) 1981-03-05
BR7802525A (en) 1978-12-05
CH634158A5 (en) 1983-01-14
SE423286B (en) 1982-04-26
FR2389157A1 (en) 1978-11-24
IE46622B1 (en) 1983-08-10
IE780788L (en) 1978-10-25
AU3535578A (en) 1979-10-25
BE866306A (en) 1978-10-24

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